{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,1,29]],"date-time":"2026-01-29T23:09:53Z","timestamp":1769728193574,"version":"3.49.0"},"reference-count":42,"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","license":[{"start":{"date-parts":[[2024,1,1]],"date-time":"2024-01-01T00:00:00Z","timestamp":1704067200000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by-nc-nd\/4.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["IEEE Access"],"published-print":{"date-parts":[[2024]]},"DOI":"10.1109\/access.2024.3517875","type":"journal-article","created":{"date-parts":[[2024,12,16]],"date-time":"2024-12-16T19:28:05Z","timestamp":1734377285000},"page":"191517-191526","source":"Crossref","is-referenced-by-count":4,"title":["Machine Learning-Enhanced Model-Based Optical Proximity Correction by Using Convolutional Neural Network-Based Variable Threshold Method"],"prefix":"10.1109","volume":"12","author":[{"given":"Jinhao","family":"Zhu","sequence":"first","affiliation":[{"name":"School of Micro-Electronics, Fudan University, Shanghai, China"}]},{"given":"Zhiwei","family":"Ren","sequence":"additional","affiliation":[{"name":"School of Micro-Electronics, Fudan University, Shanghai, China"}]},{"given":"Ying","family":"Li","sequence":"additional","affiliation":[{"name":"National Integrated Circuit Innovation Center, Shanghai, China"}]},{"given":"Xianhe","family":"Liu","sequence":"additional","affiliation":[{"name":"School of Micro-Electronics, Fudan University, Shanghai, China"}]},{"given":"Qiang","family":"Wu","sequence":"additional","affiliation":[{"name":"School of Micro-Electronics, Fudan University, Shanghai, China"}]},{"given":"Yanli","family":"Li","sequence":"additional","affiliation":[{"name":"School of Micro-Electronics, Fudan University, Shanghai, China"}]},{"ORCID":"https:\/\/orcid.org\/0009-0003-3369-7318","authenticated-orcid":false,"given":"Qi","family":"Wang","sequence":"additional","affiliation":[{"name":"School of Micro-Electronics, Fudan University, Shanghai, China"}]}],"member":"263","reference":[{"issue":"1","key":"ref1","first-page":"30","article-title":"Development and future outlook of modern lithography machines","volume":"4","author":"Wu","year":"2022","journal-title":"Micro\/nano Electron. Intell. Manuf."},{"issue":"9","key":"ref2","article-title":"Evolution and updates of advanced photolithography technology","volume":"59","author":"Li","year":"2022","journal-title":"Laser Optoelectron. Prog."},{"issue":"9","key":"ref3","first-page":"16","article-title":"Advanced computational lithography","volume":"59","author":"Yuan","year":"2022","journal-title":"Laser Optoelectron. Prog."},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/ACCESS.2024.3390936"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1109\/ACCESS.2022.3171042"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1117\/12.608020"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1364\/OE.17.005783"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1117\/12.276060"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1117\/12.863973"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1117\/12.2297273"},{"key":"ref11","first-page":"204","article-title":"0.25\u03bcm logic manufacturability using practical 2-D optical proximity correction","volume-title":"Proc. SPIE","volume":"3334","author":"Kling"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1117\/12.175422"},{"key":"ref13","first-page":"438","article-title":"Considerations of model based OPC verification for sub-70 nm memory device","volume-title":"Proc. SPIE","volume":"6156","author":"Kim"},{"key":"ref14","doi-asserted-by":"publisher","DOI":"10.1631\/jzus.C1000219"},{"key":"ref15","doi-asserted-by":"publisher","DOI":"10.1098\/rspa.1953.0071"},{"key":"ref16","doi-asserted-by":"publisher","DOI":"10.1117\/12.240907"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.1109\/CSTIC.2018.8369218"},{"key":"ref18","doi-asserted-by":"publisher","DOI":"10.2494\/photopolymer.21.421"},{"key":"ref19","doi-asserted-by":"publisher","DOI":"10.1117\/12.2083674"},{"key":"ref20","doi-asserted-by":"publisher","DOI":"10.1117\/12.474508"},{"key":"ref21","doi-asserted-by":"publisher","DOI":"10.1117\/12.2086346"},{"key":"ref22","doi-asserted-by":"publisher","DOI":"10.1117\/12.896909"},{"key":"ref23","first-page":"1033","article-title":"Variable threshold optical proximity correction (OPC) models for high performance 0.18 \u03bcm process","volume-title":"Proc. SPIE","volume":"4000","author":"Liao"},{"key":"ref24","doi-asserted-by":"publisher","DOI":"10.1117\/12.275977"},{"key":"ref25","first-page":"1041","article-title":"Optical proximity correction considering mask manufacturability and its application to 0.25\u03bcm DRAM for enhanced device performance","volume-title":"Proc. SPIE","volume":"2000","author":"Park"},{"key":"ref26","first-page":"217","article-title":"Uncertainty aware site selection method for OPC model calibration","volume-title":"Proc. SPIE","volume":"9426","author":"Coskun"},{"key":"ref27","doi-asserted-by":"publisher","DOI":"10.1117\/12.746576"},{"key":"ref28","doi-asserted-by":"publisher","DOI":"10.1016\/j.mee.2016.10.006"},{"key":"ref29","doi-asserted-by":"publisher","DOI":"10.1109\/MWSCAS.2018.8623985"},{"key":"ref30","first-page":"63","article-title":"Machine learning (ML)-guided OPC using basis functions of polar Fourier transform","volume-title":"Proc. SPIE","volume":"9780","author":"Choi"},{"key":"ref31","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2018.2824255"},{"key":"ref32","doi-asserted-by":"publisher","DOI":"10.1109\/TSM.2021.3072668"},{"key":"ref33","doi-asserted-by":"publisher","DOI":"10.1364\/AO.454357"},{"key":"ref34","doi-asserted-by":"publisher","DOI":"10.1109\/TSM.2022.3217326"},{"key":"ref35","doi-asserted-by":"publisher","DOI":"10.3390\/electronics8080832"},{"key":"ref36","doi-asserted-by":"publisher","DOI":"10.1631\/FITEE.1700808"},{"key":"ref37","doi-asserted-by":"publisher","DOI":"10.1109\/TNNLS.2021.3084827"},{"key":"ref38","first-page":"177","article-title":"Simple method for decreasing wafer topography effect for implant mask","volume-title":"Proc. SPIE","volume":"9780","author":"You"},{"key":"ref39","first-page":"273","article-title":"Enhanced patterning by tilted ion implantation","volume-title":"Proc. SPIE","volume":"9777","author":"Kim"},{"key":"ref40","volume-title":"Linear Algebra and Its Applications","author":"Lay","year":"2014"},{"key":"ref41","doi-asserted-by":"publisher","DOI":"10.1016\/j.foodcont.2024.110823"},{"key":"ref42","doi-asserted-by":"publisher","DOI":"10.3390\/rs15133422"}],"container-title":["IEEE Access"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx8\/6287639\/10380310\/10802911.pdf?arnumber=10802911","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,1,15]],"date-time":"2025-01-15T20:08:53Z","timestamp":1736971733000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10802911\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2024]]},"references-count":42,"URL":"https:\/\/doi.org\/10.1109\/access.2024.3517875","relation":{},"ISSN":["2169-3536"],"issn-type":[{"value":"2169-3536","type":"electronic"}],"subject":[],"published":{"date-parts":[[2024]]}}}