{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,1,8]],"date-time":"2026-01-08T18:34:08Z","timestamp":1767897248295,"version":"3.49.0"},"reference-count":27,"publisher":"AIP Publishing","issue":"12","content-domain":{"domain":["pubs.aip.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2003,12,15]]},"abstract":"<jats:p>Silicon nitride thin films were prepared by reactive sputtering from different sputtering targets and using a range of Ar\/N2 sputtering gas mixtures. The hardness and the Young\u2019s modulus of the samples were determined by nanoindentation measurements. Depending on the preparation parameters, the obtained values were in the ranges 8\u201323 and 100\u2013210 GPa, respectively. Additionally, Fourier-transform infrared spectroscopy, Rutherford backscattering spectroscopy, and x-ray diffraction were used to characterize samples with respect to different types of bonding, atomic concentrations, and structure of the films to explain the variation of mechanical properties. The hardness and Young\u2019s modulus were determined as a function of film composition and structure and conditions giving the hardest film were found. Additionally, a model that assumes a series coupling of the elastic components, corresponding to the Si\u2013O and Si\u2013N bonds present in the sample has been proposed to explain the observed variations of hardness and Young\u2019s modulus.<\/jats:p>","DOI":"10.1063\/1.1626799","type":"journal-article","created":{"date-parts":[[2003,12,4]],"date-time":"2003-12-04T23:19:54Z","timestamp":1070579994000},"page":"7868-7873","update-policy":"https:\/\/doi.org\/10.1063\/aip-crossmark-policy-page","source":"Crossref","is-referenced-by-count":112,"title":["Mechanical properties of sputtered silicon nitride thin films"],"prefix":"10.1063","volume":"94","author":[{"given":"M.","family":"Vila","sequence":"first","affiliation":[{"name":"Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cient\u0131\u0301ficas, Cantoblanco, 28049-Madrid, Spain"}]},{"given":"D.","family":"C\u00e1ceres","sequence":"additional","affiliation":[{"name":"Departamento F\u0131\u0301sica, Escuela Polit\u00e9cnica Superior, Universidad Carlos III de Madrid, Avda. Universidad, 30 28911-Legan\u00e9s, Spain"}]},{"given":"C.","family":"Prieto","sequence":"additional","affiliation":[{"name":"Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Cient\u0131\u0301ficas, Cantoblanco, 28049-Madrid, Spain"}]}],"member":"317","reference":[{"key":"2024020717440510400_r1","doi-asserted-by":"crossref","first-page":"794","DOI":"10.1063\/1.92166","volume":"38","year":"1981","journal-title":"Appl. Phys. Lett."},{"key":"2024020717440510400_r2"},{"key":"2024020717440510400_r3"},{"key":"2024020717440510400_r4","doi-asserted-by":"crossref","first-page":"345","DOI":"10.1007\/BF02655633","volume":"8","year":"1979","journal-title":"J. Electron. Mater."},{"key":"2024020717440510400_r5"},{"key":"2024020717440510400_r6"},{"key":"2024020717440510400_r7","doi-asserted-by":"crossref","first-page":"2327","DOI":"10.1063\/1.366976","volume":"83","year":"1998","journal-title":"J. Appl. Phys."},{"key":"2024020717440510400_r8","doi-asserted-by":"crossref","first-page":"2751","DOI":"10.1063\/1.371121","volume":"86","year":"1999","journal-title":"J. Appl. Phys."},{"key":"2024020717440510400_r9","doi-asserted-by":"crossref","first-page":"3951","DOI":"10.1063\/1.343361","volume":"65","year":"1989","journal-title":"J. Appl. Phys."},{"key":"2024020717440510400_r10","doi-asserted-by":"crossref","first-page":"1898","DOI":"10.1063\/1.1383576","volume":"90","year":"2001","journal-title":"J. Appl. Phys."