{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,6,12]],"date-time":"2026-06-12T21:12:41Z","timestamp":1781298761420,"version":"3.54.1"},"reference-count":31,"publisher":"American Physical Society (APS)","issue":"26","license":[{"start":{"date-parts":[[2017,12,28]],"date-time":"2017-12-28T00:00:00Z","timestamp":1514419200000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/link.aps.org\/licenses\/aps-default-license"}],"funder":[{"DOI":"10.13039\/501100003246","name":"Nederlandse Organisatie voor Wetenschappelijk Onderzoek","doi-asserted-by":"publisher","id":[{"id":"10.13039\/501100003246","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100006339","name":"ASML","doi-asserted-by":"publisher","id":[{"id":"10.13039\/501100006339","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/100004316","name":"International Business Machines Corporation","doi-asserted-by":"publisher","id":[{"id":"10.13039\/100004316","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Phys. Rev. Lett."],"DOI":"10.1103\/physrevlett.119.266803","type":"journal-article","created":{"date-parts":[[2018,1,10]],"date-time":"2018-01-10T16:14:35Z","timestamp":1515600875000},"source":"Crossref","is-referenced-by-count":7,"title":["Charge Catastrophe and Dielectric Breakdown During Exposure of Organic Thin Films to Low-Energy Electron Radiation"],"prefix":"10.1103","volume":"119","author":[{"given":"A.","family":"Thete","sequence":"first","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"D.","family":"Geelen","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"S.\u2009J.","family":"van der Molen","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"R.\u2009M.","family":"Tromp","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"16","published-online":{"date-parts":[[2017,12,28]]},"reference":[{"key":"PhysRevLett.119.266803Cc1R1","volume-title":"EUV Lithography","year":"2009"},{"key":"PhysRevLett.119.266803Cc2R1","doi-asserted-by":"crossref","DOI":"10.1007\/978-1-4939-0935-3","volume-title":"Surface Microscopy with Low Energy Electrons","author":"Ernst Bauer","year":"2014"},{"key":"PhysRevLett.119.266803Cc3R1","doi-asserted-by":"publisher","DOI":"10.1142\/S0218625X98001523"},{"key":"PhysRevLett.119.266803Cc4R2","doi-asserted-by":"publisher","DOI":"10.1147\/JRD.2011.2150691"},{"key":"PhysRevLett.119.266803Cc5R1","doi-asserted-by":"publisher","DOI":"10.1016\/0168-583X(94)00723-3"},{"key":"PhysRevLett.119.266803Cc6R1","doi-asserted-by":"publisher","DOI":"10.1147\/rd.212.0121"},{"key":"PhysRevLett.119.266803Cc7R1","doi-asserted-by":"publisher","DOI":"10.1116\/1.575014"},{"key":"PhysRevLett.119.266803Cc8R1","doi-asserted-by":"publisher","DOI":"10.1002\/polb.1993.090311211"},{"key":"PhysRevLett.119.266803Cc9R1","volume-title":"The Radiation Chemistry of Macromolecules Volumes I and II","year":"1972"},{"key":"PhysRevLett.119.266803Cc10R1","doi-asserted-by":"publisher","DOI":"10.1063\/1.4992083"},{"key":"PhysRevLett.119.266803Cc11R1","volume-title":"Catastrophe Theory for Scientists and Engineers","author":"R. Gilmore","year":"1981"},{"key":"PhysRevLett.119.266803Cc12R1","doi-asserted-by":"publisher","DOI":"10.1016\/j.chemphys.2006.07.005"},{"key":"PhysRevLett.119.266803Cc13R1","doi-asserted-by":"publisher","DOI":"10.1088\/0953-8984\/21\/31\/314007"},{"key":"PhysRevLett.119.266803Cc14R1","volume-title":"Electronic Processes in Ionic Crystal","author":"N.