{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,9,7]],"date-time":"2024-09-07T11:45:39Z","timestamp":1725709539640},"reference-count":7,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2015,12]]},"DOI":"10.1109\/icecs.2015.7440385","type":"proceedings-article","created":{"date-parts":[[2016,3,29]],"date-time":"2016-03-29T20:53:22Z","timestamp":1459284802000},"page":"588-591","source":"Crossref","is-referenced-by-count":5,"title":["Parameterized test patterns methodology for layout design rule checking verification"],"prefix":"10.1109","author":[{"given":"Mohamed","family":"Tantawy","sequence":"first","affiliation":[]},{"given":"Rafik","family":"Guindi","sequence":"additional","affiliation":[]},{"given":"Mohamed","family":"Dessouky","sequence":"additional","affiliation":[]},{"given":"Mohamed","family":"Al-Imam","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1147\/rd.394.0371"},{"key":"ref3","article-title":"Measurements and Analysis of Process Variability in 90nm CMOS","author":"nikoli","year":"2006","journal-title":"ICSICT &#x2018;06 8th International Conference on Solid-State and Integrated Circuit Technology"},{"article-title":"Method for verifying design rule checking software","year":"2000","author":"decamp","key":"ref6"},{"year":"2014","key":"ref5","article-title":"Process development and QA, survey results by Mentor Graphics consulting division using the data provided by 3 Asian fabs"},{"key":"ref7","article-title":"Automatic environment for DRC rule file development and QA","author":"el-kasaby","year":"0","journal-title":"EDACafe com"},{"key":"ref2","article-title":"Double exposure technique for 45nm node and beyond","author":"park","year":"2005","journal-title":"Proc SPIE 0277-786X5992 59921Q"},{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1109\/DAC.2001.156114"}],"event":{"name":"2015 IEEE International Conference on Electronics, Circuits, and Systems (ICECS)","start":{"date-parts":[[2015,12,6]]},"location":"Cairo, Egypt","end":{"date-parts":[[2015,12,9]]}},"container-title":["2015 IEEE International Conference on Electronics, Circuits, and Systems (ICECS)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/7430153\/7440163\/07440385.pdf?arnumber=7440385","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2017,3,21]],"date-time":"2017-03-21T08:15:16Z","timestamp":1490084116000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/7440385\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2015,12]]},"references-count":7,"URL":"https:\/\/doi.org\/10.1109\/icecs.2015.7440385","relation":{},"subject":[],"published":{"date-parts":[[2015,12]]}}}