{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,9,22]],"date-time":"2026-09-22T09:05:16Z","timestamp":1790067916570,"version":"4.0.1"},"reference-count":30,"publisher":"Royal Society of Chemistry (RSC)","license":[{"start":{"date-parts":[[2027,9,16]],"date-time":"2027-09-16T00:00:00Z","timestamp":1821052800000},"content-version":"am","delay-in-days":623,"URL":"http:\/\/rsc.li\/journals-terms-of-use"}],"funder":[{"DOI":"10.13039\/501100003052","name":"Ministry of Trade, Industry and Energy","doi-asserted-by":"publisher","award":["RS-2025-02221983"],"award-info":[{"award-number":["RS-2025-02221983"]}],"id":[{"id":"10.13039\/501100003052","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100003052","name":"Ministry of Trade, Industry and Energy","doi-asserted-by":"publisher","award":["RS-2025-02309649"],"award-info":[{"award-number":["RS-2025-02309649"]}],"id":[{"id":"10.13039\/501100003052","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100001321","name":"National Research Foundation","doi-asserted-by":"publisher","id":[{"id":"10.13039\/501100001321","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100014188","name":"Ministry of Science and ICT, South Korea","doi-asserted-by":"publisher","award":["2022R1A2C2009941"],"award-info":[{"award-number":["2022R1A2C2009941"]}],"id":[{"id":"10.13039\/501100014188","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":["rsc.org"],"crossmark-restriction":true},"short-container-title":["Mater. Horiz."],"abstract":"<jats:p>\n                    TMOF-assisted area-selective ALD confines ultrathin Nb\n                    <jats:sub>2<\/jats:sub>\n                    O\n                    <jats:sub>5<\/jats:sub>\n                    to TiN electrodes, coupling ZrO\n                    <jats:sub>2<\/jats:sub>\n                    \/TiN interface stabilization with lateral leakage suppression in DRAM capacitors.\n                  <\/jats:p>","DOI":"10.1039\/d6mh01361a","type":"journal-article","created":{"date-parts":[[2026,9,16]],"date-time":"2026-09-16T00:43:26Z","timestamp":1789519406000},"update-policy":"https:\/\/doi.org\/10.1039\/rsc_crossmark_policy","source":"Crossref","is-referenced-by-count":0,"title":["Spatially controlled interfacial engineering by area-selective atomic layer deposition of Nb\n                    <sub>2<\/sub>\n                    O\n                    <sub>5<\/sub>\n                    for high-performance metal\u2013insulator\u2013metal capacitors"],"prefix":"10.1039","author":[{"given":"Yongju","family":"Kwon","sequence":"first","affiliation":[{"name":"Department of Materials Science and Chemical Engineering, BK21 FOUR ERICA-ACE Center, Hanyang University, Ansan, Gyeonggi 15588, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jiwoo","family":"Oh","sequence":"additional","affiliation":[{"name":"Department of Materials Science and Chemical Engineering, BK21 FOUR ERICA-ACE Center, Hanyang University, Ansan, Gyeonggi 15588, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jeongbin","family":"Lee","sequence":"additional","affiliation":[{"name":"Department of Materials Science and Chemical Engineering, BK21 FOUR ERICA-ACE Center, Hanyang University, Ansan, Gyeonggi 15588, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Chang Mo","family":"Yoon","sequence":"additional","affiliation":[{"name":"Department of Materials Science and Chemical Engineering, BK21 FOUR ERICA-ACE Center, Hanyang University, Ansan, Gyeonggi 15588, Republic of Korea"},{"name":"Department of Semiconductor Engineering, Tech University of Korea, Siheung 15073, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-6928-4038","authenticated-orcid":false,"given":"Ji-Hoon","family":"Ahn","sequence":"additional","affiliation":[{"name":"Department of Materials Science