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Adv."],"published-print":{"date-parts":[[2026,2,13]]},"abstract":"<jats:p>\n                    The propagation of light in nanophotonic structures is governed by the refractive index and optical dispersion of constituent materials. However, the choice of dielectrics is often restricted within the transparency window. We introduce object-driven engineering of the process of silicon-based dielectric materials for metasurfaces: visibly transparent hydrogenated amorphous silicon (a-Si:H) with a high refractive index of 3.48 and oxygen-doped a-Si:H (a-SiO\n                    <jats:sub>x<\/jats:sub>\n                    :H) exhibiting strong dispersion (Abbe number\u00a0&lt;\u00a010). Both films are fabricated via chemical vapor deposition with precise control over atomic bonding and dopants, revealing the link between optical properties and the amorphous silicon network. We demonstrate the effectiveness of a-Si:H in metalenses with conversion efficiencies of 66.3, 92.0, and 97.0% at 450, 532, and 635\u00a0nanometers, respectively. In addition, a wavelength-decoupled a-SiO\n                    <jats:sub>x<\/jats:sub>\n                    :H beam-splitter achieves a 3.67-fold steering intensity contrast between 450 and 635\u00a0nanometers. These materials broaden the dielectric design space and enhance the performance of nanophotonic devices across the visible spectrum.\n                  <\/jats:p>","DOI":"10.1126\/sciadv.ady0344","type":"journal-article","created":{"date-parts":[[2026,2,13]],"date-time":"2026-02-13T18:59:07Z","timestamp":1771009147000},"update-policy":"https:\/\/doi.org\/10.34133\/aaas_crossmark","source":"Crossref","is-referenced-by-count":5,"title":["Breaking the optical loss barrier in amorphous silicon across the full visible spectrum via dopant-controlled chemical vapor deposition"],"prefix":"10.1126","volume":"12","author":[{"ORCID":"https:\/\/orcid.org\/0000-0003-2173-4217","authenticated-orcid":true,"given":"Younghwan","family":"Yang","sequence":"first","affiliation":[{"name":"Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea."},{"name":"Department of Mechanical Engineering, Changwon National University, Changwon 51140, Republic of Korea."},{"name":"Department of Smart Manufacturing Engineering, Changwon National University, Changwon 51140, Republic of Korea."}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0009-0001-5249-1193","authenticated-orcid":true,"given":"Hyeonae","family":"Im","sequence":"additional","affiliation":[{"name":"Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea."}],"role":[{"vocabulary":"crossref","role":"author"}]},{"ORCID":"https:\/\/orcid.org\/0009-0003-5221-0405","authenticated-orcid":true,"given":"Eunji","family":"Lee","sequence":"additional","affiliation":[{"name":"Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of 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Technology (POSTECH), Pohang 37673, Republic of Korea."},{"name":"Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea."},{"name":"Department of Electrical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea."},{"name":"POSCO-RIST-POSTECH Convergence Research Center for Flat Optics and Metaphotonics, Pohang 37673, Republic of Korea."},{"name":"National Institute of Nanomaterials Technology (NINT), Pohang 37673, Republic of 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