{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,7,8]],"date-time":"2025-07-08T19:24:44Z","timestamp":1752002684649,"version":"3.28.0"},"reference-count":30,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2012,6]]},"DOI":"10.1109\/newcas.2012.6329024","type":"proceedings-article","created":{"date-parts":[[2012,10,16]],"date-time":"2012-10-16T15:06:26Z","timestamp":1350399986000},"page":"333-336","source":"Crossref","is-referenced-by-count":2,"title":["Fabrication of CMOS-compatible nanopillars for smart bio-mimetic CMOS image sensors"],"prefix":"10.1109","author":[{"given":"Faycal","family":"Saffih","sequence":"first","affiliation":[]},{"given":"Amro M.","family":"Elshurafa","sequence":"additional","affiliation":[]},{"given":"Mohammad","family":"Ali Mohammad","sequence":"additional","affiliation":[]},{"given":"Nathaniel","family":"Nelson-Fitzpatrick","sequence":"additional","affiliation":[]},{"given":"Stephane","family":"Evoy","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"19","doi-asserted-by":"publisher","DOI":"10.1021\/jp064484i"},{"article-title":"Bio-inspired nanostructures for implementing PNJunctions","year":"2009","author":"saffih","key":"17"},{"key":"18","doi-asserted-by":"publisher","DOI":"10.1088\/0957-4484\/17\/4\/019"},{"key":"15","doi-asserted-by":"publisher","DOI":"10.1007\/BF00220828"},{"key":"16","doi-asserted-by":"publisher","DOI":"10.1007\/BF00306765"},{"key":"13","doi-asserted-by":"publisher","DOI":"10.1109\/LED.2010.2040062"},{"key":"14","doi-asserted-by":"publisher","DOI":"10.1109\/ISCAS.2011.5937686"},{"key":"11","doi-asserted-by":"publisher","DOI":"10.1109\/TED.2007.908892"},{"key":"12","doi-asserted-by":"publisher","DOI":"10.1109\/LED.2010.2091715"},{"key":"21","doi-asserted-by":"publisher","DOI":"10.1016\/j.mee.2010.12.102"},{"key":"20","doi-asserted-by":"crossref","first-page":"763","DOI":"10.1116\/1.3455498","article-title":"Fabrication of nanowires with high aspect ratios utilized by dry etching with SF(6):C(4)F(8) and selflimiting thermal oxidation on Si substrate","volume":"28","author":"berger","year":"2010","journal-title":"Journal of Vacuum Science & Technology B"},{"article-title":"Verfahren zum anisotropen aetzen von silicium","year":"1994","author":"laermer","key":"22"},{"key":"23","article-title":"Silicon micro-machining as an enabling technology for advanced device packaging","author":"chambers","year":"2004","journal-title":"Semiconductor Manufacturing Magazine"},{"article-title":"Method of surface treatment of semiconductor substrates","year":"2000","author":"bhardwaj","key":"24"},{"key":"25","doi-asserted-by":"crossref","first-page":"13","DOI":"10.1016\/S0924-4247(98)00326-4","article-title":"Recent advances in silicon etching for MEMS using the ASE (TM) process","volume":"74","author":"hynes","year":"1999","journal-title":"Sensors and Actuators A Physical"},{"key":"26","doi-asserted-by":"publisher","DOI":"10.1088\/0957-4484\/20\/25\/255305"},{"key":"27","doi-asserted-by":"publisher","DOI":"10.1557\/PROC-1258-Q14-02"},{"key":"28","doi-asserted-by":"publisher","DOI":"10.1007\/s00542-003-0309-8"},{"key":"29","doi-asserted-by":"publisher","DOI":"10.1116\/1.1313578"},{"key":"3","doi-asserted-by":"publisher","DOI":"10.1166\/jnn.2009.1356"},{"key":"2","doi-asserted-by":"publisher","DOI":"10.1016\/j.snb.2007.04.011"},{"journal-title":"Electron Beam Lithography for the Fabrication of Nanopillars in Type II Indium Arsenide\/gallium Antimonide Superlattices for Multicolor Infrared Focal Plane Arrays","year":"2006","author":"gin","key":"10"},{"key":"1","doi-asserted-by":"crossref","first-page":"3249","DOI":"10.1021\/nl071018b","article-title":"Analysis of optical absorption in silicon nanowire arrays for photovoltaic applications","volume":"7","author":"hu","year":"2007","journal-title":"Nano Letters"},{"key":"30","doi-asserted-by":"publisher","DOI":"10.1016\/j.mee.2006.01.079"},{"key":"7","doi-asserted-by":"publisher","DOI":"10.1116\/1.3246359"},{"key":"6","doi-asserted-by":"publisher","DOI":"10.1007\/s11664-009-1015-9"},{"article-title":"Complementary metal oxide semiconductor image sensor and method for fabricating the same","year":"2010","author":"choi","key":"5"},{"key":"4","doi-asserted-by":"publisher","DOI":"10.1109\/TED.2011.2159978"},{"key":"9","doi-asserted-by":"publisher","DOI":"10.1116\/1.3212912"},{"key":"8","doi-asserted-by":"publisher","DOI":"10.1088\/0957-4484\/17\/5\/028"}],"event":{"name":"2012 IEEE 10th International New Circuits and Systems Conference (NEWCAS)","start":{"date-parts":[[2012,6,17]]},"location":"Montreal, QC, Canada","end":{"date-parts":[[2012,6,20]]}},"container-title":["10th IEEE International NEWCAS Conference"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx5\/6324002\/6328940\/06329024.pdf?arnumber=6329024","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2017,6,20]],"date-time":"2017-06-20T21:27:47Z","timestamp":1497994067000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/6329024\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2012,6]]},"references-count":30,"URL":"https:\/\/doi.org\/10.1109\/newcas.2012.6329024","relation":{},"subject":[],"published":{"date-parts":[[2012,6]]}}}