and Chemical Engineering, BK21 FOUR ERICA-ACE Center, Hanyang University, Ansan, Gyeonggi 15588, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yongjoo","family":"Park","sequence":"additional","affiliation":[{"name":"Advanced Research Development Team, SK Trichem Co. Ltd., 110-5 Myeonghaksandan-ro, Yeondong-myeon, Sejong 30068, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-1674-1826","authenticated-orcid":false,"given":"Kibum","family":"Kang","sequence":"additional","affiliation":[{"name":"Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Republic of Korea"},{"name":"TDS Innovation Inc., Daejeon, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-0868-7479","authenticated-orcid":false,"given":"Woo-Hee","family":"Kim","sequence":"additional","affiliation":[{"name":"Department of Materials Science and Chemical Engineering, BK21 FOUR ERICA-ACE Center, Hanyang University, Ansan, Gyeonggi 15588, Republic of Korea"},{"name":"TDS Innovation Inc., Daejeon, Republic of Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"292","published-online":{"date-parts":[[2026]]},"reference":[{"key":"D6MH01361A\/cit1\/1","doi-asserted-by":"publisher","first-page":"2848","DOI":"10.1021\/acsnano.4c15750","volume":"19","author":"Guo","year":"2025","journal-title":"ACS Nano"},{"key":"D6MH01361A\/cit2\/1","doi-asserted-by":"publisher","first-page":"442","DOI":"10.1038\/s41928-018-0117-x","volume":"1","author":"Salahuddin","year":"2018","journal-title":"Nat. Electron."},{"key":"D6MH01361A\/cit3\/1","doi-asserted-by":"publisher","first-page":"9782","DOI":"10.1038\/s41467-024-54218-w","volume":"15","author":"Xiao","year":"2024","journal-title":"Nat. Commun."},{"key":"D6MH01361A\/cit4\/1","doi-asserted-by":"publisher","first-page":"1524","DOI":"10.1109\/LED.2017.2755050","volume":"38","author":"Lee","year":"2017","journal-title":"IEEE Electron Device Lett."},{"key":"D6MH01361A\/cit5\/1","doi-asserted-by":"publisher","first-page":"679","DOI":"10.1038\/nature05148","volume":"443","author":"Stengel","year":"2006","journal-title":"Nature"},{"key":"D6MH01361A\/cit6\/1","doi-asserted-by":"publisher","first-page":"2340","DOI":"10.1038\/s41467-023-37887-x","volume":"14","author":"Lu","year":"2023","journal-title":"Nat. Commun."},{"key":"D6MH01361A\/cit7\/1","doi-asserted-by":"publisher","first-page":"1228","DOI":"10.1038\/s41467-022-28860-1","volume":"13","author":"Hoffmann","year":"2022","journal-title":"Nat. Commun."},{"key":"D6MH01361A\/cit8\/1","doi-asserted-by":"publisher","first-page":"3362","DOI":"10.1021\/acsaelm.4c00195","volume":"6","author":"Lee","year":"2024","journal-title":"ACS Appl. Electron. Mater."},{"key":"D6MH01361A\/cit9\/1","doi-asserted-by":"publisher","first-page":"1757","DOI":"10.1039\/D5MH01502B","volume":"13","author":"Kim","year":"2026","journal-title":"Mater. Horiz."},{"key":"D6MH01361A\/cit10\/1","doi-asserted-by":"publisher","first-page":"2303261","DOI":"10.1002\/adfm.202303261","volume":"33","author":"Alcala","year":"2023","journal-title":"Adv. Funct. Mater."},{"key":"D6MH01361A\/cit11\/1","doi-asserted-by":"publisher","first-page":"7593","DOI":"10.1038\/s41467-025-63048-3","volume":"16","author":"Zhou","year":"2025","journal-title":"Nat. Commun."},{"key":"D6MH01361A\/cit12\/1","doi-asserted-by":"publisher","first-page":"6868","DOI":"10.1111\/jace.19966","volume":"107","author":"Spurling","year":"2024","journal-title":"J. Am. Ceram. Soc."},{"key":"D6MH01361A\/cit13\/1","doi-asserted-by":"publisher","first-page":"4003","DOI":"10.1007\/BF00360700","volume":"30","author":"Wang","year":"1995","journal-title":"J. Mater. Sci."},{"key":"D6MH01361A\/cit14\/1","doi-asserted-by":"publisher","first-page":"69","DOI":"10.1109\/IEDM.2004.1419067","author":"Kim","year":"2004","journal-title":"IEDM Tech. Dig."