{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,10,14]],"date-time":"2025-10-14T11:18:57Z","timestamp":1760440737468,"version":"3.41.2"},"reference-count":11,"publisher":"AIP Publishing","issue":"7","content-domain":{"domain":["pubs.aip.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2008,4,1]]},"abstract":"<jats:p>We study the interlayer coupling field (Hcoupl) as a function of temperature (T) for two spin valve (SV) series of NiFe\u2215CoFe\u2215Cu(t)\u2215CoFe\u2215MnIr, with different deposition rates (DRs) of the layers and Cu thickness t ranging from 16to26\u00c5. In series 1, the DRs were 0.49\u00c5\u2215s for Cu and 0.29\u00c5\u2215s for CoFe. In series 2, the DRs were lower: 0.28\u00c5\u2215s for Cu and 0.23\u00c5\u2215s for CoFe. The Hcoupl(T) dependence was obtained from magnetoresistance measurements (20\u2013300K) at low magnetic fields. By considering the T dependence of both Ruderman\u2013Kittel\u2013Kasuyama\u2013Yoshida (RKKY)-like [(T\u2215T0)\u2215sinh(T\u2215T0), where T0 is characteristic temperature] and N\u00e9el interactions, we were able to analyze the contribution of each to Hcoupl and study the influence of DR, roughness, and Cu t on T0, RKKY-like, and N\u00e9el coupling energies. We found that the N\u00e9el contribution to Hcoupl is more significative in the SVs with the higher DR, an effect that we relate to the corresponding higher \u03b3 observed experimentally by atomic force microscopy. On the other hand, the RKKY-like contribution is approximately constant with t for the higher DR-SVs but varies significatively for the SVs with the lower DR, showing an antiferromagnetic coupling at t=21\u00c5.<\/jats:p>","DOI":"10.1063\/1.2838141","type":"journal-article","created":{"date-parts":[[2008,3,17]],"date-time":"2008-03-17T22:45:38Z","timestamp":1205793938000},"update-policy":"https:\/\/doi.org\/10.1063\/aip-crossmark-policy-page","source":"Crossref","is-referenced-by-count":13,"title":["Ruderman\u2013Kittel\u2013Kasuyama\u2013Yoshida and N\u00e9el contributions to the interlayer coupling of MnIr-based spin valves: Influence of deposition rate, roughness and spacer thickness"],"prefix":"10.1063","volume":"103","author":[{"given":"J. M.","family":"Teixeira","sequence":"first","affiliation":[{"name":"IFIMUP and DFFCUP 1 , Rua do Campo Alegre, 678, 4169-007 Porto, Portugal"}]},{"given":"J.","family":"Ventura","sequence":"additional","affiliation":[{"name":"IFIMUP and DFFCUP 1 , Rua do Campo Alegre, 678, 4169-007 Porto, Portugal"}]},{"given":"R.","family":"Fermento","sequence":"additional","affiliation":[{"name":"IFIMUP and DFFCUP 1 , Rua do Campo Alegre, 678, 4169-007 Porto, Portugal"}]},{"given":"J. P.","family":"Ara\u00fajo","sequence":"additional","affiliation":[{"name":"IFIMUP and DFFCUP 1 , Rua do Campo Alegre, 678, 4169-007 Porto, Portugal"}]},{"given":"J. B.","family":"Sousa","sequence":"additional","affiliation":[{"name":"IFIMUP and DFFCUP 1 , Rua do Campo Alegre, 678, 4169-007 Porto, Portugal"}]},{"given":"S.","family":"Cardoso","sequence":"additional","affiliation":[{"name":"INESC-MN and IST 2 , Rua Alves Redol, 9-1, 1000-029 Lisbon, Portugal"}]},{"given":"P. P.","family":"Freitas","sequence":"additional","affiliation":[{"name":"INESC-MN and IST 2 , Rua Alves Redol, 9-1, 1000-029 Lisbon, Portugal"}]}],"member":"317","published-online":{"date-parts":[[2008,3,17]]},"reference":[{"key":"2023070415124656000_c1","doi-asserted-by":"publisher","first-page":"57","DOI":"10.1016\/S0304-8853(99)00335-2","volume":"200","year":"1999","journal-title":"J. Magn. Magn. Mater."},{"key":"2023070415124656000_c2","doi-asserted-by":"publisher","first-page":"2","DOI":"10.1016\/S0924-4247(99)00159-4","volume":"81","year":"2000","journal-title":"Sens. Actuators, A"},{"key":"2023070415124656000_c3","doi-asserted-by":"publisher","first-page":"3918","DOI":"10.1109\/20.489816","volume":"31","year":"1995","journal-title":"IEEE Trans. Magn."},{"key":"2023070415124656000_c4","doi-asserted-by":"publisher","first-page":"4642","DOI":"10.1109\/20.539104","volume":"32","year":"1996","journal-title":"IEEE Trans. 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