{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2023,9,13]],"date-time":"2023-09-13T17:52:31Z","timestamp":1694627551236},"reference-count":9,"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","issue":"1","license":[{"start":{"date-parts":[[1987,1,1]],"date-time":"1987-01-01T00:00:00Z","timestamp":536457600000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/ieeexplore.ieee.org\/Xplorehelp\/downloads\/license-information\/IEEE.html"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst."],"published-print":{"date-parts":[[1987,1]]},"DOI":"10.1109\/tcad.1987.1270256","type":"journal-article","created":{"date-parts":[[2004,4,29]],"date-time":"2004-04-29T00:28:59Z","timestamp":1083198539000},"page":"145-151","source":"Crossref","is-referenced-by-count":1,"title":["The Outline Procedure in Pattern Data Preparation for Vector-Scan Electron-Beam Lithography"],"prefix":"10.1109","volume":"6","author":[{"given":"K.","family":"Komatsu","sequence":"first","affiliation":[]},{"given":"M.","family":"Suzuki","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"ref4","article-title":"High precision VLSI patterning technology for e-beam direct writing process","author":"komatsu","year":"0","journal-title":"Dig Tech Pap 1984 Symp VLSI Technol"},{"key":"ref3","first-page":"84","article-title":"Pattern data processing technology for electron beam direct writing","author":"komatsu","year":"1982","journal-title":"Proc 23rd Symp Semiconductors Integrated Circuit"},{"key":"ref6","doi-asserted-by":"crossref","first-page":"686","DOI":"10.1109\/T-ED.1979.19477","article-title":"electron-beam resist edge profile simulation","volume":"26","author":"neureuther","year":"1979","journal-title":"IEEE Transactions on Electron Devices"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1116\/1.571195"},{"key":"ref8","first-page":"576","article-title":"Minimum partitioning of an LSI artwork pattern","volume":"16","author":"oyamada","year":"1975","journal-title":"Trans Infor Processing Soc Japan"},{"key":"ref7","author":"ronse","year":"1984","journal-title":"Connected Components in Binary Image The Detection Problem"},{"key":"ref2","doi-asserted-by":"crossref","first-page":"1279","DOI":"10.1109\/T-ED.1981.20600","article-title":"variable-shaped electron-beam direct writing technology for 1-µm vlsi fabrication","volume":"28","author":"sakakibara","year":"1981","journal-title":"IEEE Transactions on Electron Devices"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1116\/1.568515"},{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1116\/1.570632"}],"container-title":["IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems"],"original-title":[],"language":"en","link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx5\/43\/28439\/01270256.pdf?arnumber=1270256","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2021,11,29]],"date-time":"2021-11-29T20:39:45Z","timestamp":1638218385000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/1270256\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[1987,1]]},"references-count":9,"journal-issue":{"issue":"1","published-print":{"date-parts":[[1987,1]]}},"URL":"https:\/\/doi.org\/10.1109\/tcad.1987.1270256","relation":{},"ISSN":["0278-0070"],"issn-type":[{"value":"0278-0070","type":"print"}],"subject":[],"published":{"date-parts":[[1987,1]]}}}