{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,7,30]],"date-time":"2025-07-30T10:44:41Z","timestamp":1753872281696,"version":"3.41.2"},"reference-count":5,"publisher":"AIP Publishing","issue":"10","content-domain":{"domain":["pubs.aip.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2005,5,15]]},"abstract":"<jats:p>Low resistance tunnel junctions suitable for &amp;gt;200Gb\u2215inch2 read heads require R\u00d7A&amp;lt;1\u03a9\u03bcm2 and TMR&amp;gt;10%, usually achieved by natural oxidation with tAl&amp;lt;0.7nm barriers. This paper shows that as-deposited junctions with competitive electrical and magnetic properties can be produced starting from 0.9nm Al barriers and remote plasma oxidation in ion beam-deposited stacks using Co73.8Fe16.2B10 electrodes. TMR\u223c20% for R\u00d7A\u223c2\u201315\u03a9\u03bcm2 is obtained, while in the R\u00d7A\u223c40\u2013140\u03a9\u03bcm2 range TMR can reach 40%\u201345%, in as-deposited samples. A limited number of junctions exhibits considerably lower R\u00d7A values with respect to the average while keeping similar MR (down to 0.44\u03a9\u03bcm2 with 20% and down to 2.2\u03a9\u03bcm2 with 51%).<\/jats:p>","DOI":"10.1063\/1.1845951","type":"journal-article","created":{"date-parts":[[2005,5,3]],"date-time":"2005-05-03T22:01:47Z","timestamp":1115157707000},"update-policy":"https:\/\/doi.org\/10.1063\/aip-crossmark-policy-page","source":"Crossref","is-referenced-by-count":4,"title":["Low resistance tunnel junctions with remote plasma underoxidized thick barriers"],"prefix":"10.1063","volume":"97","author":[{"given":"R.","family":"Ferreira","sequence":"first","affiliation":[{"name":"icrosistemas e Nanotecnologias, Instituto de Engenharia de Sistemas e Computadores, (INESC-MN) M , R. Alves Redol, 9-1\u00b0, 1000-029 Lisbon, Portugal"}]},{"given":"P. P.","family":"Freitas","sequence":"additional","affiliation":[{"name":"icrosistemas e Nanotecnologias, Instituto de Engenharia de Sistemas e Computadores, (INESC-MN) M , R. Alves Redol, 9-1\u00b0, 1000-029 Lisbon, Portugal"}]},{"given":"M.","family":"MacKenzie","sequence":"additional","affiliation":[{"name":"Department of Physics and Astronomy, University of Glasgow, Kelvin Building, University of Glasgow, Glasgow, G12 8QQ United Kingdom"}]},{"given":"J. N.","family":"Chapman","sequence":"additional","affiliation":[{"name":"Department of Physics and Astronomy, University of Glasgow, Kelvin Building, University of Glasgow, Glasgow, G12 8QQ United Kingdom"}]}],"member":"317","published-online":{"date-parts":[[2005,5,5]]},"reference":[{"key":"2023070201092315900_c1","doi-asserted-by":"publisher","first-page":"2219","DOI":"10.1063\/1.1408909","volume":"79","year":"2001","journal-title":"Appl. Phys. Lett."},{"key":"2023070201092315900_c2","doi-asserted-by":"crossref","first-page":"2272","DOI":"10.1109\/TMAG.2004.832147","volume":"40","year":"2004","journal-title":"IEEE Trans. Magn."},{"volume-title":"Appl. Phys. Lett.","key":"2023070201092315900_c3"},{"key":"2023070201092315900_c4","doi-asserted-by":"publisher","first-page":"1783","DOI":"10.1063\/1.1590064","volume":"94","year":"2003","journal-title":"J. Appl. Phys."},{"volume-title":"FastHenry User\u2019s Guide","year":"1996","key":"2023070201092315900_c5"}],"container-title":["Journal of Applied Physics"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/pubs.aip.org\/aip\/jap\/article-pdf\/doi\/10.1063\/1.1845951\/14945833\/10c903_1_online.pdf","content-type":"application\/pdf","content-version":"vor","intended-application":"syndication"},{"URL":"https:\/\/pubs.aip.org\/aip\/jap\/article-pdf\/doi\/10.1063\/1.1845951\/14945833\/10c903_1_online.pdf","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2023,7,2]],"date-time":"2023-07-02T01:09:30Z","timestamp":1688260170000},"score":1,"resource":{"primary":{"URL":"https:\/\/pubs.aip.org\/jap\/article\/97\/10\/10C903\/307440\/Low-resistance-tunnel-junctions-with-remote-plasma"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2005,5,5]]},"references-count":5,"journal-issue":{"issue":"10","published-print":{"date-parts":[[2005,5,15]]}},"URL":"https:\/\/doi.org\/10.1063\/1.1845951","relation":{},"ISSN":["0021-8979","1089-7550"],"issn-type":[{"type":"print","value":"0021-8979"},{"type":"electronic","value":"1089-7550"}],"subject":[],"published-other":{"date-parts":[[2005,5,15]]},"published":{"date-parts":[[2005,5,5]]},"article-number":"10C903"}}