{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,12,26]],"date-time":"2025-12-26T07:08:53Z","timestamp":1766732933353,"version":"3.28.0"},"reference-count":14,"publisher":"IEEE","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":[],"published-print":{"date-parts":[[2014,12]]},"DOI":"10.1109\/wsc.2014.7020109","type":"proceedings-article","created":{"date-parts":[[2015,1,27]],"date-time":"2015-01-27T15:30:56Z","timestamp":1422372656000},"page":"2649-2660","source":"Crossref","is-referenced-by-count":4,"title":["A sampling decision system for semiconductor manufacturing - relying on virtual metrology and actual measurements"],"prefix":"10.1109","author":[{"given":"Daniel","family":"Kurz","sequence":"first","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jurgen","family":"Pilz","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Andrea","family":"Schirru","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Simone","family":"Pampuri","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Cristina","family":"De Luca","sequence":"additional","affiliation":[],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"263","reference":[{"key":"ref10","first-page":"47","article-title":"The Evolution of APC: The Move to Total Factory Control","volume":"47","author":"moyne","year":"2004","journal-title":"Solid State Technology"},{"key":"ref11","doi-asserted-by":"publisher","DOI":"10.1002\/9780470746684"},{"key":"ref12","first-page":"11614","article-title":"Multilevel Kernel Methods for Virtual Metrology in Semiconductor Manufacturing","author":"schirru","year":"2011","journal-title":"Proc of the 18th IFAC World Congress"},{"key":"ref13","doi-asserted-by":"publisher","DOI":"10.1201\/9780203904541.ch23"},{"key":"ref14","first-page":"52","article-title":"Virtual metrology and your technology watch list: ten things you should know about this emerging technology","volume":"22","author":"weber","year":"2007","journal-title":"Future Fab International"},{"key":"ref4","doi-asserted-by":"publisher","DOI":"10.1109\/ACC.2002.1023955"},{"journal-title":"Model predictive run-to-run control of chemical mechanical planarization","year":"1999","author":"campbell","key":"ref3"},{"journal-title":"Optimal Statistical Decisions","year":"1970","author":"degroot","key":"ref6"},{"key":"ref5","doi-asserted-by":"publisher","DOI":"10.1023\/A:1007379606734"},{"key":"ref8","doi-asserted-by":"publisher","DOI":"10.1109\/CoASE.2013.6653949"},{"key":"ref7","doi-asserted-by":"publisher","DOI":"10.1109\/CoASE.2012.6386366"},{"journal-title":"Bayesian Theory","year":"2000","author":"bernardo","key":"ref2"},{"journal-title":"Dynamic Programming","year":"1957","author":"bellman","key":"ref1"},{"journal-title":"Introduction to Statistical Process Control","year":"2001","author":"montgomery","key":"ref9"}],"event":{"name":"2014 Winter Simulation Conference - (WSC 2014)","start":{"date-parts":[[2014,12,7]]},"location":"Savanah, GA, USA","end":{"date-parts":[[2014,12,10]]}},"container-title":["Proceedings of the Winter Simulation Conference 2014"],"original-title":[],"link":[{"URL":"http:\/\/xplorestaging.ieee.org\/ielx7\/7002492\/7019868\/07020109.pdf?arnumber=7020109","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2017,3,24]],"date-time":"2017-03-24T04:31:25Z","timestamp":1490329885000},"score":1,"resource":{"primary":{"URL":"http:\/\/ieeexplore.ieee.org\/document\/7020109\/"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2014,12]]},"references-count":14,"URL":"https:\/\/doi.org\/10.1109\/wsc.2014.7020109","relation":{},"subject":[],"published":{"date-parts":[[2014,12]]}}}