{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,9,16]],"date-time":"2025-09-16T17:20:48Z","timestamp":1758043248255,"version":"3.44.0"},"reference-count":21,"publisher":"IEEE","license":[{"start":{"date-parts":[[2025,8,25]],"date-time":"2025-08-25T00:00:00Z","timestamp":1756080000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2025,8,25]],"date-time":"2025-08-25T00:00:00Z","timestamp":1756080000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2025,8,25]]},"DOI":"10.1109\/ccta53793.2025.11151477","type":"proceedings-article","created":{"date-parts":[[2025,9,11]],"date-time":"2025-09-11T17:29:23Z","timestamp":1757611763000},"page":"321-326","source":"Crossref","is-referenced-by-count":0,"title":["Optimal Co-Design of Sensor Placement and State Observer for Lithography Applications"],"prefix":"10.1109","author":[{"given":"R.P.P.F.","family":"Goetz","sequence":"first","affiliation":[{"name":"Eindhoven University of Technology,Department of Mechanical Engineering,Eindhoven,The Netherlands,5600 MB"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"N.","family":"Van De Wouw","sequence":"additional","affiliation":[{"name":"Eindhoven University of Technology,Department of Mechanical Engineering,Eindhoven,The Netherlands,5600 MB"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"T.","family":"Oomen","sequence":"additional","affiliation":[{"name":"Eindhoven University of Technology,Department of Mechanical Engineering,Eindhoven,The Netherlands,5600 MB"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"M.M.J.","family":"Van De Wal","sequence":"additional","affiliation":[{"name":"ASML,Veldhoven,The Netherlands,5504 DR"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"B.","family":"Sharif","sequence":"additional","affiliation":[{"name":"ASML,Veldhoven,The Netherlands,5504 DR"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"H.J.","family":"Zwart","sequence":"additional","affiliation":[{"name":"Eindhoven University of Technology,Department of Mechanical Engineering,Eindhoven,The Netherlands,5600 MB"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"263","reference":[{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1109\/MCS.2011.941882"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.23919\/ACC45564.2020.9147464"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1177\/1045389X10381659"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1016\/S0005-1098(00)00181-3"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1109\/LCSYS.2019.2921623"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1109\/THERMINIC.2007.4451779"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1080\/0305215X.2018.1469133"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1016\/j.jprocont.2023.02.014"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1007\/BFb0064935"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1137\/15M1014759"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1109\/TAC.2017.2714643"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1109\/CDC.2017.8263644"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.1109\/CDC.2005.1583320"},{"key":"ref14","doi-asserted-by":"publisher","DOI":"10.1016\/S0098-1354(03)00175-3"},{"volume-title":"Stochastic Systems: Estimation, Identification, and Adaptive Control","year":"1986","author":"Kumar","key":"ref15"},{"key":"ref16","doi-asserted-by":"publisher","DOI":"10.1007\/978-1-4614-2281-5"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.1137\/1.9780898718591"},{"key":"ref18","doi-asserted-by":"publisher","DOI":"10.1002\/0470014164"},{"key":"ref19","doi-asserted-by":"publisher","DOI":"10.1002\/0470021217"},{"key":"ref20","doi-asserted-by":"publisher","DOI":"10.1016\/j.automatica.2016.12.025"},{"volume-title":"Towards control relevant system design and constrained order controller synthesis: with a thermal control application in immersion lithography","year":"2019","author":"Merks","key":"ref21"}],"event":{"name":"2025 IEEE Conference on Control Technology and Applications (CCTA)","start":{"date-parts":[[2025,8,25]]},"location":"San Diego, CA, USA","end":{"date-parts":[[2025,8,27]]}},"container-title":["2025 IEEE Conference on Control Technology and Applications (CCTA)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx8\/11151269\/11151271\/11151477.pdf?arnumber=11151477","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,9,12]],"date-time":"2025-09-12T05:09:47Z","timestamp":1757653787000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/11151477\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025,8,25]]},"references-count":21,"URL":"https:\/\/doi.org\/10.1109\/ccta53793.2025.11151477","relation":{},"subject":[],"published":{"date-parts":[[2025,8,25]]}}}