{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,10,1]],"date-time":"2026-10-01T12:06:30Z","timestamp":1790856390680,"version":"4.1.0"},"reference-count":0,"publisher":"SPIE-Intl Soc Optical Eng","issue":"04","license":[{"start":{"date-parts":[[2026,10,1]],"date-time":"2026-10-01T00:00:00Z","timestamp":1790812800000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/creativecommons.org\/licenses\/by\/4.0\/"}],"content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["J. Micro\/Nanopattern. Mats. Metro."],"published-print":{"date-parts":[[2026,10,1]]},"abstract":"<jats:p>BackgroundEUV scanners with a numerical aperture (NA) of 0.55 have recently been introduced into the market and are now on their way to high-volume production. Given the long product development cycles for EUV scanners, the question of a successor to the NA 0.55 scanners already arises.AimWe present the concept of an EUV scanner with an NA of at least 0.75, named hyper NA.ApproachHyper NA should enable reuse of as much of the present lithography infrastructure as possible, such as masks, sources, and production equipment for manufacturing those scanners.ResultsHyper NA can support an NA of 0.75 within practically the same volume claim as the current NA 0.55 scanners. The current light source can be reused as-is, and modern mask absorbers such as low-n or high-k are also sufficient for hyper NA.ConclusionsAn increase in NA, hence the introduction of hyper NA, is the preferable successor to the current NA 0.55 scanner as it offers an infrastructure-compatible path.<\/jats:p>","DOI":"10.1117\/1.jmm.25.4.041807","type":"journal-article","created":{"date-parts":[[2026,10,1]],"date-time":"2026-10-01T11:19:55Z","timestamp":1790853595000},"page":"1-12","source":"Crossref","is-referenced-by-count":0,"title":["Hyper NA: a system with a numerical aperture of at least 0.75"],"prefix":"10.1117","volume":"25","author":[{"ORCID":"https:\/\/orcid.org\/0009-0006-5616-0128","authenticated-orcid":false,"given":"Michael","family":"Patra","sequence":"first","affiliation":[{"name":"Carl Zeiss SMT GmbH, Oberkochen, Germany"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Heiko","family":"Feldmann","sequence":"additional","affiliation":[{"name":"Carl Zeiss SMT GmbH, Oberkochen, Germany"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0000-0001-5851-2445","authenticated-orcid":false,"given":"Gerardo","family":"Bottiglieri","sequence":"additional","affiliation":[{"name":"ASML Netherlands B.V., Veldhoven, The Netherlands"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"189","container-title":["Journal of Micro\/Nanopatterning, Materials, and Metrology"],"original-title":[],"link":[{"URL":"https:\/\/www.spiedigitallibrary.org\/journals\/journal-of-micro-nanopatterning-materials-and-metrology\/volume-25\/issue-04\/041807\/Hyper-NA--a-system-with-a-numerical-aperture-of\/10.1117\/1.JMM.25.4.041807.full","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2026,10,1]],"date-time":"2026-10-01T11:19:56Z","timestamp":1790853596000},"score":1,"resource":{"primary":{"URL":"https:\/\/www.spiedigitallibrary.org\/journals\/journal-of-micro-nanopatterning-materials-and-metrology\/volume-25\/issue-04\/041807\/Hyper-NA--a-system-with-a-numerical-aperture-of\/10.1117\/1.JMM.25.4.041807.full"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2026,10,1]]},"references-count":0,"journal-issue":{"issue":"04","published-online":{"date-parts":[[2026,10,1]]}},"URL":"https:\/\/doi.org\/10.1117\/1.jmm.25.4.041807","relation":{},"ISSN":["2708-8340","2708-8340"],"issn-type":[{"value":"2708-8340","type":"print"},{"value":"2708-8340","type":"electronic"}],"subject":[],"published":{"date-parts":[[2026,10,1]]}}}