{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,4,6]],"date-time":"2026-04-06T06:37:34Z","timestamp":1775457454030,"version":"3.50.1"},"reference-count":35,"publisher":"AIP Publishing","issue":"9","content-domain":{"domain":["pubs.aip.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2004,3,1]]},"abstract":"<jats:p>Adsorption of 2-propanol, (CH3)2CHOH, on a Si(111)-7\u00d77 surface was studied by scanning tunneling microscopy. (CH3)2CHOH adsorbs equally on the faulted and unfaulted half unit cells by forming Si\u2013OCH(CH3)2 and Si\u2013H on an adatom and rest atom pair. Si\u2013OCH(CH3)2 is consecutively increased in each half unit cell, and the adsorption is saturated when every half unit cell has three Si\u2013OCH(CH3)2, which corresponds to 0.5 of the adatom coverage. The sticking probability for the dissociation of (CH3)2CHOH is independent of the adatom coverage from 0 to 0.4, but it depends on coverage at higher than 0.4. By counting the darkened adatoms, Si\u2013OCH(CH3)2 on the center adatom (m) and that on the corner adatom (n), it was found the m\/n ratio is ca. 4 for the first dissociation of (CH3)2CHOH in virgin half unit cell, but it becomes ca. 1.9 and 1.8 when two and three Si\u2013OCH(CH3)2 are contained in a half unit cell. This result reveals that the dissociation probability of (CH3)2CHOH at the adatom-rest atom pair site is influenced by the nearest Si\u2013OCH(CH3)2 in the half unit cell.<\/jats:p>","DOI":"10.1063\/1.1644105","type":"journal-article","created":{"date-parts":[[2004,2,20]],"date-time":"2004-02-20T23:09:44Z","timestamp":1077318584000},"page":"4486-4491","update-policy":"https:\/\/doi.org\/10.1063\/aip-crossmark-policy-page","source":"Crossref","is-referenced-by-count":17,"title":["Dissociation mechanism of 2-propanol on a Si(111)-(7\u00d77) surface studied by scanning tunneling microscopy"],"prefix":"10.1063","volume":"120","author":[{"given":"Ken-ichi","family":"Tanaka","sequence":"first","affiliation":[{"name":"Advanced Research Laboratory, Saitama Institute of Technology, 1690\u2009Fusaiji, Okabe, Saitama, Japan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Yuka","family":"Nomoto","sequence":"additional","affiliation":[{"name":"Advanced Research Laboratory, Saitama Institute of Technology, 1690\u2009Fusaiji, Okabe, Saitama, Japan"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Zhao-Xiong","family":"Xie","sequence":"additional","affiliation":[{"name":"Advanced Research Laboratory, Saitama Institute of Technology, 1690\u2009Fusaiji, Okabe, Saitama, Japan"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"317","reference":[{"key":"2024021018334895500_r1","doi-asserted-by":"crossref","first-page":"1502","DOI":"10.1116\/1.573160","volume":"3","year":"1985","journal-title":"J. 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