{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,10,29]],"date-time":"2024-10-29T13:41:30Z","timestamp":1730209290352,"version":"3.28.0"},"reference-count":15,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2012,8]]},"DOI":"10.1109\/coase.2012.6386493","type":"proceedings-article","created":{"date-parts":[[2013,1,2]],"date-time":"2013-01-02T23:15:40Z","timestamp":1357168540000},"page":"575-580","source":"Crossref","is-referenced-by-count":0,"title":["Optimization-based litho machine scheduling with load balancing and reticle expiration"],"prefix":"10.1109","author":[{"given":"Bing","family":"Yan","sequence":"first","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hsin Yuan","family":"Chen","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Peter B.","family":"Luh","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Simon","family":"Wang","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Joey","family":"Chang","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"263","reference":[{"doi-asserted-by":"publisher","key":"15","DOI":"10.1016\/S0377-2217(00)00175-2"},{"doi-asserted-by":"publisher","key":"13","DOI":"10.1109\/CASE.2011.6042516"},{"doi-asserted-by":"publisher","key":"14","DOI":"10.1007\/BF01580653"},{"doi-asserted-by":"publisher","key":"11","DOI":"10.1109\/WSC.2004.1371552"},{"doi-asserted-by":"publisher","key":"12","DOI":"10.1109\/66.909654"},{"doi-asserted-by":"publisher","key":"3","DOI":"10.1109\/TRA.2003.814512"},{"doi-asserted-by":"publisher","key":"2","DOI":"10.1016\/S0377-2217(98)80011-8"},{"doi-asserted-by":"publisher","key":"1","DOI":"10.1080\/07408170208928860"},{"doi-asserted-by":"publisher","key":"10","DOI":"10.1109\/WSC.2001.977430"},{"key":"7","first-page":"379","article-title":"Load balancing among photolithography machines in the semiconductor manufacturing system","volume":"24","author":"shr","year":"2008","journal-title":"Journal of Information Science and Engineering"},{"doi-asserted-by":"publisher","key":"6","DOI":"10.1109\/TSM.2002.807743"},{"doi-asserted-by":"publisher","key":"5","DOI":"10.1007\/s00170-002-1506-9"},{"doi-asserted-by":"publisher","key":"4","DOI":"10.1007\/11751595_65"},{"doi-asserted-by":"publisher","key":"9","DOI":"10.1109\/TSM.2005.858472"},{"doi-asserted-by":"publisher","key":"8","DOI":"10.1109\/TSM.2009.2017666"}],"event":{"name":"2012 IEEE International Conference on Automation Science and Engineering (CASE 2012)","start":{"date-parts":[[2012,8,20]]},"location":"Seoul, Korea (South)","end":{"date-parts":[[2012,8,24]]}},"container-title":["2012 IEEE International Conference on Automation Science and Engineering (CASE)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx5\/6375512\/6386304\/06386493.pdf?arnumber=6386493","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2017,3,22]],"date-time":"2017-03-22T21:37:17Z","timestamp":1490218637000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/6386493\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2012,8]]},"references-count":15,"URL":"https:\/\/doi.org\/10.1109\/coase.2012.6386493","relation":{},"subject":[],"published":{"date-parts":[[2012,8]]}}}