{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,1,21]],"date-time":"2026-01-21T18:45:59Z","timestamp":1769021159450,"version":"3.49.0"},"reference-count":49,"publisher":"IEEE","license":[{"start":{"date-parts":[[2025,6,22]],"date-time":"2025-06-22T00:00:00Z","timestamp":1750550400000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2025,6,22]],"date-time":"2025-06-22T00:00:00Z","timestamp":1750550400000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2025,6,22]]},"DOI":"10.1109\/dac63849.2025.11133367","type":"proceedings-article","created":{"date-parts":[[2025,9,15]],"date-time":"2025-09-15T17:35:41Z","timestamp":1757957741000},"page":"1-7","source":"Crossref","is-referenced-by-count":2,"title":["Curvilinear Optical Proximity Correction via Cardinal Spline"],"prefix":"10.1109","author":[{"given":"Su","family":"Zheng","sequence":"first","affiliation":[{"name":"Chinese University of Hong Kong"}]},{"given":"Xiaoxiao","family":"Liang","sequence":"additional","affiliation":[{"name":"Hong Kong University of Science and Technology (GZ)"}]},{"given":"Ziyang","family":"Yu","sequence":"additional","affiliation":[{"name":"Chinese University of Hong Kong"}]},{"given":"Yuzhe","family":"Ma","sequence":"additional","affiliation":[{"name":"Hong Kong University of Science and Technology (GZ)"}]},{"given":"Bei","family":"Yu","sequence":"additional","affiliation":[{"name":"Chinese University of Hong Kong"}]},{"given":"Martin","family":"Wong","sequence":"additional","affiliation":[{"name":"Hong Kong Baptist University"}]}],"member":"263","reference":[{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1145\/2742060.2742114"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1109\/VLSI-SoC.2017.8203477"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2017.8203763"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/dac18072.2020.9218530"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1016\/j.vlsi.2020.11.001"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1145\/3508352.3549468"},{"key":"ref7","article-title":"LithoBench: Benchmarking ai computational lithography for semiconductor manufacturing","volume-title":"Proc. NeurIPS","author":"Zheng"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1109\/tcad.2023.3309745"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1145\/3649329.3656254"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1145\/3649329.3655680"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2024.3378600"},{"key":"ref12","article-title":"Differentiable edgebased OPC","volume-title":"Proc. ICCAD","author":"Chen"},{"key":"ref13","first-page":"81","article-title":"An efficient rule-based OPC approach using a DRC tool for 0.18\/spl mu\/m ASIC","volume-title":"Proc. ISQED","author":"Park"},{"key":"ref14","doi-asserted-by":"publisher","DOI":"10.1117\/12.772790"},{"key":"ref15","doi-asserted-by":"publisher","DOI":"10.1117\/12.2194755"},{"key":"ref16","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2014.7001358"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.7873\/DATE.2015.1045"},{"key":"ref18","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2015.2514082"},{"key":"ref19","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2023.3239559"},{"key":"ref20","doi-asserted-by":"publisher","DOI":"10.1117\/12.632366"},{"key":"ref21","doi-asserted-by":"publisher","DOI":"10.1145\/2593069.2593163"},{"key":"ref22","doi-asserted-by":"publisher","DOI":"10.23919\/DATE51398.2021.9474212"},{"key":"ref23","doi-asserted-by":"publisher","DOI":"10.1109\/tcad.2022.3175939"},{"key":"ref24","doi-asserted-by":"publisher","DOI":"10.1145\/3195970.3196056"},{"key":"ref25","doi-asserted-by":"publisher","DOI":"10.1109\/tcad.2019.2939329"},{"key":"ref26","doi-asserted-by":"publisher","DOI":"10.1145\/3400302.3415704"},{"key":"ref27","doi-asserted-by":"publisher","DOI":"10.1109\/tcad.2021.3109556"},{"key":"ref28","doi-asserted-by":"publisher","DOI":"10.1145\/3400302.3415705"},{"key":"ref29","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2021.3116511"},{"key":"ref30","doi-asserted-by":"publisher","DOI":"10.1109\/iccad51958.2021.9643464"},{"key":"ref31","doi-asserted-by":"publisher","DOI":"10.1117\/12.2686921"},{"key":"ref32","doi-asserted-by":"publisher","DOI":"10.1117\/1.jmm.23.1.011203"},{"key":"ref33","doi-asserted-by":"publisher","DOI":"10.1098\/rspa.1951.0158"},{"key":"ref34","doi-asserted-by":"publisher","DOI":"10.1117\/12.2575474"},{"key":"ref35","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2013.6691131"},{"key":"ref36","article-title":"OpenILT: An open source inverse lithography technique framework","volume-title":"Proc. ASICON","author":"Zheng"},{"key":"ref37","doi-asserted-by":"publisher","DOI":"10.1117\/12.467435"},{"key":"ref38","doi-asserted-by":"publisher","DOI":"10.1117\/12.3010562"},{"key":"ref39","doi-asserted-by":"publisher","DOI":"10.1117\/12.410681"},{"key":"ref40","doi-asserted-by":"publisher","DOI":"10.1109\/dac56929.2023.10247734"},{"key":"ref41","doi-asserted-by":"publisher","DOI":"10.1109\/icde.1997.582015"},{"key":"ref42","doi-asserted-by":"publisher","DOI":"10.1117\/12.804678"},{"key":"ref43","doi-asserted-by":"publisher","DOI":"10.1016\/0734-189x(85)90016-7"},{"key":"ref44","article-title":"Adam: A method for stochastic optimization","author":"Kingma","year":"2014","journal-title":"arXiv preprint arXiv:1412.6980"},{"key":"ref45","doi-asserted-by":"publisher","DOI":"10.1109\/iseda62518.2024.10617951"},{"key":"ref46","doi-asserted-by":"publisher","DOI":"10.1145\/3408288"},{"key":"ref47","doi-asserted-by":"publisher","DOI":"10.1145\/3316781.3326334"},{"key":"ref48","article-title":"Nangate 45 nm library"},{"key":"ref49","doi-asserted-by":"publisher","DOI":"10.1145\/3649329.3655926"}],"event":{"name":"2025 62nd ACM\/IEEE Design Automation Conference (DAC)","location":"San Francisco, CA, USA","start":{"date-parts":[[2025,6,22]]},"end":{"date-parts":[[2025,6,25]]}},"container-title":["2025 62nd ACM\/IEEE Design Automation Conference (DAC)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx8\/11132383\/11132091\/11133367.pdf?arnumber=11133367","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,9,16]],"date-time":"2025-09-16T05:36:11Z","timestamp":1758000971000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/11133367\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025,6,22]]},"references-count":49,"URL":"https:\/\/doi.org\/10.1109\/dac63849.2025.11133367","relation":{},"subject":[],"published":{"date-parts":[[2025,6,22]]}}}