{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,5,8]],"date-time":"2026-05-08T15:51:52Z","timestamp":1778255512152,"version":"3.51.4"},"reference-count":13,"publisher":"IEEE","license":[{"start":{"date-parts":[[2024,6,16]],"date-time":"2024-06-16T00:00:00Z","timestamp":1718496000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-029"},{"start":{"date-parts":[[2024,6,16]],"date-time":"2024-06-16T00:00:00Z","timestamp":1718496000000},"content-version":"stm-asf","delay-in-days":0,"URL":"https:\/\/doi.org\/10.15223\/policy-037"}],"funder":[{"DOI":"10.13039\/501100001321","name":"National Research Foundation","doi-asserted-by":"publisher","id":[{"id":"10.13039\/501100001321","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2024,6,16]]},"DOI":"10.1109\/vlsitechnologyandcir46783.2024.10631418","type":"proceedings-article","created":{"date-parts":[[2024,8,26]],"date-time":"2024-08-26T17:23:31Z","timestamp":1724693011000},"page":"1-2","source":"Crossref","is-referenced-by-count":4,"title":["Fluorine Plasma Treatment-Enabled ITO Transistors: Excellent Reliability and Comprehensive Understanding of Temperature Dependence from 77 $\\mathbf{K}$ to 375 $\\mathbf{K}$"],"prefix":"10.1109","author":[{"given":"Xuanqi","family":"Chen","sequence":"first","affiliation":[{"name":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Gan","family":"Liu","sequence":"additional","affiliation":[{"name":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Wei","family":"Shi","sequence":"additional","affiliation":[{"name":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Yuye","family":"Kang","sequence":"additional","affiliation":[{"name":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Qiwen","family":"Kong","sequence":"additional","affiliation":[{"name":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Yuxuan","family":"Wang","sequence":"additional","affiliation":[{"name":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Rui","family":"Shao","sequence":"additional","affiliation":[{"name":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Bich-Yen","family":"Nguyen","sequence":"additional","affiliation":[{"name":"Soitec,Bernin,France,38190"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Gengchiau","family":"Liang","sequence":"additional","affiliation":[{"name":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Kaizhen","family":"Han","sequence":"additional","affiliation":[{"name":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Xiao","family":"Gong","sequence":"additional","affiliation":[{"name":"National University of Singapore (NUS),Department of Electrical and Computer Engineering,Singapore,117576"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"263","reference":[{"key":"ref1","author":"Jie","year":"2023","journal-title":"IEDM"},{"key":"ref2","author":"Wahid","year":"2023","journal-title":"EDL"},{"key":"ref3","author":"Hu","year":"2023","journal-title":"IEDM"},{"key":"ref4","author":"Chen","year":"2023","journal-title":"IEDM"},{"key":"ref5","author":"Aabrar","year":"2023","journal-title":"IEDM"},{"key":"ref6","author":"Zhang","year":"2023","journal-title":"VLSI"},{"key":"ref7","author":"Lee","year":"2023","journal-title":"EDL"},{"key":"ref8","author":"Liu","year":"2023","journal-title":"IEDM"},{"key":"ref9","author":"Kong","year":"2022","journal-title":"IEDM"},{"key":"ref10","author":"Kang","year":"2023","journal-title":"VLSI"},{"key":"ref11","author":"Alam","year":"2023","journal-title":"Nature electronics"},{"key":"ref12","author":"Um","year":"2018","journal-title":"APL"},{"key":"ref13","author":"Hooge","year":"1969","journal-title":"Phy. Lett."}],"event":{"name":"2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","location":"Honolulu, HI, USA","start":{"date-parts":[[2024,6,16]]},"end":{"date-parts":[[2024,6,20]]}},"container-title":["2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx8\/10631290\/10631310\/10631418.pdf?arnumber=10631418","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2024,8,30]],"date-time":"2024-08-30T10:39:37Z","timestamp":1725014377000},"score":1,"resource":{"primary":{"URL":"https:\/\/ieeexplore.ieee.org\/document\/10631418\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2024,6,16]]},"references-count":13,"URL":"https:\/\/doi.org\/10.1109\/vlsitechnologyandcir46783.2024.10631418","relation":{},"subject":[],"published":{"date-parts":[[2024,6,16]]}}}