{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,9,3]],"date-time":"2024-09-03T23:08:10Z","timestamp":1725404890252},"reference-count":10,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2002]]},"DOI":"10.1109\/acc.2002.1024522","type":"proceedings-article","created":{"date-parts":[[2003,6,25]],"date-time":"2003-06-25T22:06:50Z","timestamp":1056578810000},"page":"3813-3816 vol.5","source":"Crossref","is-referenced-by-count":0,"title":["3D thermal modeling of a plasma assisted chemical vapor deposition process"],"prefix":"10.1109","author":[{"given":"S.","family":"Rouquette","sequence":"first","affiliation":[]},{"given":"L.","family":"Autrique","sequence":"additional","affiliation":[]},{"given":"C.","family":"Chaussavoine","sequence":"additional","affiliation":[]},{"given":"L.","family":"Thomas","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"3","article-title":"Optimal sensor strategy for parametric identification of a thermal system","author":"autrique","year":"2000","journal-title":"Proceedings of IFAC-SYSID 2000 Santa Barbara USA"},{"key":"2","doi-asserted-by":"publisher","DOI":"10.1007\/978-3-642-76436-3"},{"key":"10","doi-asserted-by":"publisher","DOI":"10.1016\/S0257-8972(01)01081-7"},{"key":"1","doi-asserted-by":"publisher","DOI":"10.1016\/S0017-9310(00)00186-1"},{"key":"7","doi-asserted-by":"publisher","DOI":"10.1115\/1.2822532"},{"key":"6","doi-asserted-by":"publisher","DOI":"10.1115\/1.2824169"},{"key":"5","article-title":"Empirical model-building and response surfaces","author":"box","year":"1987","journal-title":"Wiley Series in Probability and Mathematical Statistics"},{"key":"4","first-page":"348","author":"beck","year":"1977","journal-title":"Parameter Estimation in Engineering and Science"},{"key":"9","first-page":"727","article-title":"Estimation de tempe?ratures de surface de substrat dans un proce?de? de De?po?t Chimique en phase Vapeur Assiste? Plasma (PACVD)","author":"rouquette","year":"2001","journal-title":"Congre?s Franc?ais de Thermique SFT 2001"},{"key":"8","first-page":"704","author":"montgomery","year":"1997","journal-title":"Design and Analysis of Experiments"}],"event":{"name":"Proceedings of 2002 American Control Conference","start":{"date-parts":[[2002,5,8]]},"location":"Anchorage, AK, USA","end":{"date-parts":[[2002,5,10]]}},"container-title":["Proceedings of the 2002 American Control Conference (IEEE Cat. No.CH37301)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx5\/7965\/22028\/01024522.pdf?arnumber=1024522","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2017,3,10]],"date-time":"2017-03-10T21:44:07Z","timestamp":1489182247000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/1024522\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2002]]},"references-count":10,"URL":"https:\/\/doi.org\/10.1109\/acc.2002.1024522","relation":{},"subject":[],"published":{"date-parts":[[2002]]}}}