{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,10,29]],"date-time":"2024-10-29T16:50:55Z","timestamp":1730220655748,"version":"3.28.0"},"reference-count":8,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2014,9]]},"DOI":"10.1109\/essderc.2014.6948804","type":"proceedings-article","created":{"date-parts":[[2014,11,12]],"date-time":"2014-11-12T22:53:35Z","timestamp":1415832815000},"page":"238-241","source":"Crossref","is-referenced-by-count":1,"title":["High Ion\/Ioff ratio BJT selector for 32 cell string Resistive RAM arrays"],"prefix":"10.1109","author":[{"given":"A.","family":"Redaelli","sequence":"first","affiliation":[]},{"given":"L.","family":"Laurin","sequence":"additional","affiliation":[]},{"given":"S.","family":"Lavizzari","sequence":"additional","affiliation":[]},{"given":"C.","family":"Cupeta","sequence":"additional","affiliation":[]},{"given":"G.","family":"Servalli","sequence":"additional","affiliation":[]},{"given":"A.","family":"Benvenuti","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"3","article-title":"A 45nm generation phase change memory technology","author":"servalli","year":"2009","journal-title":"IEDM"},{"key":"2","doi-asserted-by":"publisher","DOI":"10.1109\/IITC.2010.5510741"},{"key":"1","doi-asserted-by":"publisher","DOI":"10.1109\/IMW.2009.5090598"},{"journal-title":"Physics of Semiconductor Devices","year":"1981","author":"sze","key":"7"},{"key":"6","first-page":"23518","article-title":"Distribution and segregation of arsenic at SiO2\/Si interface","volume":"104","author":"steen","year":"2008","journal-title":"JAP"},{"key":"5","doi-asserted-by":"publisher","DOI":"10.1109\/VLSIT.2012.6242496"},{"key":"4","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2010.5488760"},{"key":"8","article-title":"High injection carrier diffusion and recombination in BJT selector for PCM technology","author":"laurin","year":"2011","journal-title":"Micron-TLP Process R&D Technical Seminar"}],"event":{"name":"ESSDERC 2014 - 44th European Solid State Device Research Conference","start":{"date-parts":[[2014,9,22]]},"location":"Venice Lido, Italy","end":{"date-parts":[[2014,9,26]]}},"container-title":["2014 44th European Solid State Device Research Conference (ESSDERC)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/6926646\/6948742\/06948804.pdf?arnumber=6948804","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2017,3,24]],"date-time":"2017-03-24T04:42:46Z","timestamp":1490330566000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/6948804\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2014,9]]},"references-count":8,"URL":"https:\/\/doi.org\/10.1109\/essderc.2014.6948804","relation":{},"subject":[],"published":{"date-parts":[[2014,9]]}}}