\u2009F. Mott","year":"1940"},{"key":"PhysRevLett.119.266803Cc14R2","doi-asserted-by":"crossref","DOI":"10.1093\/oso\/9780195129632.001.0001","volume-title":"Electronic Processes in Organic Crystals and Polymer","author":"M. Pope","year":"1999"},{"key":"PhysRevLett.119.266803Cc15R1","doi-asserted-by":"publisher","DOI":"10.1111\/j.0022-2720.2004.01345.x"},{"key":"PhysRevLett.119.266803Cc16R1","doi-asserted-by":"publisher","DOI":"10.1016\/j.nimb.2005.10.006"},{"key":"PhysRevLett.119.266803Cc17R1","first-page":"1760","volume":"NS-27","author":"E.\u2009A. Burke","year":"1980","journal-title":"IEEE Trans. Nucl. Sci.","ISSN":"https:\/\/id.crossref.org\/issn\/0018-9499","issn-type":"print"},{"key":"PhysRevLett.119.266803Cc18R1","doi-asserted-by":"publisher","DOI":"10.1016\/S0165-5817(97)84681-5"},{"key":"PhysRevLett.119.266803Cc19R1","doi-asserted-by":"publisher","DOI":"10.1002\/sia.2107"},{"key":"PhysRevLett.119.266803Cc20R1","doi-asserted-by":"publisher","DOI":"10.1016\/j.apsusc.2014.01.070"},{"key":"PhysRevLett.119.266803Cc21R1","doi-asserted-by":"publisher","DOI":"10.1016\/0039-6028(95)00474-2"},{"key":"PhysRevLett.119.266803Cc22R1","doi-asserted-by":"publisher","DOI":"10.1117\/1.3373517"},{"key":"PhysRevLett.119.266803Cc23R1","doi-asserted-by":"publisher","DOI":"10.1063\/1.1568344"},{"key":"PhysRevLett.119.266803Cc25R1","doi-asserted-by":"publisher","DOI":"10.1016\/j.jmps.2013.09.009"},{"key":"PhysRevLett.119.266803Cc26R1","first-page":"90511B","volume":"XXXI","author":"B. Cardineau","year":"2014","journal-title":"Proc. SPIE 9051, Advances in Patterning Materials and Processes"},{"key":"PhysRevLett.119.266803Cc28R1","first-page":"97762O","volume":"VII","author":"L. Wisehart","year":"2016","journal-title":"Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography"},{"key":"PhysRevLett.119.266803Cc29R1","first-page":"942208","volume":"VI","author":"A. Narasimhan","year":"2015","journal-title":"Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography"},{"key":"PhysRevLett.119.266803Cc30R1","doi-asserted-by":"publisher","DOI":"10.1103\/PhysRevLett.100.126803"},{"key":"PhysRevLett.119.266803Cc31R1","doi-asserted-by":"publisher","DOI":"10.1016\/j.apsusc.2008.01.139"},{"key":"PhysRevLett.119.266803Cc32R1","doi-asserted-by":"publisher","DOI":"10.1038\/ncomms9926"}],"container-title":["Physical Review Letters"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/link.aps.org\/article\/10.1103\/PhysRevLett.119.266803","content-type":"unspecified","content-version":"vor","intended-application":"syndication"},{"URL":"http:\/\/harvest.aps.org\/v2\/journals\/articles\/10.1103\/PhysRevLett.119.266803\/fulltext","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,1,3]],"date-time":"2025-01-03T00:11:12Z","timestamp":1735863072000},"score":1,"resource":{"primary":{"URL":"https:\/\/link.aps.org\/doi\/10.1103\/PhysRevLett.119.266803"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2017,12,28]]},"references-count":31,"journal-issue":{"issue":"26","published-print":{"date-parts":[[2017,12]]}},"URL":"https:\/\/doi.org\/10.1103\/physrevlett.119.266803","relation":{},"ISSN":["0031-9007","1079-7114"],"issn-type":[{"value":"0031-9007","type":"print"},{"value":"1079-7114","type":"electronic"}],"subject":[],"published":{"date-parts":[[2017,12,28]]},"article-number":"266803"}}