{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,9]],"date-time":"2025-11-09T07:06:57Z","timestamp":1762672017351},"reference-count":6,"publisher":"IEEE","license":[{"start":{"date-parts":[[2023,5,1]],"date-time":"2023-05-01T00:00:00Z","timestamp":1682899200000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2023,5,1]],"date-time":"2023-05-01T00:00:00Z","timestamp":1682899200000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2023,5]]},"DOI":"10.1109\/imw56887.2023.10145983","type":"proceedings-article","created":{"date-parts":[[2023,6,12]],"date-time":"2023-06-12T17:56:55Z","timestamp":1686592615000},"page":"1-4","source":"Crossref","is-referenced-by-count":3,"title":["An 18nm ePCM with BJT selector NVM design for advanced microcontroller applications"],"prefix":"10.1109","author":[{"given":"Antonino","family":"Conte","sequence":"first","affiliation":[{"name":"STMicroelectronics Microcontroller and Digital IC Group,Catania,Italy"}]},{"given":"Francesco","family":"Tomaiuolo","sequence":"additional","affiliation":[{"name":"STMicroelectronics Microcontroller and Digital IC Group,Catania,Italy"}]},{"given":"Marco","family":"Ruta","sequence":"additional","affiliation":[{"name":"STMicroelectronics Microcontroller and Digital IC Group,Catania,Italy"}]},{"given":"Andrea","family":"Redaelli","sequence":"additional","affiliation":[{"name":"STMicroelectronics Smartpower Technology R&D,Agrate Brianza,Italy"}]},{"given":"Franck","family":"Arnaud","sequence":"additional","affiliation":[{"name":"STMicroelectronics Manufacturing Technology R&D,Crolles,France"}]},{"given":"Thomas","family":"Jouanneau","sequence":"additional","affiliation":[{"name":"STMicroelectronics Microcontroller and Digital IC Group,Grenoble,France"}]},{"given":"Christian","family":"Boccaccio","sequence":"additional","affiliation":[{"name":"STMicroelectronics Manufacturing Technology R&D,Crolles,France"}]},{"given":"Olivier","family":"Weber","sequence":"additional","affiliation":[{"name":"STMicroelectronics Manufacturing Technology R&D,Crolles,France"}]}],"member":"263","reference":[{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/LED.2011.2131631"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1109\/TMRC56419.2022.9918607"},{"key":"ref6","article-title":"The PCM way for embedded non volatile memory appllications","author":"zuliani","year":"0","journal-title":"2019 IEEE Symposium on VLSI Technology"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1109\/JETCAS.2016.2547703"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1109\/IMW52921.2022.9779300"},{"key":"ref1","first-page":"231","article-title":"Improving Ge-rich GST ePCM reliability through BEOL engineering","author":"redaelli et alter","year":"0","journal-title":"ESSDERC 20121-51st European Solid-State Device Research Conference"}],"event":{"name":"2023 IEEE International Memory Workshop (IMW)","start":{"date-parts":[[2023,5,21]]},"location":"Monterey, CA, USA","end":{"date-parts":[[2023,5,24]]}},"container-title":["2023 IEEE International Memory Workshop (IMW)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/10145914\/10145815\/10145983.pdf?arnumber=10145983","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2023,7,3]],"date-time":"2023-07-03T17:45:45Z","timestamp":1688406345000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10145983\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2023,5]]},"references-count":6,"URL":"https:\/\/doi.org\/10.1109\/imw56887.2023.10145983","relation":{},"subject":[],"published":{"date-parts":[[2023,5]]}}}