{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,5,29]],"date-time":"2026-05-29T11:41:03Z","timestamp":1780054863163,"version":"3.54.0"},"reference-count":20,"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","license":[{"start":{"date-parts":[[2024,1,1]],"date-time":"2024-01-01T00:00:00Z","timestamp":1704067200000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by-nc-nd\/4.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["IEEE Access"],"published-print":{"date-parts":[[2024]]},"DOI":"10.1109\/access.2024.3390936","type":"journal-article","created":{"date-parts":[[2024,4,18]],"date-time":"2024-04-18T13:32:46Z","timestamp":1713447166000},"page":"58490-58501","source":"Crossref","is-referenced-by-count":5,"title":["Development of a Lithography Simulation Tool Set in Various Optical Conditions for Source Mask Optimization"],"prefix":"10.1109","volume":"12","author":[{"ORCID":"https:\/\/orcid.org\/0009-0002-3845-0077","authenticated-orcid":false,"given":"Masaki","family":"Kuramochi","sequence":"first","affiliation":[{"name":"School of Computer Science, The University of Aizu, Aizuwakamatsu, Japan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-4063-2497","authenticated-orcid":false,"given":"Yukihide","family":"Kohira","sequence":"additional","affiliation":[{"name":"School of Computer Science, The University of Aizu, Aizuwakamatsu, Japan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Hiroyoshi","family":"Tanabe","sequence":"additional","affiliation":[{"name":"Tokyo Institute of Technology, Tokyo, Japan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Tetsuaki","family":"Matsunawa","sequence":"additional","affiliation":[{"name":"KIOXIA Corporation, Yokohama, Japan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-1955-7357","authenticated-orcid":false,"given":"Chikaaki","family":"Kodama","sequence":"additional","affiliation":[{"name":"KIOXIA Corporation, Yokohama, Japan"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"263","reference":[{"key":"ref1","volume-title":"Principles of Optics","author":"Born","year":"1980"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1117\/12.617431"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2013.6691131"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/TVLSI.2016.2616840"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1109\/DAC.2018.8465816"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1117\/12.2552514"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2019.2939329"},{"key":"ref8","first-page":"1","article-title":"Neural-ILT: Migrating ILT to neural networks for mask printability and complexity co-optimization","volume-title":"Proc. 39th Int. Conf. Computer-Aided Design","author":"Jiang"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD51958.2021.9643464"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2021.3109556"},{"key":"ref11","volume-title":"VLSI Design & Automation Group","year":"2024"},{"key":"ref12","volume-title":"Lithography-Simulation","author":"Pierre","year":"2024"},{"key":"ref13","volume-title":"Optolithium","author":"Gladkikh","year":"2024"},{"key":"ref14","doi-asserted-by":"publisher","DOI":"10.1002\/9780470723876"},{"key":"ref15","article-title":"Study on formulation of resist model into linear equations and its solution in semiconductor lithography","author":"Kimura","year":"2021"},{"key":"ref16","doi-asserted-by":"publisher","DOI":"10.1364\/JOSAA.11.002438"},{"key":"ref17","article-title":"Fast optical and process proximity correction algorithms for integrated circuit manufacturing","author":"Cobb","year":"1998"},{"key":"ref18","volume-title":"FFTW User\u2019s Manual","year":"2024"},{"key":"ref19","volume-title":"LAPACK Users\u2019 Guide","year":"2024"},{"issue":"6","key":"ref20","first-page":"415","article-title":"Comparison of super-resolution techniques in the optical system of steppers","volume":"21","author":"Tanabe","year":"1992","journal-title":"Jpn. J. Opt., Publication Opt. Soc. Jpn."}],"container-title":["IEEE Access"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/6287639\/10380310\/10504808.pdf?arnumber=10504808","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,11,21]],"date-time":"2025-11-21T18:44:18Z","timestamp":1763750658000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10504808\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2024]]},"references-count":20,"URL":"https:\/\/doi.org\/10.1109\/access.2024.3390936","relation":{},"ISSN":["2169-3536"],"issn-type":[{"value":"2169-3536","type":"electronic"}],"subject":[],"published":{"date-parts":[[2024]]}}}