{"status":"ok","message-type":"work","message-version":"1.0.0","message":{"indexed":{"date-parts":[[2025,11,21]],"date-time":"2025-11-21T11:25:35Z","timestamp":1763724335283,"version":"3.41.0"},"publisher-location":"New York, NY, USA","reference-count":13,"publisher":"ACM","license":[{"start":{"date-parts":[[2015,3,29]],"date-time":"2015-03-29T00:00:00Z","timestamp":1427587200000},"content-version":"vor","delay-in-days":0,"URL":"https:\/\/www.acm.org\/publications\/policies\/copyright_policy#Background"}],"content-domain":{"domain":["dl.acm.org"],"crossmark-restriction":true},"short-container-title":[],"published-print":{"date-parts":[[2015,3,29]]},"DOI":"10.1145\/2717764.2717770","type":"proceedings-article","created":{"date-parts":[[2015,3,12]],"date-time":"2015-03-12T12:18:15Z","timestamp":1426162695000},"page":"75-80","update-policy":"https:\/\/doi.org\/10.1145\/crossmark-policy","source":"Crossref","is-referenced-by-count":15,"title":["TPL-Aware Displacement-driven Detailed Placement Refinement with Coloring Constraints"],"prefix":"10.1145","author":[{"given":"Tao","family":"Lin","sequence":"first","affiliation":[{"name":"Iowa State University, Ames, IA, USA"}]},{"given":"Chris","family":"Chu","sequence":"additional","affiliation":[{"name":"Iowa State University, Ames, IA, USA"}]}],"member":"320","published-online":{"date-parts":[[2015,3,29]]},"reference":[{"key":"e_1_3_2_1_1_1","first-page":"1","author":"Yu B.","year":"2011","unstructured":"B. Yu , K. Yuan , B. Zhang , D. Ding , and D. Z. Pan , \"Layout decomposition for triple patterning lithography,\" in Proceedings of the International Conference on Computer-Aided Design , pp. 1 -- 8 , 2011 . B. Yu, K. Yuan, B. Zhang, D. Ding, and D. Z. Pan, \"Layout decomposition for triple patterning lithography,\" in Proceedings of the International Conference on Computer-Aided Design, pp. 1--8, 2011.","journal-title":"\"Layout decomposition for triple patterning lithography,\" in Proceedings of the International Conference on Computer-Aided Design"},{"key":"e_1_3_2_1_2_1","doi-asserted-by":"publisher","DOI":"10.1145\/2228360.2228579"},{"key":"e_1_3_2_1_3_1","doi-asserted-by":"publisher","DOI":"10.1145\/2463209.2488818"},{"key":"e_1_3_2_1_4_1","first-page":"170","author":"Zhang Y.","year":"2013","unstructured":"Y. Zhang , W.-S. Luk , H. Zhou , C. Yan , and X. Zeng , \"Layout decomposition with pairwise coloring for multiple patterning lithography,\" in Proceedings of the International Conference on Computer-Aided Design , pp. 170 -- 177 , 2013 . Y. Zhang, W.-S. Luk, H. Zhou, C. Yan, and X. Zeng, \"Layout decomposition with pairwise coloring for multiple patterning lithography,\" in Proceedings of the International Conference on Computer-Aided Design, pp. 170--177, 2013.","journal-title":"\"Layout decomposition with pairwise coloring for multiple patterning lithography,\" in Proceedings of the International Conference on Computer-Aided Design"},{"key":"e_1_3_2_1_5_1","doi-asserted-by":"publisher","DOI":"10.1145\/2429384.2429396"},{"key":"e_1_3_2_1_6_1","doi-asserted-by":"crossref","unstructured":"H. Tian Y. Du H. Zhang Z. Xiao and M. D. F. Wong \"Constrained pattern assignment for standard cell based triple patterning lithography \" in Proceedings of the International Conference on Computer-Aided Design pp. 178--185 2013.   H. Tian Y. Du H. Zhang Z. Xiao and M. D. F. Wong \"Constrained pattern assignment for standard cell based triple patterning lithography \" in Proceedings of the International Conference on Computer-Aided Design pp. 178--185 2013.","DOI":"10.1109\/ICCAD.2013.6691116"},{"key":"e_1_3_2_1_7_1","first-page":"163","author":"Yu B.","year":"2013","unstructured":"B. Yu , Y.