{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,9,27]],"date-time":"2026-09-27T09:03:11Z","timestamp":1790499791885,"version":"4.1.0"},"reference-count":10,"publisher":"IEEE","license":[{"start":{"date-parts":[[2021,3,1]],"date-time":"2021-03-01T00:00:00Z","timestamp":1614556800000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/ieeexplore.ieee.org\/Xplorehelp\/downloads\/license-information\/IEEE.html"},{"start":{"date-parts":[[2021,3,1]],"date-time":"2021-03-01T00:00:00Z","timestamp":1614556800000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2021,3,1]],"date-time":"2021-03-01T00:00:00Z","timestamp":1614556800000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2021,3]]},"DOI":"10.1109\/irps46558.2021.9405089","type":"proceedings-article","created":{"date-parts":[[2021,4,26]],"date-time":"2021-04-26T22:48:05Z","timestamp":1619477285000},"page":"1-2","source":"Crossref","is-referenced-by-count":3,"title":["Intrinsic Reliability of BEOL interlayer dielectric"],"prefix":"10.1109","author":[{"given":"J.","family":"Palmer","sequence":"first","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"G. W.","family":"Zhang","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"J. R.","family":"Weber","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Che-Yun","family":"Lin","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"C","family":"Perini","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"R.","family":"Kasim","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"263","reference":[{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2014.6860613"},{"key":"ref3","first-page":"6e.3-1","article-title":"A 10nm High Performance and Low-Power CMOS Technology Featureing 3rd Generation FinFET Transistors, Self-Aligned Quad Pattering, Contact Over Active Gate and Cobalt Local Interconnects","author":"auth","year":"2018","journal-title":"IEDM"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1063\/1.368217"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS45951.2020.9129094"},{"key":"ref5","article-title":"Polarity Dependence on Electrical Properties of Low-k Dielectric in Copper Interconnect Structures","author":"liang","year":"2012","journal-title":"SSDM"},{"key":"ref8","doi-asserted-by":"crossref","first-page":"195","DOI":"10.1016\/S0040-6090(99)00344-2","article-title":"Observation of Poole-Frenkel effect saturation in SiO2 and other insulating films","volume":"352","author":"harrell","year":"1999","journal-title":"Thin Solid Films"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1051\/rphysap:0198900240120108500"},{"key":"ref2","article-title":"Intrinsic Reliability Study in Low-k Dielectrics with Co Metallurgy in 10nm Process","author":"zhang","year":"2020","journal-title":"IITC"},{"key":"ref9","article-title":"Electronic structure of amorphous SiO2: Experiment and numerical simulation","volume":"81","author":"gritsenko","year":"1995","journal-title":"JETP"},{"key":"ref1","article-title":"Process and Packaging Innovations for Moore's Law Continuation and Beyond","author":"chau","year":"2020","journal-title":"IEDM"}],"event":{"name":"2021 IEEE International Reliability Physics Symposium (IRPS)","location":"Monterey, CA, USA","start":{"date-parts":[[2021,3,21]]},"end":{"date-parts":[[2021,3,25]]}},"container-title":["2021 IEEE International Reliability Physics Symposium (IRPS)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/9405068\/9405088\/09405089.pdf?arnumber=9405089","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2022,7,9]],"date-time":"2022-07-09T02:19:30Z","timestamp":1657333170000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/9405089\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2021,3]]},"references-count":10,"URL":"https:\/\/doi.org\/10.1109\/irps46558.2021.9405089","relation":{},"subject":[],"published":{"date-parts":[[2021,3]]}}}