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Conventional multilayer film pitch standards offer excellent uniformity and consistency but are too small for wafer-level applications. Embedding them into a wafer enables wafer-level standards, while changes in sample pose during embedding (tilt, yaw, and roll) introduce pitch measurement errors. Conventional single characterization methods remain limited in quantitatively characterizing the three-dimensional orientation of embedded structures. This paper proposes a pose-based pitch correction method using stylus profilometry for tilt and yaw characterization and scanning electron microscopy (SEM) imaging for roll determination. By measuring the overall pose of the embedded structure with a stylus profiler and combining SEM measurements before and after embedding, a geometric correction model is established to compensate for pose-induced errors in post-embedding pitch measurements. The experimental results show that the pitch measurement deviation increases with yaw angle. After geometric correction, all deviations from the pre-embedding reference values were reduced to below 1 nm, with expanded uncertainties of 1.17\u20131.34 nm (\n                    <jats:italic>k<\/jats:italic>\n                    = 2), demonstrating the effectiveness of the proposed method. This method has the potential to provide a unified correction basis and data support for the pitch calibration of similar embedded structure samples in future studies.\n                  <\/jats:p>","DOI":"10.1088\/1361-6528\/aeae46","type":"journal-article","created":{"date-parts":[[2026,9,30]],"date-time":"2026-09-30T22:49:03Z","timestamp":1790808543000},"page":"425301","update-policy":"https:\/\/doi.org\/10.1088\/crossmark-policy","source":"Crossref","is-referenced-by-count":0,"title":["Characterization and correction of measurement variations in wafer-embedded multilayer pitch standards"],"prefix":"10.1088","volume":"37","author":[{"given":"Xuehan","family":"Li","sequence":"first","affiliation":[{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Jingtong","family":"Feng","sequence":"additional","affiliation":[{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0009-0008-8384-6066","authenticated-orcid":true,"given":"Dongbai","family":"Xue","sequence":"additional","affiliation":[{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0009-0003-7521-4118","authenticated-orcid":true,"given":"Jingyuan","family":"Zhu","sequence":"additional","affiliation":[{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Yuying","family":"Xie","sequence":"additional","affiliation":[{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-5956-6880","authenticated-orcid":true,"given":"Xiao","family":"Deng","sequence":"additional","affiliation":[{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-2161-6934","authenticated-orcid":true,"given":"Zhanshan","family":"Wang","sequence":"additional","affiliation":[{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Tongbao","family":"Li","sequence":"additional","affiliation":[{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-3855-483X","authenticated-orcid":true,"given":"Xinbin","family":"Cheng","sequence":"additional","affiliation":[{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"},{"name":"Tongji University"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"266","published-online":{"date-parts":[[2026,10,16]]},"reference":[{"key":"nanoaeae46bib1","author":"Obeng","year":"2025","type":"conference-proceedings"},{"key":"nanoaeae46bib2","doi-asserted-by":"publisher","first-page":"10","DOI":"10.12338\/j.issn.2096-9015.2023.0150","type":"journal-article","article-title":"Development of a 22 nano line width standard based on intrinsic silicon lattice constants","volume":"68","author":"Wang","year":"2024","journal-title":"Metrol. 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All rights, including for text and data mining, AI training, and similar technologies, are reserved.","name":"copyright_information","label":"Copyright Information"},{"value":"2026-07-27","name":"date_received","label":"Date Received","group":{"name":"publication_dates","label":"Publication dates"}},{"value":"2026-09-30","name":"date_accepted","label":"Date Accepted","group":{"name":"publication_dates","label":"Publication dates"}},{"value":"2026-10-16","name":"date_epub","label":"Online publication date","group":{"name":"publication_dates","label":"Publication dates"}}]}}