{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,21]],"date-time":"2025-11-21T05:56:19Z","timestamp":1763704579267,"version":"3.45.0"},"reference-count":27,"publisher":"IEEE","license":[{"start":{"date-parts":[[2025,10,26]],"date-time":"2025-10-26T00:00:00Z","timestamp":1761436800000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2025,10,26]],"date-time":"2025-10-26T00:00:00Z","timestamp":1761436800000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2025,10,26]]},"DOI":"10.1109\/iccad66269.2025.11240871","type":"proceedings-article","created":{"date-parts":[[2025,11,20]],"date-time":"2025-11-20T18:39:34Z","timestamp":1763663974000},"page":"1-9","source":"Crossref","is-referenced-by-count":0,"title":["Invited Paper: Unitho: A Unified Multi-Task Framework for Computational Lithography"],"prefix":"10.1109","author":[{"given":"Qian","family":"Jin","sequence":"first","affiliation":[{"name":"Zhejiang University,Hangzhou,China"}]},{"given":"Yumeng","family":"Liu","sequence":"additional","affiliation":[{"name":"Zhejiang University,Hangzhou,China"}]},{"given":"Yuqi","family":"Jiang","sequence":"additional","affiliation":[{"name":"Zhejiang University,Hangzhou,China"}]},{"given":"Qi","family":"Sun","sequence":"additional","affiliation":[{"name":"Zhejiang University,Hangzhou,China"}]},{"given":"Cheng","family":"Zhuo","sequence":"additional","affiliation":[{"name":"Zhejiang University,Hangzhou,China"}]}],"member":"263","reference":[{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1007\/978-3-031-13074-8_15"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1109\/LAD62341.2024.10691707"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1145\/3676536.3676750"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD66269.2025.11240663"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1145\/3676S36.36767S2"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1145\/3649329.3655939"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1609\/aaai.v33i01.33015949"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2023.3332841"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1145\/3451179"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1109\/DAC.2018.8465816"},{"key":"ref11","first-page":"1","article-title":"Lithogan: End-to-end lithography modeling with generative adversarial networks","volume-title":"Proceedings of the 56th Annual Design Automation Conference","author":"Ye"},{"key":"ref12","first-page":"1","article-title":"Damo: Deep agile mask optimization for full chip scale","volume-title":"Proceedings of the 39th International Conference on Computer-Aided Design","author":"Chen"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2020.3015469"},{"key":"ref14","doi-asserted-by":"publisher","DOI":"10.1007\/s11432-022-3755-y"},{"key":"ref15","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2020.3021663"},{"article-title":"Enhancing layout hotspot detection efficiency with yolov8 and pca-guided augmentation","year":"2024","author":"Wu","key":"ref16"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2024.3463539"},{"key":"ref18","doi-asserted-by":"publisher","DOI":"10.1007\/s44275-025-00032-5"},{"key":"ref19","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR.2017.632"},{"key":"ref20","first-page":"1","article-title":"Hotspot detection via attention-based deep layout metric learning","volume-title":"Proceedings of the 39th International Conference on Computer-Aided Design","author":"Geng"},{"key":"ref21","doi-asserted-by":"publisher","DOI":"10.23919\/DATE54114.2022.9774579"},{"key":"ref22","doi-asserted-by":"publisher","DOI":"10.1109\/ASP-DAC52403.2022.9712491"},{"key":"ref23","doi-asserted-by":"publisher","DOI":"10.1117\/1.JMM.23.1.013202"},{"key":"ref24","doi-asserted-by":"publisher","DOI":"10.1145\/3626772.3657878"},{"key":"ref25","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR52733.2024.01605"},{"key":"ref26","doi-asserted-by":"publisher","DOI":"10.1007\/978-3-030-58452-8_13"},{"key":"ref27","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR46437.2021.00841"}],"event":{"name":"2025 IEEE\/ACM International Conference On Computer Aided Design (ICCAD)","start":{"date-parts":[[2025,10,26]]},"location":"Munich, Germany","end":{"date-parts":[[2025,10,30]]}},"container-title":["2025 IEEE\/ACM International Conference On Computer Aided Design (ICCAD)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx8\/11240608\/11240621\/11240871.pdf?arnumber=11240871","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,11,21]],"date-time":"2025-11-21T05:45:32Z","timestamp":1763703932000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/11240871\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025,10,26]]},"references-count":27,"URL":"https:\/\/doi.org\/10.1109\/iccad66269.2025.11240871","relation":{},"subject":[],"published":{"date-parts":[[2025,10,26]]}}}