},{"key":"2024020717440510400_r11","doi-asserted-by":"crossref","first-page":"174","DOI":"10.1016\/0040-6090(94)06476-8","volume":"260","year":"1995","journal-title":"Thin Solid Films"},{"key":"2024020717440510400_r12","doi-asserted-by":"crossref","first-page":"199","DOI":"10.1016\/S0168-583X(03)01211-4","volume":"211","year":"2003","journal-title":"Nucl. Instrum. Methods Phys. Res. B"},{"key":"2024020717440510400_r13","doi-asserted-by":"crossref","first-page":"153","DOI":"10.1016\/S0040-6090(97)00512-9","volume":"317","year":"1998","journal-title":"Thin Solid Films"},{"key":"2024020717440510400_r14","doi-asserted-by":"crossref","first-page":"118","DOI":"10.1063\/1.1535263","volume":"82","year":"2003","journal-title":"Appl. Phys. Lett."},{"key":"2024020717440510400_r15","doi-asserted-by":"crossref","first-page":"164","DOI":"10.1016\/S0040-6090(98)00989-4","volume":"332","year":"1998","journal-title":"Thin Solid Films"},{"key":"2024020717440510400_r16","doi-asserted-by":"crossref","first-page":"2464","DOI":"10.1116\/1.577257","volume":"9","year":"1991","journal-title":"J. Vac. Sci. Technol. A"},{"key":"2024020717440510400_r17","first-page":"3242","volume":"7","year":"1996","journal-title":"J. Mater. Res."},{"key":"2024020717440510400_r18","doi-asserted-by":"crossref","first-page":"53","DOI":"10.1016\/S0921-5093(00)02027-X","volume":"308","year":"2001","journal-title":"Mater. Sci. Eng., A"},{"key":"2024020717440510400_r19","doi-asserted-by":"crossref","first-page":"1564","DOI":"10.1557\/JMR.1992.1564","volume":"7","year":"1992","journal-title":"J. Mater. Res."},{"key":"2024020717440510400_r20","first-page":"13","volume":"130","year":"1989","journal-title":"Mater. Res. Soc. Symp. Proc."},{"key":"2024020717440510400_r21","doi-asserted-by":"crossref","first-page":"513","DOI":"10.1016\/S0042-207X(02)00221-X","volume":"67","year":"2002","journal-title":"Vacuum"},{"key":"2024020717440510400_r22","first-page":"67","volume":"151\u2013152","year":"2002","journal-title":"Surf. Coat. Technol."},{"key":"2024020717440510400_r23"},{"key":"2024020717440510400_r24","doi-asserted-by":"crossref","first-page":"3827","DOI":"10.1063\/1.117118","volume":"69","year":"1996","journal-title":"Appl. Phys. Lett."},{"key":"2024020717440510400_r25","doi-asserted-by":"crossref","first-page":"1023","DOI":"10.1002\/1521-396X(200112)188:3<1023::AID-PSSA1023>3.0.CO;2-A","volume":"188","year":"2001","journal-title":"Phys. Status Solidi A"},{"key":"2024020717440510400_r26"},{"key":"2024020717440510400_r27"}],"container-title":["Journal of Applied Physics"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/pubs.aip.org\/aip\/jap\/article-pdf\/94\/12\/7868\/18706145\/7868_1_online.pdf","content-type":"application\/pdf","content-version":"vor","intended-application":"syndication"},{"URL":"https:\/\/pubs.aip.org\/aip\/jap\/article-pdf\/94\/12\/7868\/18706145\/7868_1_online.pdf","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2024,2,7]],"date-time":"2024-02-07T23:34:27Z","timestamp":1707348867000},"score":1,"resource":{"primary":{"URL":"https:\/\/pubs.aip.org\/jap\/article\/94\/12\/7868\/486006\/Mechanical-properties-of-sputtered-silicon-nitride"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2003,12,15]]},"references-count":27,"journal-issue":{"issue":"12","published-print":{"date-parts":[[2003,12,15]]}},"URL":"https:\/\/doi.org\/10.1063\/1.1626799","relation":{},"ISSN":["0021-8979","1089-7550"],"issn-type":[{"value":"0021-8979","type":"print"},{"value":"1089-7550","type":"electronic"}],"subject":[],"published-other":{"date-parts":[[2003,12,15]]},"published":{"date-parts":[[2003,12,15]]}}}