{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,9,18]],"date-time":"2026-09-18T09:13:55Z","timestamp":1789722835522,"version":"4.0.1"},"publisher-location":"New York, NY, USA","reference-count":16,"publisher":"ACM","license":[{"start":{"date-parts":[[2012,6,3]],"date-time":"2012-06-03T00:00:00Z","timestamp":1338681600000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2012,6,3]]},"DOI":"10.1145\/2228360.2228379","type":"proceedings-article","created":{"date-parts":[[2012,5,31]],"date-time":"2012-05-31T12:10:51Z","timestamp":1338466251000},"page":"96-105","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":19,"title":["On improving the uniqueness of silicon-based physically unclonable functions via optical proximity correction"],"prefix":"10.1145","author":[{"given":"Domenic","family":"Forte","sequence":"first","affiliation":[{"name":"University of Maryland, College Park, MD"}],"role":[{"vocabulary":"crossref","role":"author"}]},{"given":"Ankur","family":"Srivastava","sequence":"additional","affiliation":[{"name":"University of Maryland, College Park, MD"}],"role":[{"vocabulary":"crossref","role":"author"}]}],"member":"320","published-online":{"date-parts":[[2012,6,3]]},"reference":[{"key":"e_1_3_2_1_1_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2007.907047"},{"key":"e_1_3_2_1_2_1","doi-asserted-by":"publisher","DOI":"10.1109\/HST.2011.5955011"},{"key":"e_1_3_2_1_4_1","doi-asserted-by":"publisher","DOI":"10.1007\/978-3-540-74735-2_5"},{"key":"e_1_3_2_1_5_1","doi-asserted-by":"publisher","DOI":"10.1109\/TCAD.2007.895759"},{"key":"e_1_3_2_1_6_1","doi-asserted-by":"publisher","DOI":"10.1088\/2040-8978\/12\/4\/045601"},{"key":"e_1_3_2_1_7_1","doi-asserted-by":"publisher","DOI":"10.1007\/978-3-642-14452-3_3"},{"key":"e_1_3_2_1_8_1","doi-asserted-by":"crossref","DOI":"10.1002\/9780470723876","volume-title":"Fundamental principles of optical lithography: the science of microfabrication","author":"Mack C.","year":"2007","unstructured":"C. Mack . Fundamental principles of optical lithography: the science of microfabrication . Wiley-Interscience , 2007 . C. Mack. Fundamental principles of optical lithography: the science of microfabrication. Wiley-Interscience, 2007."},{"key":"e_1_3_2_1_9_1","doi-asserted-by":"publisher","DOI":"10.1007\/978-3-642-14452-3_1"},{"key":"e_1_3_2_1_10_1","doi-asserted-by":"publisher","DOI":"10.1007\/s00145-010-9088-4"},{"key":"e_1_3_2_1_11_1","doi-asserted-by":"publisher","DOI":"10.1016\/j.jprocont.2008.04.007"},{"key":"e_1_3_2_1_12_1","first-page":"1159","volume-title":"Proc. SPIE","volume":"6154","author":"Poonawala A.","year":"2006","unstructured":"A. Poonawala and P. Milanfar . Opc and psm design using inverse lithography: A non-linear optimization approach . In Proc. SPIE , volume 6154 , pages 1159 -- 1172 , 2006 . A. Poonawala and P. Milanfar. Opc and psm design using inverse lithography: A non-linear optimization approach. In Proc. SPIE, volume 6154, pages 1159--1172, 2006."},{"key":"e_1_3_2_1_13_1","volume-title":"DTIC","author":"Rukhin A.","year":"2001","unstructured":"A. Rukhin . A statistical test suite for random and pseudorandom number generators for cryptographic applications. Technical report , DTIC , 2001 . A. Rukhin. A statistical test suite for random and pseudorandom number generators for cryptographic applications. Technical report, DTIC, 2001."},{"key":"e_1_3_2_1_14_1","doi-asserted-by":"publisher","DOI":"10.1145\/1233501.1233585"},{"key":"e_1_3_2_1_15_1","doi-asserted-by":"publisher","DOI":"10.1145\/1278480.1278484"},{"key":"e_1_3_2_1_16_1","volume-title":"A regression-based entropy distiller for ro pufs","author":"Yin C.","year":"2011","unstructured":"C. Yin and G. Qu . A regression-based entropy distiller for ro pufs . 2011 . C. Yin and G. Qu. A regression-based entropy distiller for ro pufs. 2011."},{"issue":"3","key":"e_1_3_2_1_17_1","article-title":"True process variation aware optical proximity correction with variational lithography modeling and model calibration","volume":"6","author":"Yu P.","year":"2007","unstructured":"P. Yu , S. Shi , and D. Pan . True process variation aware optical proximity correction with variational lithography modeling and model calibration . J. Micro , 6 ( 3 ), 2007 . P. Yu, S. Shi, and D. Pan. True process variation aware optical proximity correction with variational lithography modeling and model calibration. J. Micro, 6(3), 2007.","journal-title":"J. Micro"}],"event":{"name":"DAC '12: The 49th Annual Design Automation Conference 2012","location":"San Francisco California","acronym":"DAC '12","sponsor":["EDAC Electronic Design Automation Consortium","SIGDA ACM Special Interest Group on Design Automation","IEEE-CEDA","SIGBED ACM Special Interest Group on Embedded Systems"]},"container-title":["Proceedings of the 49th Annual Design Automation Conference"],"original-title":[],"link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2228360.2228379","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/2228360.2228379","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,18]],"date-time":"2025-06-18T08:49:01Z","timestamp":1750236541000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2228360.2228379"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2012,6,3]]},"references-count":16,"alternative-id":["10.1145\/2228360.2228379","10.1145\/2228360"],"URL":"https:\/\/doi.org\/10.1145\/2228360.2228379","relation":{},"subject":[],"published":{"date-parts":[[2012,6,3]]},"assertion":[{"value":"2012-06-03","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}