{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,9,8]],"date-time":"2024-09-08T13:59:47Z","timestamp":1725803987586},"reference-count":14,"publisher":"IEEE","license":[{"start":{"date-parts":[[2021,3,1]],"date-time":"2021-03-01T00:00:00Z","timestamp":1614556800000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/ieeexplore.ieee.org\/Xplorehelp\/downloads\/license-information\/IEEE.html"},{"start":{"date-parts":[[2021,3,1]],"date-time":"2021-03-01T00:00:00Z","timestamp":1614556800000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2021,3,1]],"date-time":"2021-03-01T00:00:00Z","timestamp":1614556800000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2021,3]]},"DOI":"10.1109\/irps46558.2021.9405121","type":"proceedings-article","created":{"date-parts":[[2021,4,26]],"date-time":"2021-04-26T22:48:05Z","timestamp":1619477285000},"page":"1-6","source":"Crossref","is-referenced-by-count":1,"title":["Bias Temperature Instability Depending on Body Bias through Buried Oxide (BOX) Layer in a 65 nm Fully-Depleted Silicon-On-Insulator Process"],"prefix":"10.1109","author":[{"given":"Ryo","family":"Kishida","sequence":"first","affiliation":[]},{"given":"Ikuo","family":"Suda","sequence":"additional","affiliation":[]},{"given":"Kazutoshi","family":"Kobayashi","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1109\/TED.2011.2107520"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1109\/TDMR.2014.2360779"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1109\/TSM.2020.2983060"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.1109\/TDMR.2013.2267274"},{"key":"ref14","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2011.5784604"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2015.7112780"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1109\/TED.2011.2164543"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2013.6531958"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1109\/CICC.2014.6945996"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1109\/EDTM.2017.7947535"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1109\/IEDM.2011.6131580"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1109\/IEDM.2004.1419245"},{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1109\/VTSA.2011.5872206"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2015.7112761"}],"event":{"name":"2021 IEEE International Reliability Physics Symposium (IRPS)","start":{"date-parts":[[2021,3,21]]},"location":"Monterey, CA, USA","end":{"date-parts":[[2021,3,25]]}},"container-title":["2021 IEEE International Reliability Physics Symposium (IRPS)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/9405068\/9405088\/09405121.pdf?arnumber=9405121","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2022,7,9]],"date-time":"2022-07-09T02:19:30Z","timestamp":1657333170000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/9405121\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2021,3]]},"references-count":14,"URL":"https:\/\/doi.org\/10.1109\/irps46558.2021.9405121","relation":{},"subject":[],"published":{"date-parts":[[2021,3]]}}}