{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,6,4]],"date-time":"2026-06-04T11:55:16Z","timestamp":1780574116987,"version":"3.54.1"},"reference-count":20,"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","issue":"11","license":[{"start":{"date-parts":[[2024,11,1]],"date-time":"2024-11-01T00:00:00Z","timestamp":1730419200000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/ieeexplore.ieee.org\/Xplorehelp\/downloads\/license-information\/IEEE.html"},{"start":{"date-parts":[[2024,11,1]],"date-time":"2024-11-01T00:00:00Z","timestamp":1730419200000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2024,11,1]],"date-time":"2024-11-01T00:00:00Z","timestamp":1730419200000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"funder":[{"name":"Regional Innovation Strategy"},{"DOI":"10.13039\/501100003725","name":"National Research Foundation of Korea","doi-asserted-by":"publisher","id":[{"id":"10.13039\/501100003725","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/100010449","name":"Ministry of Education","doi-asserted-by":"publisher","award":["2021RIS-004"],"award-info":[{"award-number":["2021RIS-004"]}],"id":[{"id":"10.13039\/100010449","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["IEEE Trans. Ind. Electron."],"published-print":{"date-parts":[[2024,11]]},"DOI":"10.1109\/tie.2024.3363739","type":"journal-article","created":{"date-parts":[[2024,2,23]],"date-time":"2024-02-23T18:56:55Z","timestamp":1708714615000},"page":"13932-13942","source":"Crossref","is-referenced-by-count":2,"title":["A New High-Power Density Tailored Waveform Modulator for Plasma Processing"],"prefix":"10.1109","volume":"71","author":[{"ORCID":"https:\/\/orcid.org\/0000-0002-5854-5578","authenticated-orcid":false,"given":"Jae-Sang","family":"Kim","sequence":"first","affiliation":[{"name":"Department of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, South Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-3149-4598","authenticated-orcid":false,"given":"Jung-Kyu","family":"Han","sequence":"additional","affiliation":[{"name":"Department of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, South Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0009-0005-4745-2391","authenticated-orcid":false,"given":"Jaeho","family":"Kim","sequence":"additional","affiliation":[{"name":"Department of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, South Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-5230-2922","authenticated-orcid":false,"given":"Gun-Woo","family":"Moon","sequence":"additional","affiliation":[{"name":"Department of Electrical Engineering, Korea Advanced Institute of Science and Technology, Daejeon, South Korea"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"263","reference":[{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1116\/1.4819316"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1116\/1.4756906"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1088\/0963-0252\/19\/6\/065014"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/TPS.2021.3120596"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1109\/TPEL.2019.2932056"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1109\/TIA.2022.3175466"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1109\/JESTPE.2021.3073121"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1109\/TPEL.2017.2734678"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1063\/1.373715"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1088\/1009-0630\/17\/7\/06"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1063\/1.3225690"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1116\/1.2013318"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.1063\/5.0028033"},{"key":"ref14","article-title":"Synchronized pulsing of plasma processing source and substrate bias","author":"Fairbairn","year":"2020"},{"key":"ref15","doi-asserted-by":"publisher","DOI":"10.23919\/IPEC-Himeji2022-ECCE53331.2022.9806909"},{"key":"ref16","article-title":"System, method and apparatus for controlling ion energy distribution","author":"Brouk","year":"2016"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.23919\/EPE20ECCEEurope43536.2020.9215859"},{"key":"ref18","article-title":"Voltage generator, voltage waveform generator, semiconductor device manufacturing apparatus, voltage waveform generation method, and semiconductor device manufacturing method","author":"Bae","year":"2019"},{"key":"ref19","doi-asserted-by":"publisher","DOI":"10.1109\/TIA.2021.3056331"},{"key":"ref20","article-title":"Pulse voltage boost for substrate processing","author":"Yang","year":"2022"}],"container-title":["IEEE Transactions on Industrial Electronics"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/41\/10639500\/10444697.pdf?arnumber=10444697","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2024,12,16]],"date-time":"2024-12-16T19:24:26Z","timestamp":1734377066000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10444697\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2024,11]]},"references-count":20,"journal-issue":{"issue":"11"},"URL":"https:\/\/doi.org\/10.1109\/tie.2024.3363739","relation":{},"ISSN":["0278-0046","1557-9948"],"issn-type":[{"value":"0278-0046","type":"print"},{"value":"1557-9948","type":"electronic"}],"subject":[],"published":{"date-parts":[[2024,11]]}}}