{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,5,16]],"date-time":"2025-05-16T09:26:42Z","timestamp":1747387602156,"version":"3.28.0"},"reference-count":29,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2018,3]]},"DOI":"10.1109\/irps.2018.8353551","type":"proceedings-article","created":{"date-parts":[[2018,5,8]],"date-time":"2018-05-08T17:16:55Z","timestamp":1525799815000},"page":"3A.1-1-3A.1-7","source":"Crossref","is-referenced-by-count":9,"title":["Insights into metal drift induced failure in MOL and BEOL"],"prefix":"10.1109","author":[{"given":"C.","family":"Wu","sequence":"first","affiliation":[]},{"given":"O. Varela","family":"Pedreira","sequence":"additional","affiliation":[]},{"given":"A.","family":"Lesniewska","sequence":"additional","affiliation":[]},{"given":"Y.","family":"Li","sequence":"additional","affiliation":[]},{"given":"I.","family":"Ciofi","sequence":"additional","affiliation":[]},{"given":"Zs.","family":"Tokei","sequence":"additional","affiliation":[]},{"given":"K.","family":"Croes","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"ref10","doi-asserted-by":"crossref","DOI":"10.1063\/1.3259386","volume":"106","author":"miyazaki","year":"2009","journal-title":"Journal of Applied Physics"},{"key":"ref11","volume":"96","author":"chen","year":"2010","journal-title":"Applied Physics Letters"},{"key":"ref12","doi-asserted-by":"crossref","DOI":"10.1088\/0957-4484\/22\/28\/289502","volume":"22","author":"valov","year":"2011","journal-title":"Nanotechnology"},{"key":"ref13","doi-asserted-by":"crossref","DOI":"10.1016\/j.microrel.2008.07.047","volume":"48","author":"croes","year":"2008","journal-title":"Microelectronics Reliability"},{"key":"ref14","volume":"98","author":"zhao","year":"2011","journal-title":"Applied Physics Letter"},{"key":"ref15","first-page":"2","author":"chen","year":"2011","journal-title":"Proceedings of the IEEE International Reliability Physics Symposium (IRPS)"},{"key":"ref16","doi-asserted-by":"crossref","DOI":"10.1063\/1.2823576","volume":"91","author":"achanta","year":"2007","journal-title":"Applied Physics Letter"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.1002\/9781119963677"},{"key":"ref18","first-page":"3","author":"wu","year":"2016","journal-title":"Proceedings of the IEEE International Reliability Physics Symposium (IRPS)"},{"key":"ref19","first-page":"481","author":"lee","year":"2009","journal-title":"Proceedings of the IEEE International Reliability Physics Symposium (IRPS)"},{"key":"ref28","doi-asserted-by":"publisher","DOI":"10.1002\/9783527610198"},{"key":"ref4","first-page":"46","author":"chen","year":"2006","journal-title":"Proceedings of the IEEE International Reliability Physics Symposium (IRPS)"},{"journal-title":"Electronic Processes in Ionic Crystals","year":"1940","author":"mott","key":"ref27"},{"key":"ref3","first-page":"34","author":"wen","year":"2016","journal-title":"Proceedings of the IEEE International Interconnect Technology Conference (IITC)"},{"key":"ref6","volume":"89","author":"jung","year":"2012","journal-title":"Microelectronic Engineering"},{"key":"ref29","volume":"58","author":"yu","year":"2011","journal-title":"IEEE Transactions on Electron Devices"},{"key":"ref5","first-page":"3","author":"lee","year":"2012","journal-title":"Proceedings of the IEEE International Reliability Physics Symposium (IRPS)"},{"key":"ref8","first-page":"5","author":"yuan","year":"2017","journal-title":"Proceedings of the IEEE International Reliability Physics Symposium (IRPS)"},{"key":"ref7","first-page":"790","author":"chang","year":"2016","journal-title":"Proceedings of the IEEE International Electron Devices Meeting (IEDM)"},{"key":"ref2","first-page":"112","author":"jiang","year":"2016","journal-title":"Proceedings of the IEEE International Interconnect Technology Conference (IITC)"},{"key":"ref9","volume":"108","author":"chen","year":"2010","journal-title":"Journal of Applied Physics"},{"key":"ref1","first-page":"99","author":"kikuchi","year":"2016","journal-title":"Proceedings of the IEEE International Interconnect Technology Conference (IITC)"},{"key":"ref20","first-page":"351","author":"celano","year":"2014","journal-title":"Proceedings of the IEEE International Electron Devices Meeting (IEDM)"},{"key":"ref22","first-page":"8","author":"wu","year":"2017","journal-title":"Proceedings of the IEEE International Interconnect Technology Conference (IITC)"},{"key":"ref21","volume":"84","author":"roussel","year":"1925","journal-title":"Microelectronic Engineering"},{"key":"ref24","volume":"101","author":"chen","year":"2012","journal-title":"Applied Physics Letter"},{"key":"ref23","doi-asserted-by":"crossref","DOI":"10.1063\/1.3631013","volume":"110","author":"soni","year":"2011","journal-title":"Journal of Applied Physics"},{"key":"ref26","doi-asserted-by":"crossref","DOI":"10.1063\/1.3077310","volume":"94","author":"schindler","year":"2009","journal-title":"Applied Physics Letter"},{"key":"ref25","doi-asserted-by":"publisher","DOI":"10.1007\/978-3-319-39531-9"}],"event":{"name":"2018 IEEE International Reliability Physics Symposium (IRPS)","start":{"date-parts":[[2018,3,11]]},"location":"Burlingame, CA","end":{"date-parts":[[2018,3,15]]}},"container-title":["2018 IEEE International Reliability Physics Symposium (IRPS)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/8345372\/8353529\/08353551.pdf?arnumber=8353551","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2018,6,1]],"date-time":"2018-06-01T14:55:32Z","timestamp":1527864932000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/8353551\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2018,3]]},"references-count":29,"URL":"https:\/\/doi.org\/10.1109\/irps.2018.8353551","relation":{},"subject":[],"published":{"date-parts":[[2018,3]]}}}