{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2024,10,23]],"date-time":"2024-10-23T07:31:46Z","timestamp":1729668706718,"version":"3.28.0"},"reference-count":12,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2012,3]]},"DOI":"10.1109\/nems.2012.6196868","type":"proceedings-article","created":{"date-parts":[[2012,5,24]],"date-time":"2012-05-24T18:26:58Z","timestamp":1337884018000},"page":"685-688","source":"Crossref","is-referenced-by-count":0,"title":["Fabrication and Performance Optimization of the Microplasma Reactor with Composite Dielectrics"],"prefix":"10.1109","author":[{"given":"Zhen","family":"Yuan","sequence":"first","affiliation":[]},{"given":"Li","family":"Wen","sequence":"additional","affiliation":[]},{"given":"Leili","family":"Cheng","sequence":"additional","affiliation":[]},{"given":"Jianqiang","family":"Ma","sequence":"additional","affiliation":[]},{"given":"Jiaru","family":"Chu","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"3","doi-asserted-by":"publisher","DOI":"10.1088\/0022-3727\/44\/22\/224011"},{"key":"2","doi-asserted-by":"publisher","DOI":"10.1002\/tee.20031"},{"key":"10","doi-asserted-by":"crossref","first-page":"362","DOI":"10.1016\/j.sna.2010.12.006","article-title":"Design and fabrication of microcantilever probe integrated with microplasma reactor for maskless scanning plasma etching Comprehensive Microsystems","volume":"a 169","author":"wen","year":"2011","journal-title":"Sensors and Actuators"},{"key":"1","doi-asserted-by":"publisher","DOI":"10.1088\/0022-3727\/39\/3\/R01"},{"key":"7","doi-asserted-by":"publisher","DOI":"10.1016\/j.apsusc.2010.01.045"},{"key":"6","first-page":"454","article-title":"Characteristics of Inverted Pyramidal Microdischarge Devices Operating in CHF3 and CHF3\/Ar for Maskless Microplasma Etching","author":"wen","year":"0","journal-title":"Transducers'11"},{"key":"5","doi-asserted-by":"publisher","DOI":"10.1109\/JMEMS.2002.802907"},{"key":"4","doi-asserted-by":"publisher","DOI":"10.1109\/TPS.2007.893467"},{"key":"9","first-page":"211","article-title":"Fabrication and Performance of Microplasma Reactor for Maskless Scanning Plasma Etching","author":"zhang","year":"0","journal-title":"IEEE-NEMS2010"},{"key":"8","doi-asserted-by":"publisher","DOI":"10.1109\/TRANSDUCERS.2011.5969432"},{"key":"11","doi-asserted-by":"publisher","DOI":"10.1016\/j.jnoncrysol.2011.08.029"},{"key":"12","first-page":"77","article-title":"Experimental Study of the Internal Stress of Silicon Nitride Films Deposited by PECVD","author":"yang","year":"2008","journal-title":"New Technology & New Process"}],"event":{"name":"2012 7th IEEE International Conference on Nano\/Micro Engineered and Molecular Systems (NEMS)","start":{"date-parts":[[2012,3,5]]},"location":"Kyoto, Japan","end":{"date-parts":[[2012,3,8]]}},"container-title":["2012 7th IEEE International Conference on Nano\/Micro Engineered and Molecular Systems (NEMS)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx5\/6189421\/6196692\/06196868.pdf?arnumber=6196868","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2017,6,20]],"date-time":"2017-06-20T15:14:19Z","timestamp":1497971659000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/6196868\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2012,3]]},"references-count":12,"URL":"https:\/\/doi.org\/10.1109\/nems.2012.6196868","relation":{},"subject":[],"published":{"date-parts":[[2012,3]]}}}