{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,2]],"date-time":"2025-11-02T09:53:40Z","timestamp":1762077220397,"version":"build-2065373602"},"reference-count":10,"publisher":"Wiley","issue":"8","license":[{"start":{"date-parts":[[2005,7,11]],"date-time":"2005-07-11T00:00:00Z","timestamp":1121040000000},"content-version":"vor","delay-in-days":3632,"URL":"http:\/\/onlinelibrary.wiley.com\/termsAndConditions#vor"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Journal of the American Ceramic Society"],"published-print":{"date-parts":[[1995,8]]},"abstract":"<jats:p>\n                    A process for eliminating surface striations in optical films prepared by sol\u2010gel spin coating is described. The surface morphology of Nd\u2010doped SiO\n                    <jats:sub>2<\/jats:sub>\n                    \u2010TiO\n                    <jats:sub>2<\/jats:sub>\n                    films, codoped with phosphorus, was investigated, using stylus profilometry, ellipsometry, and reflective optical microscopy. Compared to the conventional spin coating technique, the new process, where a saturated ethanol atmosphere is created over the spinning substrate, leads to a very low surface roughness, but to the same refractive index value. The thickness of uniform thin films prepared by this process is about half that of films made by the conventional method, at any spinning rate and for any given solution aging time.\n                  <\/jats:p>","DOI":"10.1111\/j.1151-2916.1995.tb08650.x","type":"journal-article","created":{"date-parts":[[2005,7,11]],"date-time":"2005-07-11T14:52:11Z","timestamp":1121093531000},"page":"2254-2256","source":"Crossref","is-referenced-by-count":30,"title":["Striation\u2010Free, Spin\u2010Coated Sol\u2010Gel Optical Films"],"prefix":"10.1111","volume":"78","author":[{"given":"Xin","family":"Du Min","sequence":"first","affiliation":[]},{"given":"Xavier","family":"Orignac","sequence":"additional","affiliation":[]},{"given":"Rui M.","family":"Almeida","sequence":"additional","affiliation":[]}],"member":"311","published-online":{"date-parts":[[2005,7,11]]},"reference":[{"key":"e_1_2_1_2_2","doi-asserted-by":"publisher","DOI":"10.1364\/AO.18.003133"},{"key":"e_1_2_1_3_2","doi-asserted-by":"publisher","DOI":"10.1063\/1.346213"},{"issue":"2","key":"e_1_2_1_4_2","first-page":"135","article-title":"Sol\u2010Gel Silica Films on Silicon Substrates","volume":"9","author":"Almeida R. M.","year":"1994","journal-title":"Int. J. Optoetectron."},{"key":"e_1_2_1_5_2","doi-asserted-by":"publisher","DOI":"10.1117\/12.22571"},{"key":"e_1_2_1_6_2","doi-asserted-by":"publisher","DOI":"10.1364\/AO.32.004916"},{"key":"e_1_2_1_7_2","doi-asserted-by":"publisher","DOI":"10.1007\/BF00486430"},{"key":"e_1_2_1_8_2","doi-asserted-by":"publisher","DOI":"10.1007\/BF00486336"},{"key":"e_1_2_1_9_2","doi-asserted-by":"publisher","DOI":"10.1557\/PROC-121-717"},{"key":"e_1_2_1_10_2","doi-asserted-by":"publisher","DOI":"10.1063\/1.325357"},{"key":"e_1_2_1_11_2","doi-asserted-by":"publisher","DOI":"10.1117\/12.50202"}],"container-title":["Journal of the American Ceramic Society"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/api.wiley.com\/onlinelibrary\/tdm\/v1\/articles\/10.1111%2Fj.1151-2916.1995.tb08650.x","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/ceramics.onlinelibrary.wiley.com\/doi\/pdf\/10.1111\/j.1151-2916.1995.tb08650.x","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,11,2]],"date-time":"2025-11-02T09:49:30Z","timestamp":1762076970000},"score":1,"resource":{"primary":{"URL":"https:\/\/ceramics.onlinelibrary.wiley.com\/doi\/10.1111\/j.1151-2916.1995.tb08650.x"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[1995,8]]},"references-count":10,"journal-issue":{"issue":"8","published-print":{"date-parts":[[1995,8]]}},"alternative-id":["10.1111\/j.1151-2916.1995.tb08650.x"],"URL":"https:\/\/doi.org\/10.1111\/j.1151-2916.1995.tb08650.x","archive":["Portico"],"relation":{},"ISSN":["0002-7820","1551-2916"],"issn-type":[{"type":"print","value":"0002-7820"},{"type":"electronic","value":"1551-2916"}],"subject":[],"published":{"date-parts":[[1995,8]]}}}