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The reduction in the Si-db defect density is confirmed by photothermal deflection spectroscopy and photoconductivity measurements on thin Si-NPs films.<\/jats:p>","DOI":"10.1063\/1.3428359","type":"journal-article","created":{"date-parts":[[2010,5,13]],"date-time":"2010-05-13T22:51:21Z","timestamp":1273791081000},"update-policy":"https:\/\/doi.org\/10.1063\/aip-crossmark-policy-page","source":"Crossref","is-referenced-by-count":35,"title":["Defect reduction in silicon nanoparticles by low-temperature vacuum annealing"],"prefix":"10.1063","volume":"96","author":[{"given":"S.","family":"Niesar","sequence":"first","affiliation":[{"name":"Technische Universit\u00e4t M\u00fcnchen 1 Walter Schottky Institut, , Am Coulombwall 3, 85748 Garching, Germany"}]},{"given":"A. R.","family":"Stegner","sequence":"additional","affiliation":[{"name":"Technische Universit\u00e4t M\u00fcnchen 1 Walter Schottky Institut, , Am Coulombwall 3, 85748 Garching, Germany"}]},{"given":"R. N.","family":"Pereira","sequence":"additional","affiliation":[{"name":"Universidade de Aveiro 2 Departamento de F\u00edsica and I3N, , 3810-193 Aveiro, Portugal"}]},{"given":"M.","family":"Hoeb","sequence":"additional","affiliation":[{"name":"Technische Universit\u00e4t M\u00fcnchen 1 Walter Schottky Institut, , Am Coulombwall 3, 85748 Garching, Germany"}]},{"given":"H.","family":"Wiggers","sequence":"additional","affiliation":[{"name":"Universit\u00e4t Duisburg-Essen 3 Institut f\u00fcr Verbrennung und Gasdynamik and CeNIDE, Center for NanoIntegration Duisburg-Essen, , Lotharstr. 1, 47048 Duisburg, Germany"}]},{"given":"M. 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