{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2022,6,18]],"date-time":"2022-06-18T20:51:31Z","timestamp":1655585491048},"reference-count":2,"publisher":"World Scientific Pub Co Pte Lt","issue":"17n19","content-domain":{"domain":[],"crossmark-restriction":false},"short-container-title":["Mod. Phys. Lett. B"],"published-print":{"date-parts":[[2001,8,20]]},"abstract":"<jats:p> We study by x-ray diffraction (XRD) the structural variations on a series of SnO<jats:sub>x<\/jats:sub>:F films grown by dc reactive sputtering from a metallic tin target in an Ar- O <jats:sub>2<\/jats:sub>-Freon plasma. We found that the films tend to be crystalline when the stoichiometry approaches to that of SnO or SnO <jats:sub>2<\/jats:sub>, being amorphous in between. We fitted the x-ray diffractograms and found that films are composed by a mixture of compounds, i.e. SnO, Sn <jats:sub>3<\/jats:sub> O <jats:sub>4<\/jats:sub>, Sn <jats:sub>2<\/jats:sub> O <jats:sub>3<\/jats:sub> and SnO <jats:sub>2<\/jats:sub>, given by the simultaneous presence of Sn <jats:sup>+2<\/jats:sup> and Sn <jats:sup>+4<\/jats:sup>. From the analysis of the deconvoluted areas under the x-ray diffractograms we calculate the Sn <jats:sup>+2<\/jats:sup>\/ Sn and Sn <jats:sup>+4<\/jats:sup>\/ Sn molar fraction present in the films. The same calculations are done for the x-ray photoelectron spectroscopy (XPS) results. By applying a combinatory model we fitted the general behavior of SnO <jats:sub>x<\/jats:sub> films with different oxygen content versus the Sn <jats:sup>+2<\/jats:sup>\/ Sn and Sn <jats:sup>+4<\/jats:sup>\/ Sn molar fraction. Both XRD and XPS results are compared with the theoretical curve, showing a well agreement. <\/jats:p>","DOI":"10.1142\/s0217984901002178","type":"journal-article","created":{"date-parts":[[2002,7,27]],"date-time":"2002-07-27T11:02:01Z","timestamp":1027767721000},"page":"634-638","source":"Crossref","is-referenced-by-count":2,"title":["CHEMICAL COMPOSITION AND CRYSTALLINE PHASES IN F-DOPED TIN OXIDE FILMS GROWN BY DC REACTIVE SPUTTERING"],"prefix":"10.1142","volume":"15","author":[{"given":"A.","family":"MARTEL","sequence":"first","affiliation":[{"name":"CICATA-IPN Altamira, Km.14.5 Carr. Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas, M\u00e9xico"},{"name":"Facultad de F\u00edsica-IMRE, Universidad de La Habana, San L\u00e1zaro y L, Vedado, 10400, La Habana, Cuba"}]},{"given":"F.","family":"CABALLERO-BRIONES","sequence":"additional","affiliation":[{"name":"CICATA-IPN Altamira, Km.14.5 Carr. Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas, M\u00e9xico"}]},{"given":"A.","family":"IRIBARREN","sequence":"additional","affiliation":[{"name":"CICATA-IPN Altamira, Km.14.5 Carr. Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas, M\u00e9xico"},{"name":"Facultad de F\u00edsica-IMRE, Universidad de La Habana, San L\u00e1zaro y L, Vedado, 10400, La Habana, Cuba"}]},{"given":"R.","family":"CASTRO-RODR\u00cdGUEZ","sequence":"additional","affiliation":[{"name":"Departamento de F\u00edsica Aplicada, CINVESTAV-IPN M\u00e9rida, AP 73 Cordemex, 97310 M\u00e9rida, Yucat\u00e1n, M\u00e9xico"}]},{"given":"P.","family":"BARTOLO-P\u00c9REZ","sequence":"additional","affiliation":[{"name":"CICATA-IPN Altamira, Km.14.5 Carr. Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas, M\u00e9xico"},{"name":"Departamento de F\u00edsica Aplicada, CINVESTAV-IPN M\u00e9rida, AP 73 Cordemex, 97310 M\u00e9rida, Yucat\u00e1n, M\u00e9xico"}]},{"given":"J. L.","family":"PE\u00d1A","sequence":"additional","affiliation":[{"name":"CICATA-IPN Altamira, Km.14.5 Carr. Tampico-Puerto Industrial Altamira, 89600 Altamira, Tamaulipas, M\u00e9xico"},{"name":"Departamento de F\u00edsica Aplicada, CINVESTAV-IPN M\u00e9rida, AP 73 Cordemex, 97310 M\u00e9rida, Yucat\u00e1n, M\u00e9xico"}]}],"member":"219","published-online":{"date-parts":[[2011,11,21]]},"reference":[{"key":"p_1","doi-asserted-by":"publisher","DOI":"10.1116\/1.576259"},{"key":"p_4","doi-asserted-by":"publisher","DOI":"10.1063\/1.371427"}],"container-title":["Modern Physics Letters B"],"original-title":[],"language":"en","link":[{"URL":"https:\/\/www.worldscientific.com\/doi\/pdf\/10.1142\/S0217984901002178","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2019,8,6]],"date-time":"2019-08-06T16:54:14Z","timestamp":1565110454000},"score":1,"resource":{"primary":{"URL":"https:\/\/www.worldscientific.com\/doi\/abs\/10.1142\/S0217984901002178"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2001,8,20]]},"references-count":2,"journal-issue":{"issue":"17n19","published-online":{"date-parts":[[2011,11,21]]},"published-print":{"date-parts":[[2001,8,20]]}},"alternative-id":["10.1142\/S0217984901002178"],"URL":"https:\/\/doi.org\/10.1142\/s0217984901002178","relation":{},"ISSN":["0217-9849","1793-6640"],"issn-type":[{"value":"0217-9849","type":"print"},{"value":"1793-6640","type":"electronic"}],"subject":[],"published":{"date-parts":[[2001,8,20]]}}}