-H. Lin , G. Luk-Pat , D. Ding , K. Lucas , and D. Z. Pan , \"A high-performance triple patterning layout decomposer with balanced density,\" in Proceedings of the International Conference on Computer-Aided Design , pp. 163 -- 169 , 2013 . B. Yu, Y.-H. Lin, G. Luk-Pat, D. Ding, K. Lucas, and D. Z. Pan, \"A high-performance triple patterning layout decomposer with balanced density,\" in Proceedings of the International Conference on Computer-Aided Design, pp. 163--169, 2013.","journal-title":"\"A high-performance triple patterning layout decomposer with balanced density,\" in Proceedings of the International Conference on Computer-Aided Design"},{"key":"e_1_3_2_1_8_1","first-page":"566","volume-title":"Suald: Spacing uniformity-aware layout decomposition in triple patterning lithography.,\" in ISQED","author":"Chen Z.","year":"2013","unstructured":"Z. Chen , H. Yao , and Y. Cai , \" Suald: Spacing uniformity-aware layout decomposition in triple patterning lithography.,\" in ISQED , pp. 566 -- 571 , 2013 . Z. Chen, H. Yao, and Y. Cai, \"Suald: Spacing uniformity-aware layout decomposition in triple patterning lithography.,\" in ISQED, pp. 566--571, 2013."},{"key":"e_1_3_2_1_9_1","doi-asserted-by":"publisher","DOI":"10.1145\/2228360.2228468"},{"key":"e_1_3_2_1_10_1","doi-asserted-by":"publisher","DOI":"10.1145\/2429384.2429408"},{"key":"e_1_3_2_1_11_1","first-page":"349","volume-title":"Methodology for standard cell compliance and detailed placement for triple patterning lithography,\" in Proceedings of the International Conference on Computer-Aided Design","author":"Yu B.","year":"2013","unstructured":"B. Yu , X. Xu , J.-R. Gao , and D. Z. Pan , \" Methodology for standard cell compliance and detailed placement for triple patterning lithography,\" in Proceedings of the International Conference on Computer-Aided Design , pp. 349 -- 356 , 2013 . B. Yu, X. Xu, J.-R. Gao, and D. Z. Pan, \"Methodology for standard cell compliance and detailed placement for triple patterning lithography,\" in Proceedings of the International Conference on Computer-Aided Design, pp. 349--356, 2013."},{"key":"e_1_3_2_1_12_1","volume-title":"A Guide to the Theory of NP-Completeness","author":"Garey M. R.","year":"1979","unstructured":"M. R. Garey and D. S. Johnson . A Guide to the Theory of NP-Completeness . Macmillan Higher Education , 1979 . M. R. Garey and D. S. Johnson. A Guide to the Theory of NP-Completeness. Macmillan Higher Education, 1979."},{"key":"e_1_3_2_1_13_1","unstructured":"\"Gurobi.\" http:\/\/www.gurobi.com.  \"Gurobi.\" http:\/\/www.gurobi.com."}],"event":{"name":"ISPD'15: International Symposium on Physical Design","sponsor":["SIGDA ACM Special Interest Group on Design Automation"],"location":"Monterey California USA","acronym":"ISPD'15"},"container-title":["Proceedings of the 2015 Symposium on International Symposium on Physical Design"],"original-title":[],"link":[{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2717764.2717770","content-type":"unspecified","content-version":"vor","intended-application":"text-mining"},{"URL":"https:\/\/dl.acm.org\/doi\/pdf\/10.1145\/2717764.2717770","content-type":"unspecified","content-version":"vor","intended-application":"similarity-checking"}],"deposited":{"date-parts":[[2025,6,18]],"date-time":"2025-06-18T18:55:53Z","timestamp":1750272953000},"score":1,"resource":{"primary":{"URL":"https:\/\/dl.acm.org\/doi\/10.1145\/2717764.2717770"}},"subtitle":[],"short-title":[],"issued":{"date-parts":[[2015,3,29]]},"references-count":13,"alternative-id":["10.1145\/2717764.2717770","10.1145\/2717764"],"URL":"https:\/\/doi.org\/10.1145\/2717764.2717770","relation":{},"subject":[],"published":{"date-parts":[[2015,3,29]]},"assertion":[{"value":"2015-03-29","order":2,"name":"published","label":"Published","group":{"name":"publication_history","label":"Publication History"}}]}}