{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,21]],"date-time":"2025-11-21T18:50:50Z","timestamp":1763751050057,"version":"3.45.0"},"reference-count":42,"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","issue":"11","license":[{"start":{"date-parts":[[2025,11,1]],"date-time":"2025-11-01T00:00:00Z","timestamp":1761955200000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/ieeexplore.ieee.org\/Xplorehelp\/downloads\/license-information\/IEEE.html"},{"start":{"date-parts":[[2025,11,1]],"date-time":"2025-11-01T00:00:00Z","timestamp":1761955200000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2025,11,1]],"date-time":"2025-11-01T00:00:00Z","timestamp":1761955200000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"funder":[{"name":"Research Grants Council of Hong Kong, SAR","award":["RFS2425-4S02"],"award-info":[{"award-number":["RFS2425-4S02"]}]},{"name":"MIND Project","award":["MINDXZ202404"],"award-info":[{"award-number":["MINDXZ202404"]}]},{"DOI":"10.13039\/501100012166","name":"National Key Research and Development Program of China","doi-asserted-by":"publisher","award":["2020YFA0711900","2020YFA0711903"],"award-info":[{"award-number":["2020YFA0711900","2020YFA0711903"]}],"id":[{"id":"10.13039\/501100012166","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["IEEE Trans. Comput.-Aided Des. Integr. Circuits Syst."],"published-print":{"date-parts":[[2025,11]]},"DOI":"10.1109\/tcad.2025.3562158","type":"journal-article","created":{"date-parts":[[2025,4,17]],"date-time":"2025-04-17T13:41:46Z","timestamp":1744897306000},"page":"4263-4275","source":"Crossref","is-referenced-by-count":0,"title":["Streamlining Computational Lithography With Efficient Pattern Database"],"prefix":"10.1109","volume":"44","author":[{"ORCID":"https:\/\/orcid.org\/0000-0003-1159-1611","authenticated-orcid":false,"given":"Su","family":"Zheng","sequence":"first","affiliation":[{"name":"Department of Computer Science and Engineering, The Chinese University of Hong Kong, New Territories, SAR, Hong Kong"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-9501-9254","authenticated-orcid":false,"given":"Wenqian","family":"Zhao","sequence":"additional","affiliation":[{"name":"Department of Computer Science and Engineering, The Chinese University of Hong Kong, New Territories, SAR, Hong Kong"}]},{"ORCID":"https:\/\/orcid.org\/0009-0003-5737-3422","authenticated-orcid":false,"given":"Shuyuan","family":"Sun","sequence":"additional","affiliation":[{"name":"State Key Laboratory of Integrated Circuits and Systems, Fudan University, Shanghai, China"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-2164-8175","authenticated-orcid":false,"given":"Fan","family":"Yang","sequence":"additional","affiliation":[{"name":"State Key Laboratory of Integrated Circuits and Systems, Fudan University, Shanghai, China"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-6406-4810","authenticated-orcid":false,"given":"Bei","family":"Yu","sequence":"additional","affiliation":[{"name":"Department of Computer Science and Engineering, The Chinese University of Hong Kong, New Territories, SAR, Hong Kong"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-8274-9688","authenticated-orcid":false,"given":"Martin D. F.","family":"Wong","sequence":"additional","affiliation":[{"name":"Department of Computer Science, Hong Kong Baptist University, Kowloon Tong, SAR, Hong Kong"}]}],"member":"263","reference":[{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1109\/ISQED.2000.838858"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2010.5654341"},{"key":"ref3","first-page":"1591","article-title":"A robust approach for process variation aware mask optimization","volume-title":"Proc. IEEE\/ACM Proc. Design, Autom. Test Eurpoe (DATE)","author":"Kuang"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/DAC.2014.6881379"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2022.3175939"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1145\/3626184.3633315"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1109\/DAC56929.2023.10247704"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1145\/3649329.3657309"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2019.2939329"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2021.3109556"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD51958.2021.9643464"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2021.3116511"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2023.3309745"},{"key":"ref14","doi-asserted-by":"publisher","DOI":"10.1145\/3649329.3656254"},{"key":"ref15","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD.2006.320026"},{"key":"ref16","first-page":"68","article-title":"A