{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,26]],"date-time":"2025-11-26T16:44:23Z","timestamp":1764175463724,"version":"3.37.3"},"reference-count":7,"publisher":"IEEE","license":[{"start":{"date-parts":[[2023,5,18]],"date-time":"2023-05-18T00:00:00Z","timestamp":1684368000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2023,5,18]],"date-time":"2023-05-18T00:00:00Z","timestamp":1684368000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"funder":[{"DOI":"10.13039\/100000001","name":"NSF","doi-asserted-by":"publisher","award":["2153177"],"award-info":[{"award-number":["2153177"]}],"id":[{"id":"10.13039\/100000001","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2023,5,18]]},"DOI":"10.1109\/eit57321.2023.10187322","type":"proceedings-article","created":{"date-parts":[[2023,7,25]],"date-time":"2023-07-25T17:22:40Z","timestamp":1690305760000},"page":"505-508","source":"Crossref","is-referenced-by-count":3,"title":["Engineering the Device Performance of PLD Grown Tantalum Oxide based RRAM Devices"],"prefix":"10.1109","author":[{"given":"Alireza","family":"Moazzeni","sequence":"first","affiliation":[{"name":"Wayne State University,Electrical and Computer Engineering,Detroit,USA"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Md Tawsif Rahman","family":"Chowdhury","sequence":"additional","affiliation":[{"name":"Wayne State University,Electrical and Computer Engineering,Detroit,USA"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Christopher","family":"Rouleau","sequence":"additional","affiliation":[{"name":"The Center for Nanophase Materials Sciences,Oak Ridge National Laboratory,Oak Ridge,USA"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Gozde","family":"Tutuncuoglu","sequence":"additional","affiliation":[{"name":"Wayne State University,Electrical and Computer Engineering,Detroit,USA"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"263","reference":[{"key":"ref7","first-page":"245","article-title":"Structural and electrical properties of radio frequency magnetron sputtered tantalum oxide films: Influence of post-deposition annealing","author":"chandra","year":"0","journal-title":"Mat Sci Semicon Proc 13"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1557\/s43579-022-00243-z"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1088\/1361-6528\/ab554b"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1038\/s41598-018-28992-9"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1021\/nl401287w"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1038\/s41565-020-0647-z"},{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1038\/s41563-019-0291-x"}],"event":{"name":"2023 IEEE International Conference on Electro Information Technology (eIT)","start":{"date-parts":[[2023,5,18]]},"location":"Romeoville, IL, USA","end":{"date-parts":[[2023,5,20]]}},"container-title":["2023 IEEE International Conference on Electro Information Technology (eIT)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/10187212\/10187216\/10187322.pdf?arnumber=10187322","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2023,8,14]],"date-time":"2023-08-14T17:38:14Z","timestamp":1692034694000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10187322\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2023,5,18]]},"references-count":7,"URL":"https:\/\/doi.org\/10.1109\/eit57321.2023.10187322","relation":{},"subject":[],"published":{"date-parts":[[2023,5,18]]}}}