{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,10,17]],"date-time":"2026-10-17T16:32:53Z","timestamp":1792254773277,"version":"4.4.0"},"reference-count":10,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2015,11]]},"DOI":"10.1109\/asicon.2015.7516981","type":"proceedings-article","created":{"date-parts":[[2016,7,26]],"date-time":"2016-07-26T16:38:31Z","timestamp":1469551111000},"page":"1-4","source":"Crossref","is-referenced-by-count":3,"title":["Electrical Overstress (EOS): Challenges for component and system-level co-design"],"prefix":"10.1109","author":[{"given":"Steven H.","family":"Voldman","sequence":"first","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"263","reference":[{"key":"ref4","first-page":"44","article-title":"Origins of EOS in Manufacturing Environment","author":"kraz","year":"2009","journal-title":"Proceedings of the Electrical Overstress\/Electrostatic Discharge (EOS\/ESD) Symposium"},{"key":"ref3","article-title":"ESD Basics: From Semiconductor Manufacturing to Product Use","author":"voldman","year":"2014"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1002\/9781119991137"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1002\/9781118861899"},{"key":"ref5","first-page":"220","article-title":"The Impact of Electrical Overstress on the Design, Handling, and Application of Integrated Circuits","author":"kaschani","year":"2011","journal-title":"Proceedings of the Electrical Overstress\/Electrostatic Discharge (EOS\/ESD) Symposium"},{"key":"ref8","article-title":"Nano ESD: Electrostatic Discharge in the Nanoelectric Era, Chapter 15, Nanoelectronics: Nanowires, Molecular Electronics, and Nanodevices","author":"voldman","year":"2011"},{"key":"ref7","article-title":"ESD: Physics and Devices","author":"voldman","year":"2013"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1002\/9781118443323"},{"key":"ref9","article-title":"ESD: RF Technology and Circuits, Publishing House of Electronic Industry","author":"voldman","year":"2008"},{"key":"ref1","article-title":"Electrical Overstress (EOS): Devices, Circuits, and Systems","author":"voldman","year":"2014"}],"event":{"name":"2015 IEEE 11th International Conference on ASIC (ASICON )","location":"Chengdu, China","start":{"date-parts":[[2015,11,3]]},"end":{"date-parts":[[2015,11,6]]}},"container-title":["2015 IEEE 11th International Conference on ASIC (ASICON)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/7506193\/7516874\/07516981.pdf?arnumber=7516981","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2017,3,17]],"date-time":"2017-03-17T12:36:32Z","timestamp":1489754192000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/7516981\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2015,11]]},"references-count":10,"URL":"https:\/\/doi.org\/10.1109\/asicon.2015.7516981","relation":{},"subject":[],"published":{"date-parts":[[2015,11]]}}}