{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,9,8]],"date-time":"2024-09-08T01:39:10Z","timestamp":1725759550774},"reference-count":9,"publisher":"IEEE","license":[{"start":{"date-parts":[[2024,4,14]],"date-time":"2024-04-14T00:00:00Z","timestamp":1713052800000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2024,4,14]],"date-time":"2024-04-14T00:00:00Z","timestamp":1713052800000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2024,4,14]]},"DOI":"10.1109\/irps48228.2024.10529466","type":"proceedings-article","created":{"date-parts":[[2024,5,16]],"date-time":"2024-05-16T17:21:48Z","timestamp":1715880108000},"page":"P6.EM-1-P6.EM-4","source":"Crossref","is-referenced-by-count":0,"title":["Drain Current Degradation Induced by Charge Trapping\/De-Trapping in Fe-FET"],"prefix":"10.1109","author":[{"given":"Taeyoung","family":"Kim","sequence":"first","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Suhwan","family":"Lim","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Ilho","family":"Myeong","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Sanghyun","family":"Park","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Suseong","family":"Noh","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Seung Min","family":"Lee","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jongho","family":"Woo","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hanseung","family":"Ko","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Youngji","family":"Noh","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Moonkang","family":"Choi","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Kiheun","family":"Lee","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Sangwoo","family":"Han","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jongyeon","family":"Baek","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Kijoon","family":"Kim","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Dongjin","family":"Jung","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Ji-sung","family":"Kim","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jaewoo","family":"Park","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Seunghyun","family":"Kim","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hyoseok","family":"Kim","sequence":"additional","affiliation":[{"name":"Innovation Center, Samsung Electronics Co., Ltd, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Sijung","family":"Yoo","sequence":"additional","affiliation":[{"name":"Samsung Advanced Institute of Technology, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hyun Jae","family":"Lee","sequence":"additional","affiliation":[{"name":"Samsung Advanced Institute of Technology, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Duk-Hyun","family":"Choe","sequence":"additional","affiliation":[{"name":"Samsung Advanced Institute of Technology, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Seung-Geol","family":"Nam","sequence":"additional","affiliation":[{"name":"Samsung Advanced Institute of Technology, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Ilyoung","family":"Yoon","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Chaeho","family":"Kim","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Kwanzsoo","family":"Kim","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Kwanzmin","family":"Park","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Bong Jin","family":"Kuh","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jinseong","family":"Heo","sequence":"additional","affiliation":[{"name":"Samsung Advanced Institute of Technology, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Wanki","family":"Kim","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Daewon","family":"Ha","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jaihyuk","family":"Song","sequence":"additional","affiliation":[{"name":"Semiconductor R&D Center, South Korea,Hwaseong-si,Gyeonggi-do,South Korea"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"263","reference":[{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1038\/s41565-023-01399-y"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1038\/s41586-020-2208-x"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1109\/IEDM13553.2020.9372076"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/IMW52921.2022.9779292"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1109\/IEDM45741.2023.10413820"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1109\/TED.2002.803626"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1109\/VLSITechnology18217.2020.9265055"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1063\/5.0168515"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1109\/VLSITechnologyandCir46769.2022.9830465"}],"event":{"name":"2024 IEEE International Reliability Physics Symposium (IRPS)","start":{"date-parts":[[2024,4,14]]},"location":"Grapevine, TX, USA","end":{"date-parts":[[2024,4,18]]}},"container-title":["2024 IEEE International Reliability Physics Symposium (IRPS)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/10529283\/10529298\/10529466.pdf?arnumber=10529466","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2024,5,17]],"date-time":"2024-05-17T05:12:52Z","timestamp":1715922772000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10529466\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2024,4,14]]},"references-count":9,"URL":"https:\/\/doi.org\/10.1109\/irps48228.2024.10529466","relation":{},"subject":[],"published":{"date-parts":[[2024,4,14]]}}}