{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,12,18]],"date-time":"2025-12-18T13:55:56Z","timestamp":1766066156197,"version":"3.41.0"},"publisher-location":"New York, NY, USA","reference-count":20,"publisher":"ACM","license":[{"start":{"date-parts":[[2011,6,5]],"date-time":"2011-06-05T00:00:00Z","timestamp":1307232000000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2011,6,5]]},"DOI":"10.1145\/2024724.2024828","type":"proceedings-article","created":{"date-parts":[[2011,9,6]],"date-time":"2011-09-06T15:10:46Z","timestamp":1315321846000},"page":"447-452","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":2,"title":["Layout aware line-edge roughness modeling and poly optimization for leakage minimization"],"prefix":"10.1145","author":[{"given":"Yongchan","family":"Ban","sequence":"first","affiliation":[{"name":"The University of Texas at Austin, Austin, TX"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Jae-Seok","family":"Yang","sequence":"additional","affiliation":[{"name":"The University of Texas at Austin, Austin, TX"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"320","published-online":{"date-parts":[[2011,6,5]]},"reference":[{"key":"e_1_3_2_1_1_1","doi-asserted-by":"publisher","DOI":"10.1145\/1735023.1735053"},{"key":"e_1_3_2_1_2_1","doi-asserted-by":"publisher","DOI":"10.1145\/1837274.1837375"},{"key":"e_1_3_2_1_3_1","doi-asserted-by":"publisher","DOI":"10.1109\/TED.2003.813457"},{"key":"e_1_3_2_1_4_1","first-page":"8","article-title":"Stochastic modeling in lithography: autocorrelation behavior of catalytic reaction.diffusion systems. SPIE J. Microlithography","author":"Mack C.","year":"2009","unstructured":"C. Mack . Stochastic modeling in lithography: autocorrelation behavior of catalytic reaction.diffusion systems. SPIE J. Microlithography , Microfabrication and Microsystems , 8 , 2009 . C. Mack. Stochastic modeling in lithography: autocorrelation behavior of catalytic reaction.diffusion systems. SPIE J. Microlithography, Microfabrication and Microsystems, 8, 2009.","journal-title":"Microfabrication and Microsystems"},{"key":"e_1_3_2_1_5_1","doi-asserted-by":"publisher","DOI":"10.1116\/1.1776561"},{"key":"e_1_3_2_1_6_1","doi-asserted-by":"publisher","DOI":"10.1117\/12.712388"},{"issue":"4","key":"e_1_3_2_1_7_1","first-page":"041206","article-title":"Electrical Impact of Line-Edge Roughness on Sub-45nm Node Standard Cells. SPIE J. Microlithography","volume":"9","author":"Ban Y.","year":"2010","unstructured":"Y. Ban Electrical Impact of Line-Edge Roughness on Sub-45nm Node Standard Cells. SPIE J. Microlithography , Microfabrication and Microsystems , 9 ( 4 ): 041206 , Oct--Dec 2010 . Y. Ban et al. Electrical Impact of Line-Edge Roughness on Sub-45nm Node Standard Cells. SPIE J. Microlithography, Microfabrication and Microsystems, 9(4):041206, Oct--Dec 2010.","journal-title":"Microfabrication and Microsystems"},{"issue":"4","key":"e_1_3_2_1_8_1","first-page":"041211","article-title":"Modeling and Characterization of Contact-Edge Roughness for Minimizing Design and Manufacturing Variations. SPIE J. Microlithography","volume":"9","author":"Ban Y.","year":"2010","unstructured":"Y. Ban Modeling and Characterization of Contact-Edge Roughness for Minimizing Design and Manufacturing Variations. SPIE J. Microlithography , Microfabrication and Microsystems , 9 ( 4 ): 041211 , Oct-Dec 2010 . Y. Ban et al. Modeling and Characterization of Contact-Edge Roughness for Minimizing Design and Manufacturing Variations. SPIE J. Microlithography, Microfabrication and Microsystems, 9(4):041211, Oct-Dec 2010.","journal-title":"Microfabrication and Microsystems"},{"key":"e_1_3_2_1_9_1","doi-asserted-by":"publisher","DOI":"10.1145\/1391469.1391698"},{"key":"e_1_3_2_1_10_1","volume-title":"Proc. Int. Conf. on Computer Aided Design","author":"Wang V.","year":"2008","unstructured":"V. Wang Linear Analysis of Random Process Variability . In Proc. Int. Conf. on Computer Aided Design , Nov 2008 . V. Wang et al. Linear Analysis of Random Process Variability. In Proc. Int. Conf. on Computer Aided Design, Nov 2008."},{"key":"e_1_3_2_1_11_1","doi-asserted-by":"publisher","DOI":"10.1117\/12.848183"},{"key":"e_1_3_2_1_12_1","volume-title":"Proc. SPIE 6156","author":"Poppe W.","year":"2006","unstructured":"W. Poppe From poly line to transistor: building BSIM models for nonrectangular transistors . In Proc. SPIE 6156 , 2006 . W. Poppe et al. From poly line to transistor: building BSIM models for nonrectangular transistors. In Proc. SPIE 6156, 2006."},{"key":"e_1_3_2_1_13_1","volume-title":"Proc. SPIE 6923","author":"Schnattinger T.","year":"2008","unstructured":"T. Schnattinger A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography . In Proc. SPIE 6923 , 2008 . T. Schnattinger et al. A comprehensive resist model for the prediction of line-edge roughness material and process dependencies in optical lithography. In Proc. SPIE 6923, 2008."},{"key":"e_1_3_2_1_14_1","doi-asserted-by":"publisher","DOI":"10.1002\/9780470723876"},{"key":"e_1_3_2_1_15_1","doi-asserted-by":"publisher","DOI":"10.1117\/12.652206"},{"key":"e_1_3_2_1_16_1","doi-asserted-by":"publisher","DOI":"10.1117\/12.814406"},{"key":"e_1_3_2_1_17_1","doi-asserted-by":"publisher","DOI":"10.1145\/1514932.1514941"},{"key":"e_1_3_2_1_18_1","unstructured":"http:\/\/www.gurobi.com\/.  http:\/\/www.gurobi.com\/."},{"key":"e_1_3_2_1_19_1","unstructured":"Nangate 45nm Open Cell Library http:\/\/www.nangate.com\/.  Nangate 45nm Open Cell Library http:\/\/www.nangate.com\/."},{"key":"e_1_3_2_1_20_1","unstructured":"Predictive Technology Model (Ver. 1.2) http:\/\/ptm.asu.edu\/.  Predictive Technology Model (Ver. 1.2) http:\/\/ptm.asu.edu\/."}],"event":{"name":"DAC '11: The 48th Annual Design Automation Conference 2011","sponsor":["EDAC Electronic Design Automation Consortium","SIGDA ACM Special Interest Group on Design Automation","IEEE Council on Electronic Design Automation (CEDA)"],"location":"San Diego California","acronym":"DAC '11"},"container-title":["Proceedings of the 48th Design Automation Conference"],"original-title":[],"link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2024724.2024828","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/2024724.2024828","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,18]],"date-time":"2025-06-18T11:06:07Z","timestamp":1750244767000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2024724.2024828"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2011,6,5]]},"references-count":20,"alternative-id":["10.1145\/2024724.2024828","10.1145\/2024724"],"URL":"https:\/\/doi.org\/10.1145\/2024724.2024828","relation":{},"subject":[],"published":{"date-parts":[[2011,6,5]]},"assertion":[{"value":"2011-06-05","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}