{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,7,30]],"date-time":"2026-07-30T01:56:13Z","timestamp":1785376573975,"version":"3.55.0"},"reference-count":26,"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","issue":"11","license":[{"start":{"date-parts":[[2011,11,1]],"date-time":"2011-11-01T00:00:00Z","timestamp":1320105600000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/ieeexplore.ieee.org\/Xplorehelp\/downloads\/license-information\/IEEE.html"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst."],"published-print":{"date-parts":[[2011,11]]},"DOI":"10.1109\/tcad.2011.2164537","type":"journal-article","created":{"date-parts":[[2011,10,18]],"date-time":"2011-10-18T15:27:30Z","timestamp":1318951650000},"page":"1621-1634","source":"Crossref","is-referenced-by-count":73,"title":["High Performance Lithography Hotspot Detection With Successively Refined Pattern Identifications and Machine Learning"],"prefix":"10.1109","volume":"30","author":[{"family":"Duo Ding","sequence":"first","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"J. A.","family":"Torres","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"D. Z.","family":"Pan","sequence":"additional","affiliation":[],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"263","reference":[{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1117\/12.517364"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1117\/12.712491"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1117\/12.692949"},{"key":"ref13","first-page":"839","article-title":"Accurate detection for process hotspots with vias and incomplete specification","author":"xu","year":"2007","journal-title":"Proc Int Conf Comput Aided Design"},{"key":"ref14","first-page":"625","article-title":"Efficient process hotspot detection using range pattern matching","author":"yao","year":"2006","journal-title":"Proc Int Conf Comput Aided Design"},{"key":"ref15","doi-asserted-by":"publisher","DOI":"10.1117\/12.728959"},{"key":"ref16","doi-asserted-by":"publisher","DOI":"10.1117\/12.772867"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.1145\/1629911.1630053"},{"key":"ref18","doi-asserted-by":"publisher","DOI":"10.1117\/12.814316"},{"key":"ref19","doi-asserted-by":"publisher","DOI":"10.1109\/ASPDAC.2011.5722295"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1145\/1391469.1391599"},{"key":"ref3","first-page":"504","article-title":"ELIAD: Efficient lithography aware detailed router with compact printability prediction","author":"cho","year":"2008","journal-title":"Proc Design Automat Conf"},{"key":"ref6","first-page":"186","article-title":"Optical proximity correction (OPC) friendly maze routing","author":"huang","year":"2004","journal-title":"Proc Design Automat Conf"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1561\/1000000015"},{"key":"ref8","first-page":"8","article-title":"SADP: The best option","volume":"5","author":"bencher","year":"2007","journal-title":"Nanochip Tech J"},{"key":"ref7","article-title":"Lithography 2009 overview of opportunities","author":"borodovsky","year":"2009","journal-title":"Semicon West"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1145\/1065579.1065678"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1117\/12.847222"},{"key":"ref1","year":"2010","journal-title":"International Technology Roadmap for Semiconductors"},{"key":"ref20","doi-asserted-by":"publisher","DOI":"10.1109\/ICICDT.2009.5166300"},{"key":"ref22","year":"2011","journal-title":"Calibre"},{"key":"ref21","doi-asserted-by":"publisher","DOI":"10.1109\/ASPDAC.2011.5722294"},{"key":"ref24","doi-asserted-by":"publisher","DOI":"10.1109\/ICNN.1993.298623"},{"key":"ref23","doi-asserted-by":"publisher","DOI":"10.1117\/12.599044"},{"key":"ref26","first-page":"72750n","article-title":"Directional 2D functions as models for fast layout pattern transfer verification","volume":"7275","author":"torres","year":"2009","journal-title":"Proc SPIE"},{"key":"ref25","first-page":"1889","article-title":"Working set selection using second order information for training support vector machines","volume":"6","author":"fan","year":"2005","journal-title":"J Mach Learn Res"}],"container-title":["IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx5\/43\/6046160\/06046168.pdf?arnumber=6046168","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2021,12,23]],"date-time":"2021-12-23T13:25:07Z","timestamp":1640265907000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/6046168\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2011,11]]},"references-count":26,"journal-issue":{"issue":"11"},"URL":"https:\/\/doi.org\/10.1109\/tcad.2011.2164537","relation":{},"ISSN":["0278-0070","1937-4151"],"issn-type":[{"value":"0278-0070","type":"print"},{"value":"1937-4151","type":"electronic"}],"subject":[],"published":{"date-parts":[[2011,11]]}}}