{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,5,16]],"date-time":"2025-05-16T09:26:55Z","timestamp":1747387615967,"version":"3.28.0"},"reference-count":12,"publisher":"IEEE","license":[{"start":{"date-parts":[[2019,3,1]],"date-time":"2019-03-01T00:00:00Z","timestamp":1551398400000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/ieeexplore.ieee.org\/Xplorehelp\/downloads\/license-information\/IEEE.html"},{"start":{"date-parts":[[2019,3,1]],"date-time":"2019-03-01T00:00:00Z","timestamp":1551398400000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2019,3,1]],"date-time":"2019-03-01T00:00:00Z","timestamp":1551398400000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2019,3]]},"DOI":"10.1109\/irps.2019.8720518","type":"proceedings-article","created":{"date-parts":[[2019,5,24]],"date-time":"2019-05-24T04:11:10Z","timestamp":1558671070000},"page":"1-5","source":"Crossref","is-referenced-by-count":5,"title":["Plasma Antenna Charging in CMOS Image Sensors"],"prefix":"10.1109","author":[{"given":"Y.","family":"Sacchettini","sequence":"first","affiliation":[]},{"given":"J. -P.","family":"Carrere","sequence":"additional","affiliation":[]},{"given":"V.","family":"Goiffon","sequence":"additional","affiliation":[]},{"given":"P.","family":"Magnan","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2014.6861165"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1109\/55.145056"},{"key":"ref10","first-page":"41","article-title":"Topographic Dependence Of Plasma Charging Induced Device Damage","author":"vahedi","year":"1997","journal-title":"2nd International Symposium on Plasma Process-Induced Damage"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1109\/PPID.2000.870585"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1109\/PPID.1998.725606"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1116\/1.588430"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1109\/55.992837"},{"key":"ref8","first-page":"20","article-title":"Prediction of Plasma Charging Induced Gate Oxide Tunneling Current and Antenna Dependence by Plasma Charging Probe","volume":"18","author":"ma","year":"1996","journal-title":"Proceedings of 1st International Symposium on Plasma Process-Induced Damage"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1109\/ASMC.1992.253779"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1016\/j.sse.2011.06.037"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1063\/1.1657043"},{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1016\/j.tsf.2006.10.065"}],"event":{"name":"2019 IEEE International Reliability Physics Symposium (IRPS)","start":{"date-parts":[[2019,3,31]]},"location":"Monterey, CA, USA","end":{"date-parts":[[2019,4,4]]}},"container-title":["2019 IEEE International Reliability Physics Symposium (IRPS)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/8712125\/8720395\/08720518.pdf?arnumber=8720518","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2022,7,15]],"date-time":"2022-07-15T03:13:13Z","timestamp":1657854793000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/8720518\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2019,3]]},"references-count":12,"URL":"https:\/\/doi.org\/10.1109\/irps.2019.8720518","relation":{},"subject":[],"published":{"date-parts":[[2019,3]]}}}