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The results show that by using this deposition technique it is possible to obtain at moderate rf power and filament temperature, compact i-type silicon films with \u03b7\u03bc\u03c4 of the order of 10\u22125\u200acm2\u200aV\u22121, without hydrogen dilution.<\/jats:p>","DOI":"10.1063\/1.1427133","type":"journal-article","created":{"date-parts":[[2002,7,26]],"date-time":"2002-07-26T13:24:23Z","timestamp":1027689863000},"page":"1644-1649","update-policy":"http:\/\/dx.doi.org\/10.1063\/aip-crossmark-policy-page","source":"Crossref","is-referenced-by-count":2,"title":["Hot-wire plasma assisted chemical vapor deposition: A deposition technique to obtain silicon thin films"],"prefix":"10.1063","volume":"91","author":[{"given":"I.","family":"Ferreira","sequence":"first","affiliation":[{"name":"CENIMAT, Departamento de Ci\u00eancia dos Materiais da Faculdade de Ci\u00eancias e Tecnologia da Universidade Nova de Lisboa e CEMOP-UNINOVA, Quinta da Torre, 2829-516\u2009Caparica, Portugal"}]},{"given":"E.","family":"Fortunato","sequence":"additional","affiliation":[{"name":"CENIMAT, Departamento de Ci\u00eancia dos Materiais da Faculdade de Ci\u00eancias e Tecnologia da Universidade Nova de Lisboa e CEMOP-UNINOVA, Quinta da Torre, 2829-516\u2009Caparica, Portugal"}]},{"given":"R.","family":"Martins","sequence":"additional","affiliation":[{"name":"CENIMAT, Departamento de Ci\u00eancia dos Materiais da Faculdade de Ci\u00eancias e Tecnologia da Universidade Nova de Lisboa e CEMOP-UNINOVA, Quinta da Torre, 2829-516\u2009Caparica, Portugal"}]},{"given":"P.","family":"Vilarinho","sequence":"additional","affiliation":[{"name":"UIMC, Departamento de Engenharia Cer\u00e2mica e do Vidro da Universidade de Aveiro, 3810-193\u2009Aveiro, Portugal"}]}],"member":"317","reference":[{"key":"2024020609304336000_r1","doi-asserted-by":"crossref","first-page":"671","DOI":"10.1063\/1.88617","volume":"28","year":"1976","journal-title":"Appl. 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