{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,6]],"date-time":"2025-11-06T00:38:09Z","timestamp":1762389489168},"reference-count":15,"publisher":"American Vacuum Society","issue":"6","content-domain":{"domain":["pubs.aip.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2006,11,1]]},"abstract":"<jats:p>The influence of substrate properties and annealing temperature on the stress state of tungsten thin films deposited by dc reactive magnetron sputtering was studied using 310 steel (AISI), Fecralloy\u00ae and Invar\u00ae substrates. Besides elemental tungsten, only residual amounts of contamination elements (O, C, Ar, etc.) were detected by electron probe microanalysis. Only the \u03b1-W crystalline structure, with a preferential \u27e8110\u27e9 orientation, was detected in all the films by x-ray diffraction. The highest lattice parameters were measured for the films deposited on 310 steel substrates, while the smallest values were obtained for the films deposited on Invar\u00ae substrates. These results are closely related to the thermal expansion coefficients of the substrates. All the as-deposited films were in a compressive stress state independent of the substrate type (\u22123GPa for 310 steel and Fecralloy\u00ae substrates and \u22122GPa for Invar\u00ae substrates). The residual compressive stresses of the films deposited on Fecralloy\u00ae substrates strongly decrease with annealing temperatures up to \u2248\u22128GPa at 1175K. This result shows that the measured compressive stresses are not real, and they are a direct consequence of plastic deformation of the substrate. On the contrary, the compressive stresses measured in the films deposited on Invar\u00ae and 310 steel substrates are real as plastic deformation of the substrates is not observed.<\/jats:p>","DOI":"10.1116\/1.2348643","type":"journal-article","created":{"date-parts":[[2006,11,16]],"date-time":"2006-11-16T23:06:20Z","timestamp":1163718380000},"page":"2070-2075","update-policy":"http:\/\/dx.doi.org\/10.1063\/aip-crossmark-policy-page","source":"Crossref","is-referenced-by-count":8,"title":["Influence of substrate properties and annealing temperature on the stress state of magnetron sputtered tungsten thin films"],"prefix":"10.1116","volume":"24","author":[{"given":"J. C.","family":"Oliveira","sequence":"first","affiliation":[{"name":"ICEMS Grupo de Materiais e Engenharia de Superficies, , Departamento de Engenharia Mec\u01cenica, , P\u00f3lo II, Pinhal de Marrocos, 3030 Coimbra, Portugal"},{"name":"Universidade de Coimbra Grupo de Materiais e Engenharia de Superficies, , Departamento de Engenharia Mec\u01cenica, , P\u00f3lo II, Pinhal de Marrocos, 3030 Coimbra, Portugal"}]},{"given":"A.","family":"Cavaleiro","sequence":"additional","affiliation":[{"name":"ICEMS Grupo de Materiais e Engenharia de Superficies, , Departamento de Engenharia Mec\u01cenica, , P\u00f3lo II, Pinhal de Marrocos, 3030 Coimbra, Portugal"},{"name":"Universidade de Coimbra Grupo de Materiais e Engenharia de Superficies, , Departamento de Engenharia Mec\u01cenica, , P\u00f3lo II, Pinhal de Marrocos, 3030 Coimbra, Portugal"}]}],"member":"20","published-online":{"date-parts":[[2006,10,11]]},"reference":[{"key":"2023062817565677200_c1","doi-asserted-by":"publisher","first-page":"2259","DOI":"10.1116\/1.574062","volume":"4","year":"1989","journal-title":"J. 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