{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,11]],"date-time":"2025-11-11T12:12:23Z","timestamp":1762863143801,"version":"3.41.2"},"reference-count":41,"publisher":"American Vacuum Society","issue":"4","funder":[{"DOI":"10.13039\/501100001871","name":"Funda\u00e7\u00e3o para a Ci\u00eancia e a Tecnologia","doi-asserted-by":"publisher","award":["UIDB\/04650\/2020"],"award-info":[{"award-number":["UIDB\/04650\/2020"]}],"id":[{"id":"10.13039\/501100001871","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100001871","name":"Funda\u00e7\u00e3o para a Ci\u00eancia e a Tecnologia","doi-asserted-by":"publisher","award":["PTDC\/FIS-NAN\/3668\/2014 (LA2D)"],"award-info":[{"award-number":["PTDC\/FIS-NAN\/3668\/2014 (LA2D)"]}],"id":[{"id":"10.13039\/501100001871","id-type":"DOI","asserted-by":"publisher"}]},{"DOI":"10.13039\/501100001871","name":"Funda\u00e7\u00e3o para a Ci\u00eancia e a Tecnologia","doi-asserted-by":"publisher","award":["PTDC\/FIS-MAC\/28114\/2017 (GRAPHSENS)"],"award-info":[{"award-number":["PTDC\/FIS-MAC\/28114\/2017 (GRAPHSENS)"]}],"id":[{"id":"10.13039\/501100001871","id-type":"DOI","asserted-by":"publisher"}]}],"content-domain":{"domain":["pubs.aip.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2021,7,1]]},"abstract":"<jats:p>Hexagonal boron nitride (h-BN) is a critical 2D insulator used as a substrate, gate dielectric, or encapsulation layer for graphene and other 2D materials and their van der Waals heterostructures. It is also promising as an active layer in single-photon emitters and other photonic devices. With the chemical formula H3N-BH3, ammonia borane is the most attractive precursor for up-scalable growth of large-area h-BN, using chemical vapor deposition given its stoichiometric B:N ratio, high stability under ambient conditions, nontoxicity, and high solubility in common solvents. Here, the synthesis of large-area (100\u2009\u00d7\u2009150\u2009mm2) crystalline hexagonal boron nitride layers by thermal activation and decomposition of the precursor ammonia borane is presented. We describe two different reaction pathways for h-BN synthesis, providing evidence for dissimilarities in the sublimation kinetics of ammonia borane and how these differences critically influence the growth of h-BN. This understanding helps us accelerate h-BN production, reuse precursors, and reduce machine runtime, paving the way for upscalability. Moreover, our work provides a consistent unified view explaining the diverse deposition conditions reported in the literature for h-BN grown by CVD using ammonia borane as a precursor.<\/jats:p>","DOI":"10.1116\/6.0000987","type":"journal-article","created":{"date-parts":[[2021,6,22]],"date-time":"2021-06-22T11:42:53Z","timestamp":1624362173000},"update-policy":"https:\/\/doi.org\/10.1063\/aip-crossmark-policy-page","source":"Crossref","is-referenced-by-count":3,"title":["Role of sublimation kinetics of ammonia borane in chemical vapor deposition of uniform, large-area hexagonal boron nitride"],"prefix":"10.1116","volume":"39","author":[{"ORCID":"https:\/\/orcid.org\/0000-0001-6866-1137","authenticated-orcid":false,"given":"Balaji","family":"Sompalle","sequence":"first","affiliation":[{"name":"International Iberian Nanotechnology Laboratory 1 , Braga 4715-330, Portugal"},{"name":"Department of Physics, University of Minho 2 , Braga 4710-057, Portugal"}]},{"given":"Chun-Da","family":"Liao","sequence":"additional","affiliation":[{"name":"International Iberian Nanotechnology Laboratory 1 , Braga 4715-330, Portugal"}]},{"given":"Bin","family":"Wei","sequence":"additional","affiliation":[{"name":"International Iberian Nanotechnology Laboratory 1 , Braga 4715-330, Portugal"}]},{"ORCID":"https:\/\/orcid.org\/0000-0002-3505-6982","authenticated-orcid":false,"given":"Maria de F\u00e1tima","family":"Cerqueira","sequence":"additional","affiliation":[{"name":"International Iberian Nanotechnology Laboratory 1 , Braga 4715-330, Portugal"},{"name":"Department of Physics, University of Minho 2 , Braga 4710-057, Portugal"}]},{"given":"Nicoleta","family":"Nicoara","sequence":"additional","affiliation":[{"name":"International Iberian Nanotechnology Laboratory 1 , Braga 4715-330, Portugal"},{"name":"QuantaLab, International Iberian Nanotechnology Laboratory 3 , Braga 4715-330, Portugal"}]},{"ORCID":"https:\/\/orcid.org\/0000-0003-2141-4803","authenticated-orcid":false,"given":"Zhongchang","family":"Wang","sequence":"additional","affiliation":[{"name":"International Iberian Nanotechnology Laboratory 1 , Braga 4715-330, Portugal"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-8384-6025","authenticated-orcid":false,"given":"Sascha","family":"Sadewasser","sequence":"additional","affiliation":[{"name":"International Iberian Nanotechnology Laboratory 1 , Braga 4715-330, Portugal"},{"name":"QuantaLab, International Iberian Nanotechnology Laboratory 3 , Braga 4715-330, Portugal"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-9875-6188","authenticated-orcid":false,"given":"Pedro","family":"Alpuim","sequence":"additional","affiliation":[{"name":"International Iberian Nanotechnology Laboratory 1 , Braga 4715-330, Portugal"},{"name":"Department of Physics, University of Minho 2 , Braga 4710-057, Portugal"},{"name":"QuantaLab, International Iberian Nanotechnology Laboratory 3 , Braga 4715-330, Portugal"}]}],"member":"20","published-online":{"date-parts":[[2021,6,22]]},"reference":[{"key":"2023062904044837400_c1","doi-asserted-by":"publisher","first-page":"2898","DOI":"10.1021\/nn400280c","volume":"7","year":"2013","journal-title":"ACS Nano"},{"key":"2023062904044837400_c2","doi-asserted-by":"publisher","first-page":"6298","DOI":"10.1126\/science.aac9439","volume":"353","year":"2016","journal-title":"Science"},{"key":"2023062904044837400_c3","doi-asserted-by":"publisher","first-page":"192","DOI":"10.1038\/nature11458","volume":"490","year":"2012","journal-title":"Nature"},{"key":"2023062904044837400_c4","doi-asserted-by":"publisher","first-page":"20","DOI":"10.1039\/C0NR00323A","volume":"3","year":"2011","journal-title":"Nanoscale"},{"key":"2023062904044837400_c5","doi-asserted-by":"publisher","first-page":"10451","DOI":"10.1073\/pnas.0502848102","volume":"102","year":"2005","journal-title":"Proc. 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