{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2026,1,27]],"date-time":"2026-01-27T10:34:32Z","timestamp":1769510072954,"version":"3.49.0"},"publisher-location":"New York, NY, USA","reference-count":11,"publisher":"ACM","license":[{"start":{"date-parts":[[2013,5,29]],"date-time":"2013-05-29T00:00:00Z","timestamp":1369785600000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2013,5,29]]},"DOI":"10.1145\/2463209.2488848","type":"proceedings-article","created":{"date-parts":[[2013,5,28]],"date-time":"2013-05-28T16:35:41Z","timestamp":1369758941000},"page":"1-6","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":29,"title":["Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography"],"prefix":"10.1145","author":[{"given":"Yuelin","family":"Du","sequence":"first","affiliation":[{"name":"University of Illinois at Urbana-Champaign"}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Qiang","family":"Ma","sequence":"additional","affiliation":[{"name":"Synopsys Inc."}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Hua","family":"Song","sequence":"additional","affiliation":[{"name":"Synopsys Inc."}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"James","family":"Shiely","sequence":"additional","affiliation":[{"name":"Synopsys Inc."}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Gerard","family":"Luk-Pat","sequence":"additional","affiliation":[{"name":"Synopsys Inc."}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Alexander","family":"Miloslavsky","sequence":"additional","affiliation":[{"name":"Synopsys Inc."}],"role":[{"role":"author","vocabulary":"crossref"}]},{"given":"Martin D. F.","family":"Wong","sequence":"additional","affiliation":[{"name":"University of Illinois at Urbana-Champaign"}],"role":[{"role":"author","vocabulary":"crossref"}]}],"member":"320","published-online":{"date-parts":[[2013,5,29]]},"reference":[{"key":"e_1_3_2_1_1_1","first-page":"2011","volume-title":"Proc. SPIE","volume":"7974","author":"Ban Y.","unstructured":"Y. Ban , A. Miloslavsky , K. Lucas , S.-H. Choi , C.-H. Park , and D. Z. Pan , Layout decomposition of self-aligned double patterning for 2D random logic patterning . Proc. SPIE , Vol. 7974 , p. 79740L, 2011 . Y. Ban, A. Miloslavsky, K. Lucas, S.-H. Choi, C.-H. Park, and D. Z. Pan, Layout decomposition of self-aligned double patterning for 2D random logic patterning. Proc. SPIE, Vol. 7974, p. 79740L, 2011."},{"key":"e_1_3_2_1_2_1","doi-asserted-by":"publisher","DOI":"10.1145\/2024724.2024741"},{"key":"e_1_3_2_1_3_1","first-page":"2011","volume-title":"Proc. SPIE","volume":"7973","author":"Zhang H.","unstructured":"H. Zhang , Y. Du , M. D. F. Wong , R. O. Topaloglu , and W. Conley , Effective decomposition algorithm for self-aligned double patterning lithography . Proc. SPIE , Vol. 7973 , p. 79730J, 2011 . H. Zhang, Y. Du, M. D. F. Wong, R. O. Topaloglu, and W. Conley, Effective decomposition algorithm for self-aligned double patterning lithography. Proc. SPIE, Vol. 7973, p. 79730J, 2011."},{"key":"e_1_3_2_1_4_1","doi-asserted-by":"publisher","DOI":"10.1145\/2160916.2160922"},{"key":"e_1_3_2_1_5_1","first-page":"2010","volume-title":"Proc. SPIE","volume":"7641","author":"Ma Y.","unstructured":"Y. Ma , J. Sweis , C. Bencher , H. Dai , Y. Chen , , Decomposition strategies for self-aligned double patterning . Proc. SPIE , Vol. 7641 , p. 76410T, 2010 . Y. Ma, J. Sweis, C. Bencher, H. Dai, Y. Chen, et al., Decomposition strategies for self-aligned double patterning. Proc. SPIE, Vol. 7641, p. 76410T, 2010."},{"key":"e_1_3_2_1_6_1","first-page":"2012","volume-title":"Proc. SPIE","volume":"7641","author":"Luk-Pat G.","unstructured":"G. Luk-Pat , A. Miloslavsky , B. Painter , L. Lin , P. D. Bisschop , and K. Lucas , Design compliance for spacer is dielectric (SID) patterning . Proc. SPIE , Vol. 7641 , p. 83260D, 2012 . G. Luk-Pat, A. Miloslavsky, B. Painter, L. Lin, P. D. Bisschop, and K. Lucas, Design compliance for spacer is dielectric (SID) patterning. Proc. SPIE, Vol. 7641, p. 83260D, 2012."},{"key":"e_1_3_2_1_7_1","first-page":"8684","volume-title":"Improved Spacer-Is-Dielectric (SID) Decomposition with Model Based Verification. Proc. SPIE","volume":"8684","author":"Du Y.","year":"2013","unstructured":"Y. Du , H. Song , J. Shiely and M. D. F. Wong , Improved Spacer-Is-Dielectric (SID) Decomposition with Model Based Verification. Proc. SPIE , Vol. 8684 , p. 8684 -- 8613 , 2013 . Y. Du, H. Song, J. Shiely and M. D. F. Wong, Improved Spacer-Is-Dielectric (SID) Decomposition with Model Based Verification. Proc. SPIE, Vol. 8684, p. 8684--13, 2013."},{"key":"e_1_3_2_1_8_1","doi-asserted-by":"publisher","DOI":"10.1117\/12.877601"},{"key":"e_1_3_2_1_9_1","doi-asserted-by":"publisher","DOI":"10.1145\/2160916.2160923"},{"key":"e_1_3_2_1_10_1","doi-asserted-by":"publisher","DOI":"10.5555\/1509456.1509563"},{"key":"e_1_3_2_1_11_1","doi-asserted-by":"publisher","DOI":"10.1145\/201310.201328"}],"event":{"name":"DAC '13: The 50th Annual Design Automation Conference 2013","location":"Austin Texas","acronym":"DAC '13","sponsor":["EDAC Electronic Design Automation Consortium","SIGDA ACM Special Interest Group on Design Automation","IEEE-CEDA","SIGBED ACM Special Interest Group on Embedded Systems"]},"container-title":["Proceedings of the 50th Annual Design Automation Conference"],"original-title":[],"link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2463209.2488848","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/2463209.2488848","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,18]],"date-time":"2025-06-18T08:39:29Z","timestamp":1750235969000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2463209.2488848"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2013,5,29]]},"references-count":11,"alternative-id":["10.1145\/2463209.2488848","10.1145\/2463209"],"URL":"https:\/\/doi.org\/10.1145\/2463209.2488848","relation":{},"subject":[],"published":{"date-parts":[[2013,5,29]]},"assertion":[{"value":"2013-05-29","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}