{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,2,15]],"date-time":"2026-02-15T21:12:10Z","timestamp":1771189930756,"version":"3.50.1"},"reference-count":42,"publisher":"Institute of Electrical and Electronics Engineers (IEEE)","issue":"10","license":[{"start":{"date-parts":[[2015,10,1]],"date-time":"2015-10-01T00:00:00Z","timestamp":1443657600000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/ieeexplore.ieee.org\/Xplorehelp\/downloads\/license-information\/IEEE.html"}],"funder":[{"DOI":"10.13039\/100000185","name":"Defense Advanced Research Projects Agency (DARPA)","doi-asserted-by":"publisher","award":["HR0011-11-1-0011"],"award-info":[{"award-number":["HR0011-11-1-0011"]}],"id":[{"id":"10.13039\/100000185","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["IEEE Trans. VLSI Syst."],"published-print":{"date-parts":[[2015,10]]},"DOI":"10.1109\/tvlsi.2014.2357756","type":"journal-article","created":{"date-parts":[[2014,10,2]],"date-time":"2014-10-02T18:47:49Z","timestamp":1412275669000},"page":"2065-2076","source":"Crossref","is-referenced-by-count":17,"title":["Microprocessor Aging Analysis and Reliability Modeling Due to Back-End Wearout Mechanisms"],"prefix":"10.1109","volume":"23","author":[{"given":"Chang-Chih","family":"Chen","sequence":"first","affiliation":[]},{"given":"Linda","family":"Milor","sequence":"additional","affiliation":[]}],"member":"263","reference":[{"key":"ref39","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2014.6861125"},{"key":"ref38","doi-asserted-by":"crossref","first-page":"500","DOI":"10.1109\/16.987122","article-title":"impact of mosfet gate oxide breakdown on digital circuit operation and reliability","volume":"49","author":"kaczer","year":"2002","journal-title":"IEEE Transactions on Electron Devices"},{"key":"ref33","year":"2003","journal-title":"Xilinx ISE"},{"key":"ref32","doi-asserted-by":"publisher","DOI":"10.1063\/1.2766695"},{"key":"ref31","first-page":"73504-1","article-title":"Stress migration model for Cu interconnect reliability analysis","volume":"110","author":"yao","year":"2011","journal-title":"J Appl Phys"},{"key":"ref30","year":"0","journal-title":"SoC Encounter"},{"key":"ref37","doi-asserted-by":"publisher","DOI":"10.1109\/ASAP.2002.1030716"},{"key":"ref36","year":"2005","journal-title":"Leon3 Processor"},{"key":"ref35","year":"2004","journal-title":"Hotspot Temperature Modeling Tool"},{"key":"ref34","year":"2006","journal-title":"PrimeTime Power Modeling Tool"},{"key":"ref10","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2011.5784454"},{"key":"ref40","doi-asserted-by":"publisher","DOI":"10.1109\/IISWC.2009.5306797"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1109\/RELPHY.2007.369921"},{"key":"ref12","doi-asserted-by":"publisher","DOI":"10.1109\/RELPHY.2007.369922"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.1109\/RELPHY.2006.251190"},{"key":"ref14","doi-asserted-by":"publisher","DOI":"10.1016\/j.microrel.2008.06.037"},{"key":"ref15","doi-asserted-by":"publisher","DOI":"10.1109\/TDMR.2008.915629"},{"key":"ref16","first-page":"168","article-title":"TDDB kinetics and their relationship with the E- and $\\surd $ E-models","author":"yiang","year":"2008","journal-title":"Proc Int Interconnect Technol Conf"},{"key":"ref17","doi-asserted-by":"publisher","DOI":"10.1016\/j.microrel.2010.07.091"},{"key":"ref18","doi-asserted-by":"publisher","DOI":"10.1109\/DATE.2010.5457195"},{"key":"ref19","doi-asserted-by":"publisher","DOI":"10.1109\/LED.2003.809535"},{"key":"ref28","doi-asserted-by":"publisher","DOI":"10.1109\/TDMR.2009.2015767"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1145\/1878961.1879013"},{"key":"ref27","doi-asserted-by":"publisher","DOI":"10.1109\/SISPAD.2011.6035040"},{"key":"ref3","doi-asserted-by":"publisher","DOI":"10.1109\/TVLSI.2007.915477"},{"key":"ref6","doi-asserted-by":"publisher","DOI":"10.1109\/TSM.2010.2051730"},{"key":"ref29","doi-asserted-by":"publisher","DOI":"10.1109\/IRWS.2007.4469237"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.7873\/DATE.2013.328"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2012.6241878"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1109\/IRWS.1998.745384"},{"key":"ref2","doi-asserted-by":"publisher","DOI":"10.1109\/MM.2005.54"},{"key":"ref9","doi-asserted-by":"publisher","DOI":"10.1109\/TVLSI.2013.2277856"},{"key":"ref1","doi-asserted-by":"publisher","DOI":"10.1109\/IRPS.2011.5784455"},{"key":"ref20","doi-asserted-by":"publisher","DOI":"10.1109\/RELPHY.2007.369958"},{"key":"ref22","doi-asserted-by":"publisher","DOI":"10.3390\/ma5091602"},{"key":"ref21","doi-asserted-by":"publisher","DOI":"10.1063\/1.1852089"},{"key":"ref42","doi-asserted-by":"publisher","DOI":"10.1016\/S0019-9958(60)90287-4"},{"key":"ref24","doi-asserted-by":"publisher","DOI":"10.1109\/TR.2002.804737"},{"key":"ref41","first-page":"147","article-title":"Codes correcteurs d&#x2019;erreurs","volume":"2","author":"hocquenghem","year":"1959","journal-title":"Chiffres"},{"key":"ref23","year":"2001","journal-title":"MiBench benchmark"},{"key":"ref26","doi-asserted-by":"publisher","DOI":"10.1063\/1.2795663"},{"key":"ref25","doi-asserted-by":"publisher","DOI":"10.1063\/1.351615"}],"container-title":["IEEE Transactions on Very Large Scale Integration (VLSI) Systems"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/92\/7274516\/06915733.pdf?arnumber=6915733","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2022,1,12]],"date-time":"2022-01-12T15:59:24Z","timestamp":1642003164000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/6915733"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2015,10]]},"references-count":42,"journal-issue":{"issue":"10"},"URL":"https:\/\/doi.org\/10.1109\/tvlsi.2014.2357756","relation":{},"ISSN":["1063-8210","1557-9999"],"issn-type":[{"value":"1063-8210","type":"print"},{"value":"1557-9999","type":"electronic"}],"subject":[],"published":{"date-parts":[[2015,10]]}}}