},{"key":"D6MH01361A\/cit15\/1","doi-asserted-by":"publisher","first-page":"2102556","DOI":"10.1002\/adfm.202102556","volume":"31","author":"Lee","year":"2021","journal-title":"Adv. Funct. Mater."},{"key":"D6MH01361A\/cit16\/1","doi-asserted-by":"publisher","first-page":"1086","DOI":"10.1002\/adma.200502470","volume":"18","author":"Chen","year":"2006","journal-title":"Adv. Mater."},{"key":"D6MH01361A\/cit17\/1","doi-asserted-by":"publisher","first-page":"2316872","DOI":"10.1002\/adfm.202316872","volume":"34","author":"Oh","year":"2024","journal-title":"Adv. Funct. Mater."},{"key":"D6MH01361A\/cit18\/1","doi-asserted-by":"publisher","first-page":"4451","DOI":"10.1021\/acsnano.6b00094","volume":"10","author":"Kim","year":"2016","journal-title":"ACS Nano"},{"key":"D6MH01361A\/cit19\/1","doi-asserted-by":"publisher","first-page":"1757","DOI":"10.1021\/acsnano.9b07467","volume":"14","author":"Oh","year":"2020","journal-title":"ACS Nano"},{"key":"D6MH01361A\/cit20\/1","doi-asserted-by":"publisher","first-page":"2138","DOI":"10.1038\/s41467-024-46293-w","volume":"15","author":"Park","year":"2024","journal-title":"Nat. Commun."},{"key":"D6MH01361A\/cit21\/1","doi-asserted-by":"publisher","first-page":"150760","DOI":"10.1016\/j.cej.2024.150760","volume":"488","author":"Kim","year":"2024","journal-title":"Chem. Eng. J."},{"key":"D6MH01361A\/cit22\/1","doi-asserted-by":"publisher","first-page":"6165","DOI":"10.1039\/D6MH00227G","volume":"13","author":"Lee","year":"2026","journal-title":"Mater. Horiz."},{"key":"D6MH01361A\/cit23\/1","doi-asserted-by":"publisher","first-page":"246","DOI":"10.1016\/S0169-4332(00)00024-6","volume":"158","author":"Zhao","year":"2000","journal-title":"Appl. Surf. Sci."},{"key":"D6MH01361A\/cit24\/1","doi-asserted-by":"publisher","first-page":"136570","DOI":"10.1016\/j.matlet.2024.136570","volume":"366","author":"Park","year":"2024","journal-title":"Mater. Lett."},{"key":"D6MH01361A\/cit25\/1","doi-asserted-by":"publisher","first-page":"27","DOI":"10.1186\/s40580-025-00490-5","volume":"12","author":"Lee","year":"2025","journal-title":"Nano Convergence"},{"key":"D6MH01361A\/cit26\/1","doi-asserted-by":"publisher","first-page":"054510","DOI":"10.1063\/1.2973687","volume":"104","author":"Miao","year":"2008","journal-title":"J. Appl. Phys."},{"key":"D6MH01361A\/cit27\/1","doi-asserted-by":"publisher","first-page":"182907","DOI":"10.1063\/1.2735945","volume":"90","author":"Cho","year":"2007","journal-title":"Appl. Phys. Lett."},{"key":"D6MH01361A\/cit28\/1","doi-asserted-by":"publisher","first-page":"40","DOI":"10.1021\/ie50660a008","volume":"56","author":"Fowkes","year":"1964","journal-title":"Ind. Eng. Chem."},{"key":"D6MH01361A\/cit29\/1","doi-asserted-by":"publisher","first-page":"155","DOI":"10.1080\/00218467208072219","volume":"4","author":"Fowkes","year":"1972","journal-title":"J. Adhes."},{"key":"D6MH01361A\/cit30\/1","doi-asserted-by":"publisher","first-page":"493","DOI":"10.1016\/0021-9797(68)90082-9","volume":"28","author":"Fowkes","year":"1968","journal-title":"J. Colloid Interface Sci."}],"container-title":["Materials Horizons"],"original-title":[],"language":"en","link":[{"URL":"http:\/\/pubs.rsc.org\/MH\/article-pdf\/doi\/10.1039\/D6MH01361A\/0\/D6MH01361A.pdf","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2026,9,22]],"date-time":"2026-09-22T08:41:44Z","timestamp":1790066504000},"score":1,"resource":{"primary":{"URL":"http:\/\/pubs.rsc.org\/MH\/article-lookup\/doi\/10.1039\/D6MH01361A"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2026]]},"references-count":30,"URL":"https:\/\/doi.org\/10.1039\/d6mh01361a","relation":{},"ISSN":["2051-6347","2051-6355"],"issn-type":[{"value":"2051-6347","type":"print"},{"value":"2051-6355","type":"electronic"}],"subject":[],"published":{"date-parts":[[2026]]}}}