{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,9,29]],"date-time":"2025-09-29T11:55:39Z","timestamp":1759146939917,"version":"3.28.0"},"reference-count":25,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2016,1]]},"DOI":"10.1109\/aspdac.2016.7427995","type":"proceedings-article","created":{"date-parts":[[2016,3,10]],"date-time":"2016-03-10T21:48:08Z","timestamp":1457646488000},"page":"95-102","source":"Crossref","is-referenced-by-count":19,"title":["Contact layer decomposition to enable DSA with multi-patterning technique for standard cell based layout"],"prefix":"10.1109","author":[{"given":"Zigang","family":"Xiao","sequence":"first","affiliation":[]},{"given":"Chun-Xun","family":"Lin","sequence":"additional","affiliation":[]},{"given":"Martin D.F.","family":"Wong","sequence":"additional","affiliation":[]},{"given":"Hongbo","family":"Zhang","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2013.6691094"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2014.7001341"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1109\/ASPDAC.2012.6165047"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.1109\/ASPDAC.2014.6742880"},{"key":"ref14","first-page":"90520p","article-title":"Hybrid lithography for triple patterning decomposition and e-beam lithography","author":"tian","year":"2014","journal-title":"SPIE Advanced Lithography International Society for Optics and Photonics"},{"key":"ref15","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2013.6691117"},{"key":"ref16","first-page":"90492j","article-title":"Dsa-aware detailed routing for via layer optimization","volume":"9049","author":"du","year":"2014"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.1117\/12.2025688"},{"key":"ref18","article-title":"Dsa template optimization for contact layer in 1d standard cell design","volume":"9049","author":"xiao","year":"2014","journal-title":"SPIE Advanced Lithography"},{"key":"ref19","first-page":"90530r","article-title":"Physical verification and manufacturing of contact\/via layers using grapho-epitaxy dsa processes","author":"torres","year":"2014","journal-title":"SPIE Advanced Lithography International Society for Optics and Photonics"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1117\/12.912804"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1117\/12.918312"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1117\/12.2011238"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1002\/adma.201200265"},{"key":"ref8","first-page":"92310t","article-title":"Challenges and opportunities in applying grapho-epitaxy dsa lithography to metal cut and contact\/via applications","author":"ma","year":"2014","journal-title":"30th European Mask and Lithography Conference International Society for Optics and Photonics"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1063\/1.3187936"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1109\/IEDM.2011.6131510"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2008.4681616"},{"key":"ref1","first-page":"615301","article-title":"Marching to the beat of moore's law","author":"borodovsky","year":"2006","journal-title":"SPIE 31st International Symposium on Advanced Lithography International Society for Optics and Photonics"},{"key":"ref20","article-title":"Directed self-assembly (dsa) template pattern verification","author":"xtao","year":"2014","journal-title":"DAC '14 Proceedings of the 51 th Annual Design Automation Conference"},{"key":"ref22","first-page":"94270p","article-title":"Incorporating dsa in multipatterning semiconductor manufacturing technologies","author":"badr","year":"2015","journal-title":"SPIE Advanced Lithography International Society for Optics and Photonics"},{"key":"ref21","doi-asserted-by":"publisher","DOI":"10.1109\/ASPDAC.2015.7059081"},{"key":"ref24","article-title":"Fixed-parameter tractability","author":"samer","year":"2009","journal-title":"Handbook of Satisfiability no part 1"},{"key":"ref23","doi-asserted-by":"publisher","DOI":"10.1137\/130907392"},{"journal-title":"California (2008) 45nm open cell library","year":"2008","author":"nangate","key":"ref25"}],"event":{"name":"2016 21st Asia and South Pacific Design Automation Conference (ASP-DAC)","start":{"date-parts":[[2016,1,25]]},"location":"Macao, Macao","end":{"date-parts":[[2016,1,28]]}},"container-title":["2016 21st Asia and South Pacific Design Automation Conference (ASP-DAC)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/7422345\/7427971\/7427995.pdf?arnumber=7427995","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2016,9,30]],"date-time":"2016-09-30T01:32:29Z","timestamp":1475199149000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/7427995\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2016,1]]},"references-count":25,"URL":"https:\/\/doi.org\/10.1109\/aspdac.2016.7427995","relation":{},"subject":[],"published":{"date-parts":[[2016,1]]}}}