{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,3,11]],"date-time":"2026-03-11T17:09:54Z","timestamp":1773248994568,"version":"3.50.1"},"reference-count":16,"publisher":"IEEE","license":[{"start":{"date-parts":[[2014,11,1]],"date-time":"2014-11-01T00:00:00Z","timestamp":1414800000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2014,11,1]],"date-time":"2014-11-01T00:00:00Z","timestamp":1414800000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2014,11]]},"DOI":"10.1109\/iccad.2014.7001358","type":"proceedings-article","created":{"date-parts":[[2015,1,13]],"date-time":"2015-01-13T15:11:15Z","timestamp":1421161875000},"page":"238-245","source":"Crossref","is-referenced-by-count":25,"title":["A fast process variation and pattern fidelity aware mask optimization algorithm"],"prefix":"10.1109","author":[{"given":"Ahmed","family":"Awad","sequence":"first","affiliation":[{"name":"Department of Communications and Computer Engineering, Tokyo Institute of Technology, Tokyo, Japan"}]},{"given":"Atsushi","family":"Takahashi","sequence":"additional","affiliation":[{"name":"Department of Communications and Computer Engineering, Tokyo Institute of Technology, Tokyo, Japan"}]},{"given":"Satoshi","family":"Tanaka","sequence":"additional","affiliation":[{"name":"Toshiba Corporation, Yokohama, Japan"}]},{"given":"Chikaaki","family":"Kodama","sequence":"additional","affiliation":[{"name":"Toshiba Corporation, Yokohama, Japan"}]}],"member":"263","reference":[{"key":"ref10","first-page":"1","article-title":"MOSAIC: Mask Optimization Solution With Process Window Aware Inverse Correction","author":"gao","year":"2006","journal-title":"Proc DAC"},{"key":"ref11","doi-asserted-by":"crossref","first-page":"261","DOI":"10.1117\/12.209258","article-title":"Fast Optical Proximity Correction: Analytical Method","author":"shiori","year":"1995","journal-title":"SPIE Proc 2440"},{"key":"ref12","doi-asserted-by":"crossref","DOI":"10.1117\/12.2030684","article-title":"1D Design Style Implications for Mask Masking and CEBL","author":"smayling","year":"2013","journal-title":"Proc SPIE 8880"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2010.2048374"},{"key":"ref14","article-title":"The Problem of Optimal Placement of Sub-Resolution Assist Features (SRAF)","author":"mulkherjee","year":"2005","journal-title":"proc SPIE 5754 Optical Microlithography"},{"key":"ref15","article-title":"Optimizing Style Options for Sub-Resolution Assist Features","author":"leibman","year":"2001","journal-title":"Proc SPIE 4346 Optical Microlithography"},{"key":"ref16","year":"0"},{"key":"ref4","first-page":"271","article-title":"ICCAD-2013 CAD Contest in Mask Optimization abd Benchmark Suite","author":"banerjee","year":"2013","journal-title":"Proc ICCAD"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1109\/TSM.2008.2000283"},{"key":"ref6","first-page":"1281","article-title":"Model-based OPC using the MEEF matrix","author":"cobb","year":"2002","journal-title":"Proc BACUS Symp Photomask Technology"},{"key":"ref5","first-page":"785","article-title":"Process Variation Aware Optical Proximity Correction with Variational Lithography Modeling","author":"yu","year":"2014","journal-title":"Proc DAC"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1117\/12.599410"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1117\/12.2027718"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1109\/JPROC.2007.911853"},{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1002\/9780470618943"},{"key":"ref9","first-page":"854","article-title":"A Novel Intensity Based Optical Proximity Correction Algorithm with Speedup in Lithography Simulation","author":"yu","year":"2007","journal-title":"Proc ICCAD"}],"event":{"name":"2014 IEEE\/ACM International Conference on Computer-Aided Design (ICCAD)","location":"San Jose, CA, USA","start":{"date-parts":[[2014,11,2]]},"end":{"date-parts":[[2014,11,6]]}},"container-title":["2014 IEEE\/ACM International Conference on Computer-Aided Design (ICCAD)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/6991350\/7001313\/07001358.pdf?arnumber=7001358","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,11,24]],"date-time":"2025-11-24T18:57:01Z","timestamp":1764010621000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/7001358\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2014,11]]},"references-count":16,"URL":"https:\/\/doi.org\/10.1109\/iccad.2014.7001358","relation":{},"subject":[],"published":{"date-parts":[[2014,11]]}}}