novel fuzzy matching model for lithography hotspot detection","volume-title":"Proc. ACM\/IEEE Design Autom. Conf. (DAC)","author":"Lin"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.1117\/12.2262363"},{"key":"ref18","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2020.3015918"},{"key":"ref19","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2020.3015903"},{"key":"ref20","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2021.3112637"},{"key":"ref21","first-page":"146","article-title":"Faster region-based hotspot detection","volume-title":"Proc. ACM\/IEEE Design Autom. Conf. (DAC)","author":"Chen"},{"key":"ref22","doi-asserted-by":"publisher","DOI":"10.1109\/ICCAD51958.2021.9643590"},{"journal-title":"IEEE Trans. Comput.-Aided Design Integr. Circuits Syst.","article-title":"AdaOPC: A self-adaptive mask optimization framework for real design patterns","author":"Zhao","key":"ref23"},{"key":"ref24","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2024.3361400"},{"key":"ref25","doi-asserted-by":"publisher","DOI":"10.1109\/ASICON58565.2023.10396314"},{"key":"ref26","doi-asserted-by":"publisher","DOI":"10.1109\/tbdata.2025.3618474"},{"key":"ref27","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR.2015.7298594"},{"key":"ref28","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR.2019.00516"},{"volume-title":"METIS: A software package for partitioning unstructured graphs, partitioning meshes, and computing fill-reducing orderings of sparse matrices","year":"1997","author":"Karypis","key":"ref29"},{"key":"ref30","first-page":"123","article-title":"AdaOPC: A self-adaptive mask optimization framework for real design patterns","volume-title":"Proc. IEEE\/ACM Int. Conf. Comput.-Aided Design (ICCAD)","author":"Zhao"},{"key":"ref31","first-page":"147","article-title":"Efficient layout hotspot detection via binarized residual neural network","volume-title":"Proc. ACM\/IEEE Design Autom. Conf. (DAC)","author":"Jiang"},{"key":"ref32","first-page":"1","article-title":"Algorithms for hyper-parameter optimization","volume-title":"Proc. Annu. Conf. Neural Inf. Process. Syst. (NeurIPS)","volume":"24","author":"Bergstra"},{"key":"ref33","first-page":"8026","article-title":"Pytorch: An imperative style, high-performance deep learning library","volume-title":"Proc. Annu. Conf. Neural Inf. Process. Syst. (NeurIPS)","volume":"32","author":"Paszke"},{"key":"ref34","first-page":"1","article-title":"LithoBench: Benchmarking AI computational lithography for semiconductor manufacturing","volume-title":"Proc. Annu. Conf. Neural Inf. Process. Syst. (NeurIPS)","author":"Zheng"},{"key":"ref35","first-page":"76","article-title":"Toward an open-source digital flow: First learnings from the OpenROAD project","volume-title":"Proc. ACM\/IEEE Design Autom. Conf. (DAC)","author":"Ajayi"},{"key":"ref36","doi-asserted-by":"publisher","DOI":"10.1109\/CVPR.2016.90"},{"key":"ref37","first-page":"1","article-title":"Hotspot detection via attention-based deep layout metric learning","volume-title":"Proc. IEEE\/ACM Int. Conf. Comput.-Aided Design (ICCAD)","author":"Geng"},{"key":"ref38","doi-asserted-by":"publisher","DOI":"10.1080\/03610927408827101"},{"key":"ref39","doi-asserted-by":"publisher","DOI":"10.1109\/TPAMI.1979.4766909"},{"key":"ref40","doi-asserted-by":"publisher","DOI":"10.1117\/1.jmm.14.1.011003"},{"key":"ref41","doi-asserted-by":"publisher","DOI":"10.1109\/TSM.2022.3184412"},{"key":"ref42","doi-asserted-by":"publisher","DOI":"10.1364\/OE.485206"}],"container-title":["IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx8\/43\/11211509\/10967394.pdf?arnumber=10967394","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,11,21]],"date-time":"2025-11-21T18:43:20Z","timestamp":1763750600000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10967394\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2025,11]]},"references-count":42,"journal-issue":{"issue":"11"},"URL":"https:\/\/doi.org\/10.1109\/tcad.2025.3562158","relation":{},"ISSN":["0278-0070","1937-4151"],"issn-type":[{"type":"print","value":"0278-0070"},{"type":"electronic","value":"1937-4151"}],"subject":[],"published":{"date-parts":[[2025,11]]}}}