{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2022,4,2]],"date-time":"2022-04-02T21:25:13Z","timestamp":1648934713641},"reference-count":11,"publisher":"World Scientific Pub Co Pte Lt","issue":"02","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Int. J. Artif. Intell. Tools"],"published-print":{"date-parts":[[2008,4]]},"abstract":"<jats:p> The constraint of having a dedicated machine for the photolithography process in semiconductor manufacturing is a new challenge introduced in photolithography machinery due to natural bias. With dedicated machine constraint, the wafer lots passing through each photolithography process have to be processed by the same machine. The purpose of the limitation is to prevent the natural bias of the photolithography machine. However, much research proposed by previous researchers did not discuss the dedicated photolithography machine constraint. In this paper, we propose the Load Balancing (LB) scheduling approach based on a Resource Schedule and Execution Matrix (RSEM) framework to tackle the constraint. The proposed LB approach schedules each wafer lot at the first photolithography stage to a suitable machine according to the load factor of these photolithography machines. We describe the LB approach and the construction process of the RSEM framework. We also present an example to demonstrate our approach and simulation results to validate our approach. <\/jats:p>","DOI":"10.1142\/s0218213008003923","type":"journal-article","created":{"date-parts":[[2008,4,21]],"date-time":"2008-04-21T09:18:43Z","timestamp":1208769523000},"page":"339-353","source":"Crossref","is-referenced-by-count":6,"title":["A HEURISTIC SCHEDULING APPROACH TO THE DEDICATED MACHINE CONSTRAINT"],"prefix":"10.1142","volume":"17","author":[{"given":"ARTHUR","family":"SHR","sequence":"first","affiliation":[{"name":"Department of Computer Science, Louisiana State University, 298 Coates Hall, Baton Rouge, LA 70803, USA"}]},{"given":"ALAN","family":"LIU","sequence":"additional","affiliation":[{"name":"Department of Electrical Engineering and Center for Telecommunication Research, National Chung Cheng University, 168 University Rd., Min-Hsiung, Chia-Yi 62102, Taiwan, R.O.C."}]},{"given":"PETER","family":"CHEN","sequence":"additional","affiliation":[{"name":"Department of Computer Science, Louisiana State University, 298 Coates Hall, Baton Rouge, LA 70803, USA"}]}],"member":"219","published-online":{"date-parts":[[2011,11,21]]},"reference":[{"key":"rf1","doi-asserted-by":"publisher","DOI":"10.1109\/66.909654"},{"key":"rf2","unstructured":"P. R.\u00a0Kumar, Stochastic Modeling and Analysis of Manufacturing Systems\u00a013, ed. D. D.\u00a0Yao (Springer-Verlag, New York, 1994)\u00a0pp. 87\u2013110."},{"key":"rf3","doi-asserted-by":"publisher","DOI":"10.1109\/66.311341"},{"key":"rf4","volume-title":"Factory Physic: Foundations of Manufacturing Management","author":"Hopp W. J.","year":"2000"},{"key":"rf7","doi-asserted-by":"publisher","DOI":"10.1007\/BF01158930"},{"key":"rf8","doi-asserted-by":"publisher","DOI":"10.1109\/TSM.2002.807743"},{"key":"rf9","doi-asserted-by":"publisher","DOI":"10.1109\/TSM.2002.807742"},{"key":"rf10","doi-asserted-by":"publisher","DOI":"10.1109\/66.705370"},{"key":"rf11","doi-asserted-by":"publisher","DOI":"10.1109\/TCST.2003.813368"},{"key":"rf14","doi-asserted-by":"publisher","DOI":"10.1109\/70.964657"},{"key":"rf15","doi-asserted-by":"publisher","DOI":"10.1109\/9.106156"}],"container-title":["International Journal on Artificial Intelligence Tools"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/www.worldscientific.com\/doi\/pdf\/10.1142\/S0218213008003923","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2019,8,7]],"date-time":"2019-08-07T02:27:11Z","timestamp":1565144831000},"score":1,"resource":{"primary":{"URL":"https:\/\/www.worldscientific.com\/doi\/abs\/10.1142\/S0218213008003923"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2008,4]]},"references-count":11,"journal-issue":{"issue":"02","published-online":{"date-parts":[[2011,11,21]]},"published-print":{"date-parts":[[2008,4]]}},"alternative-id":["10.1142\/S0218213008003923"],"URL":"https:\/\/doi.org\/10.1142\/s0218213008003923","relation":{},"ISSN":["0218-2130","1793-6349"],"issn-type":[{"value":"0218-2130","type":"print"},{"value":"1793-6349","type":"electronic"}],"subject":[],"published":{"date-parts":[[2008,4]]}}}