{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,10,22]],"date-time":"2024-10-22T20:35:50Z","timestamp":1729629350008,"version":"3.28.0"},"reference-count":23,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2012,10]]},"DOI":"10.1109\/ias.2012.6373977","type":"proceedings-article","created":{"date-parts":[[2012,12,12]],"date-time":"2012-12-12T17:00:16Z","timestamp":1355331616000},"page":"1-4","source":"Crossref","is-referenced-by-count":0,"title":["Measurement of OH radical in the effluent of an atmospheric-pressure helium plasma jet"],"prefix":"10.1109","author":[{"given":"Seiya","family":"Yonemori","sequence":"first","affiliation":[]},{"given":"Ryo","family":"Ono","sequence":"additional","affiliation":[]},{"given":"Tetsuji","family":"Oda","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"19","doi-asserted-by":"crossref","first-page":"61","DOI":"10.1007\/s003400050771","volume":"69","author":"rahmann","year":"1999","journal-title":"Appl Phys B"},{"key":"22","first-page":"15206","volume":"44","author":"oh","year":"2011","journal-title":"J Phys D Appl Phys"},{"key":"17","doi-asserted-by":"crossref","first-page":"63305","DOI":"10.1063\/1.3483935","volume":"108","author":"karakas","year":"2010","journal-title":"J Appl Phys"},{"key":"23","doi-asserted-by":"crossref","first-page":"155202","DOI":"10.1088\/0022-3727\/43\/15\/155202","volume":"43","author":"karakas","year":"0","journal-title":"J Phys D Appl Phys"},{"key":"18","doi-asserted-by":"crossref","first-page":"75201","DOI":"10.1088\/0022-3727\/43\/7\/075201","volume":"43","author":"walsh","year":"2010","journal-title":"J Phys D Appl Phys"},{"key":"15","doi-asserted-by":"crossref","first-page":"106001","DOI":"10.1143\/JJAP.49.106001","volume":"49","author":"urabe","year":"2010","journal-title":"Jpn J Appl Phys"},{"key":"16","doi-asserted-by":"crossref","first-page":"83502","DOI":"10.1063\/1.3465665","volume":"17","author":"chen","year":"2010","journal-title":"Phys Plasmas"},{"key":"13","doi-asserted-by":"crossref","first-page":"225202","DOI":"10.1088\/0022-3727\/45\/22\/225202","volume":"45","author":"yonemori","year":"2012","journal-title":"J Phys D Appl Phys"},{"key":"14","doi-asserted-by":"crossref","first-page":"171501","DOI":"10.1063\/1.2198100","volume":"88","author":"walsh","year":"2006","journal-title":"Appl Phys Lett"},{"key":"11","doi-asserted-by":"publisher","DOI":"10.1002\/ppap.200900090"},{"key":"12","first-page":"21","author":"kim","year":"0","journal-title":"64th Gaseous Electronics Conferences Bulletin (2011)"},{"key":"21","doi-asserted-by":"crossref","first-page":"502","DOI":"10.1016\/S0010-2180(97)00324-6","volume":"114","author":"tamura","year":"1998","journal-title":"Combust Flame"},{"key":"3","doi-asserted-by":"crossref","first-page":"7113","DOI":"10.1016\/j.apsusc.2011.03.064","volume":"257","author":"tian","year":"2011","journal-title":"Appl Suf Sci"},{"key":"20","doi-asserted-by":"crossref","first-page":"6507","DOI":"10.1063\/1.471371","volume":"104","author":"williams","year":"1996","journal-title":"J Chem Phys"},{"key":"2","doi-asserted-by":"crossref","first-page":"274","DOI":"10.1002\/ppap.200900083","volume":"7","author":"lee","year":"2010","journal-title":"Plasma Process Polym"},{"key":"1","doi-asserted-by":"crossref","first-page":"113902","DOI":"10.1063\/1.2045549","volume":"87","author":"laroussi","year":"2005","journal-title":"Appl Phys Lett"},{"key":"10","doi-asserted-by":"publisher","DOI":"10.1063\/1.3521502"},{"key":"7","doi-asserted-by":"crossref","first-page":"6974","DOI":"10.1016\/j.tsf.2011.01.208","volume":"519","author":"uhm","year":"2011","journal-title":"Thin Solid Films"},{"key":"6","doi-asserted-by":"crossref","first-page":"1177","DOI":"10.1016\/j.mee.2009.12.045","volume":"87","author":"kim","year":"2010","journal-title":"Microelectron Eng"},{"key":"5","doi-asserted-by":"crossref","first-page":"2694","DOI":"10.1016\/j.apsusc.2010.10.047","volume":"257","author":"marcinauskas","year":"2011","journal-title":"Appl Surf Sci"},{"key":"4","doi-asserted-by":"crossref","first-page":"2284","DOI":"10.1063\/1.873480","volume":"6","author":"herrman","year":"1999","journal-title":"Phys Plasmas"},{"key":"9","doi-asserted-by":"crossref","first-page":"3526","DOI":"10.1021\/cm803290b","volume":"21","author":"furusho","year":"2009","journal-title":"Chem Mater"},{"key":"8","doi-asserted-by":"crossref","first-page":"2670","DOI":"10.1016\/j.surfcoat.2007.09.043","volume":"202","author":"ren","year":"2008","journal-title":"Surf Coat Technol"}],"event":{"name":"2012 IEEE Industry Applications Society Annual Meeting","start":{"date-parts":[[2012,10,7]]},"location":"Las Vegas, NV, USA","end":{"date-parts":[[2012,10,11]]}},"container-title":["2012 IEEE Industry Applications Society Annual Meeting"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx5\/6361088\/6373971\/06373977.pdf?arnumber=6373977","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2017,6,21]],"date-time":"2017-06-21T00:02:27Z","timestamp":1498003347000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/6373977\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2012,10]]},"references-count":23,"URL":"https:\/\/doi.org\/10.1109\/ias.2012.6373977","relation":{},"subject":[],"published":{"date-parts":[[2012,10]]}}}