{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,8,18]],"date-time":"2026-08-18T00:13:22Z","timestamp":1787012002699,"version":"3.56.0"},"reference-count":16,"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","license":[{"start":{"date-parts":[[2025,1,1]],"date-time":"2025-01-01T00:00:00Z","timestamp":1735689600000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by-nc-nd\/4.0\/"}],"funder":[{"DOI":"10.13039\/501100020950","name":"National Science and Technology Council of Taiwan, ROC","doi-asserted-by":"publisher","award":["MOST 110-2221-E-168-001-MY3"],"award-info":[{"award-number":["MOST 110-2221-E-168-001-MY3"]}],"id":[{"id":"10.13039\/501100020950","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100020950","name":"National Science and Technology Council of Taiwan, ROC","doi-asserted-by":"publisher","award":["MOST 111-2221-E-168-001-MY3"],"award-info":[{"award-number":["MOST 111-2221-E-168-001-MY3"]}],"id":[{"id":"10.13039\/501100020950","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100020950","name":"National Science and Technology Council of Taiwan, ROC","doi-asserted-by":"publisher","award":["NSTC113-2640-E006-007"],"award-info":[{"award-number":["NSTC113-2640-E006-007"]}],"id":[{"id":"10.13039\/501100020950","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["IEEE Access"],"published-print":{"date-parts":[[2025]]},"DOI":"10.1109\/access.2025.3563689","type":"journal-article","created":{"date-parts":[[2025,4,24]],"date-time":"2025-04-24T13:06:45Z","timestamp":1745500005000},"page":"81417-81422","source":"Crossref","is-referenced-by-count":3,"title":["Improved Resistive Switching Characteristics by O\n                    <sub>2<\/sub>\n                    Plasma Treatment in Tri-Layer HfO\n                    <sub>2<\/sub>\n                    \/Al\n                    <sub>2<\/sub>\n                    O\n                    <sub>3<\/sub>\n                    \/HfO\n                    <sub>2<\/sub>\n                    RRAM"],"prefix":"10.1109","volume":"13","author":[{"ORCID":"https:\/\/orcid.org\/0000-0003-4989-2292","authenticated-orcid":false,"given":"Shyh-Jer","family":"Huang","sequence":"first","affiliation":[{"name":"Department of Electro-Optical Engineering, National Formosa University, Yunlin, Taiwan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Wei-Hsuan","family":"Hsieh","sequence":"additional","affiliation":[{"name":"Department of Electrical Engineering Institute of Microelectronics, National Cheng Kung University, Tainan, Taiwan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-0641-2033","authenticated-orcid":false,"given":"Rong-Ming","family":"Ko","sequence":"additional","affiliation":[{"name":"National Cheng-Kung University, Tainan, Taiwan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-9727-8118","authenticated-orcid":false,"given":"Zi-Hao","family":"Wang","sequence":"additional","affiliation":[{"name":"National Cheng-Kung University, Tainan, Taiwan"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-9581-8486","authenticated-orcid":false,"given":"Yan-Kuin","family":"Su","sequence":"additional","affiliation":[{"name":"Department of Electrical Engineering Institute of Microelectronics, National Cheng Kung University, Tainan, Taiwan"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"263","reference":[{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1002\/smll.201604306"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1038\/nmat3070"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1002\/adfm.201503493"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1002\/adma.200900375"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1039\/C8CP03492C"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1016\/S1369-7021(08)70119-6"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1016\/j.mattod.2015.11.009"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1186\/s11671-015-0846-y"},{"issue":"2","key":"ref9","doi-asserted-by":"crossref","DOI":"10.1088\/1361-6463\/aa9c15","article-title":"Characteristics of multilevel storage and switching dynamics in resistive switching cell of Al2O3\/HfO2\/Al2O3 sandwich structure","volume":"51","author":"Liu","year":"2017","journal-title":"J. Phys. D, Appl. Phys."},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.3390\/nano10102069"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1039\/D1RA08103A"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1016\/j.surfcoat.2021.127539"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.3390\/nano9101355"},{"key":"ref14","doi-asserted-by":"publisher","DOI":"10.1038\/ncomms15173"},{"key":"ref15","doi-asserted-by":"publisher","DOI":"10.1039\/C8FD00127H"},{"key":"ref16","doi-asserted-by":"publisher","DOI":"10.1134\/S1063739721050024"}],"container-title":["IEEE Access"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx8\/6287639\/10820123\/10974951.pdf?arnumber=10974951","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,5,21]],"date-time":"2025-05-21T01:03:11Z","timestamp":1747789391000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10974951\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025]]},"references-count":16,"URL":"https:\/\/doi.org\/10.1109\/access.2025.3563689","relation":{},"ISSN":["2169-3536"],"issn-type":[{"value":"2169-3536","type":"electronic"}],"subject":[],"published":{"date-parts":[[2025]]}}}